Author: Dan R. Denomme
Publisher:
ISBN:
Category :
Languages : en
Pages : 67
Book Description
Precursors for Metal-organic Chemical Vapor Deposition of Thin Films
Author: Dan R. Denomme
Publisher:
ISBN:
Category :
Languages : en
Pages : 67
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 67
Book Description
Precursors for Metal Organic Chemical Vapor Deposition (MOCVD) of ZrO_1tn2 and HfO_1tn2 Thin Films as Gate Dielectrics in Complementary Metal Oxide Semiconductor (CMOS) Devices
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Chemical Vapour Deposition
Author: Anthony C. Jones
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
I. Synthesis of Metal-organic Chemical Vapor Deposition Precursors and Their Use in Oxide Thin Film Depositions
Author: Seigi Suh
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 292
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 292
Book Description
Precursor Chemistry of Advanced Materials
Author: Roland A. Fischer
Publisher: Springer Science & Business Media
ISBN: 9783540016052
Category : Science
Languages : en
Pages : 240
Book Description
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
Publisher: Springer Science & Business Media
ISBN: 9783540016052
Category : Science
Languages : en
Pages : 240
Book Description
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
Synthesis and Characterization of Precursors for Chemical Vapor Deposition of Metal Oxide Thin Films
Author: May Nyman
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 354
Book Description
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 354
Book Description
Molecular Precursors for Solid State Materials
Author: Daniel Gerard Colombo
Publisher:
ISBN:
Category :
Languages : en
Pages : 826
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 826
Book Description
Metal-organic Chemical Vapor Deposition of Electronic Ceramics
Author:
Publisher:
ISBN:
Category : Electronic ceramics
Languages : en
Pages : 288
Book Description
Publisher:
ISBN:
Category : Electronic ceramics
Languages : en
Pages : 288
Book Description
Metalorganic Chemical Vapor Deposition (MOCVD) Routes for Fabrication of Rare Earth Nitride Thin Films
Author: Michael Krasnopolski
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
Book Description
Synthesis of Novel Barium Precursors and Their Use to Deposit Thin Films by Metal Organic Chemical Vapor Deposition
Author: Daniel Bliss Studebaker
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
A new class of volatile compounds of barium were synthesized. These 'capsule' compounds were prepared to saturate the coordination sphere of barium with one ligand. The covalent bonding of the polyglyme ligand to the 2,2,6,6-tetramethyl-3,5-heptanedione or similar ligand also increased the chelate effect, making loss of the glyme ligand on sublimation less likely. Single crystal X-ray crystal diffraction studies were done on these complexes. One of the complexes was used to grow BaTiO3 thin films to display the ability for these complexes to be used as metal organic chemical vapor deposition (MOCVD) precursors. Thin films of the superconducting material YBa2Cu3O 7-x were deposited on silver substrates by MOCVD. These films were analyzed by microscopy, and the electrical properties are discussed. The first reported growth of beta-BaBLO4 thin films by MOCVD is given. These films were grown on platinum, fused silica, sapphire, and silicon. Second harmonic generation of light from a Nd:YAG laser is observed in optical measurements.
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
A new class of volatile compounds of barium were synthesized. These 'capsule' compounds were prepared to saturate the coordination sphere of barium with one ligand. The covalent bonding of the polyglyme ligand to the 2,2,6,6-tetramethyl-3,5-heptanedione or similar ligand also increased the chelate effect, making loss of the glyme ligand on sublimation less likely. Single crystal X-ray crystal diffraction studies were done on these complexes. One of the complexes was used to grow BaTiO3 thin films to display the ability for these complexes to be used as metal organic chemical vapor deposition (MOCVD) precursors. Thin films of the superconducting material YBa2Cu3O 7-x were deposited on silver substrates by MOCVD. These films were analyzed by microscopy, and the electrical properties are discussed. The first reported growth of beta-BaBLO4 thin films by MOCVD is given. These films were grown on platinum, fused silica, sapphire, and silicon. Second harmonic generation of light from a Nd:YAG laser is observed in optical measurements.