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Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566771986
Category : Science
Languages : en
Pages : 308
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Book Description
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566771986
Category : Science
Languages : en
Pages : 308
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Book Description
Author: G. S. Mathad
Publisher:
ISBN: 9781566773416
Category : Technology & Engineering
Languages : en
Pages : 342
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Book Description
Author: Electrochemical Society (Ecs)
Publisher:
ISBN: 9781605606439
Category : Science
Languages : en
Pages : 79
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Book Description
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566772716
Category : Plasma etching
Languages : en
Pages : 408
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566772532
Category : Integrated circuits
Languages : en
Pages : 396
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Book Description
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: S. C. Singhal
Publisher: The Electrochemical Society
ISBN: 156677862X
Category : Science
Languages : en
Pages : 3058
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Book Description
This issue of ECS Transactions contains papers from the Twelfth International Symposium on Solid Oxide Fuel Cells (SOFC-XII),a continuing biennial series of symposia. The papers deal with materials for cell components and fabrication methods for components and complete cells. Also contained are papers on cell electrochemical performance and its modelling, stacks and systems, and prototype testing of SOFC demonstration units for different applications.
Author: Loucas G. Christophorou
Publisher: Springer Science & Business Media
ISBN: 1441989714
Category : Science
Languages : en
Pages : 791
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Book Description
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 0471724246
Category : Science
Languages : en
Pages : 795
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Book Description
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
