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Author: R. P. H. Chang
Publisher: Cambridge University Press
ISBN: 9781107405707
Category : Technology & Engineering
Languages : en
Pages : 540
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: R. P. H. Chang
Publisher: Cambridge University Press
ISBN: 9781107405707
Category : Technology & Engineering
Languages : en
Pages : 540
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: R. P. H. Chang
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 552
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: R. P. H. Chang
Publisher:
ISBN:
Category :
Languages : en
Pages : 539
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Book Description
The symposium covered topics ranging from plasma diagnostics to mechanisms of plasma etching and growth of materials. The spirit of the symposium was to provide understanding of the chemistry and physics of plasma-materials interaction. Contents: Plasma Processes and Diagnostics; Plasma Etching; Plasma Deposition of Thin Films; and Plasma Oxidation, Nitridation and Passivation of Surfaces.
Author:
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 522
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Book Description
Author: Vijay K. Kapur
Publisher:
ISBN:
Category : Solar cells
Languages : en
Pages : 436
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Book Description
Author:
Publisher:
ISBN:
Category : Composite materials
Languages : en
Pages : 392
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Book Description
Author: O. Auciello
Publisher: Springer Science & Business Media
ISBN: 9400919468
Category : Science
Languages : en
Pages : 548
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Book Description
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Author: Mitsuharu Konuma
Publisher: Springer Science & Business Media
ISBN: 3642845118
Category : Science
Languages : en
Pages : 234
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Book Description
Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Author: Michael J. Kelly
Publisher: Springer Science & Business Media
ISBN: 3642714463
Category : Technology & Engineering
Languages : en
Pages : 481
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Book Description
les Houches This Winter School on "The Physics and Fabrication of Microstructures" originated with a European industrial decision to investigate in some detail the potential of custom-designed microstructures for new devices. Beginning in 1985, GEC and THOMSON started a collaboration on these subjects, supported by an ESPRIT grant from the Commission of the European Com munity. To the outside observer of the whole field, it appears clear that the world effort is very largely based in the United States and Japan. It also appears that cooperation and dissemination of results are very well organised outside Europe and act as a major influence on the development of new concepts and devices. In Japan, a main research programme of the Research and Development for Basic Technology for Future Industries is focused on "Future Electron Devices". In Japan and in the United States, many workshops are organised annually in order to bring together the major specialists in industry and academia, allowing fast dissemination of advances and contacts for setting up cooperative efforts.
Author: David A. Adler
Publisher: Springer
ISBN: 1489953612
Category : Technology & Engineering
Languages : en
Pages : 557
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Book Description
