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Author: André Bouchoule
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 430
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Book Description
Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by André Bouchoule Université d'Orléans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity. * Physics and Modelling of Dusty Plasmas * Sources and Growth of Particles * Diagnostics of a Dusty Plasma * Technological Impacts of Dusty Plasmas
Author: André Bouchoule
Publisher: John Wiley & Sons
ISBN:
Category : Science
Languages : en
Pages : 430
Get Book Here
Book Description
Dusty Plasmas Physics, Chemistry and Technological Impacts in Plasma Processing Edited by André Bouchoule Université d'Orléans, France Dusty Plasmas gives the reader a thorough overview of current knowledge on many aspects of the subject, from the basic science to technological implications. The basic physics and chemistry of dusty plasmas developed in the first two chapters are complemented by the more practical considerations of diagnostics and technological implications in the two final chapters. The book will be of interest to those already involved in or just discovering dusty plasmas in their research and/or industrial activity. * Physics and Modelling of Dusty Plasmas * Sources and Growth of Particles * Diagnostics of a Dusty Plasma * Technological Impacts of Dusty Plasmas
Author: P.K Shukla
Publisher: CRC Press
ISBN: 1420034103
Category : Science
Languages : en
Pages : 281
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Book Description
Introduction to Dusty Plasma Physics contains a detailed description of the occurrence of dusty plasmas in our Solar System, the Earth's mesosphere, and in laboratory discharges. The book illustrates numerous mechanisms for charging dust particles and provides studies of the grain dynamics under the influence of forces that are common in dusty plas
Author: R. Martins
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 108
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Book Description
These proceedings describe the most recent advances and trends in the fields of dusty and colloidal plasmas: a new discipline which is highly relevant to those working on nanostructured materials, nanotechnologies and devices which are processed using plasma and fusion tools. For instance, in the case of thin-film devices, the production of new materials such as polymorphous or quasi-morphous silicon or even silicon nanotubes is highly dependent upon the production of particles, in the plasma, which are suitable for incorporation into the films produced. Therefore, it is very important to know how dusty and colloidal plasmas behave, and how high-grade electronic films can be processed under such conditions.
Author: André Melzer
Publisher: Springer
ISBN: 3030202607
Category : Science
Languages : en
Pages : 237
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Book Description
Colloidal plasmas - a still emerging field of plasma physics - enable the study of basic plasma properties on a microscopic kinetic level and allow the visualization of collective plasma phenomena, like oscillations and waves. Moreover, a vast number of novel phenomena are found in these systems, ranging from Coulomb crystallization to new types of forces and waves. Last but not least, they shed a new light on various traditional aspects of plasma physics such as shielding or the mechanism of acoustic waves in plasmas, thus providing new insight into the basic foundations of plasma physics.These course-based and self-contained lecture notes provide a general introduction to this active and growing field to students and nonspecialists, requiring only basic prior knowledge in plasma physics.
Author: Hannes Alfvén
Publisher:
ISBN:
Category : Celestial mechanics
Languages : en
Pages : 620
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Book Description
Author: Michael Bonitz
Publisher: Springer Science & Business Media
ISBN: 3319054376
Category : Science
Languages : en
Pages : 495
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Book Description
This book provides the reader with an introduction to the physics of complex plasmas, a discussion of the specific scientific and technical challenges they present and an overview of their potential technological applications. Complex plasmas differ from conventional high-temperature plasmas in several ways: they may contain additional species, including nano meter- to micrometer-sized particles, negative ions, molecules and radicals and they may exhibit strong correlations or quantum effects. This book introduces the classical and quantum mechanical approaches used to describe and simulate complex plasmas. It also covers some key experimental techniques used in the analysis of these plasmas, including calorimetric probe methods, IR absorption techniques and X-ray absorption spectroscopy. The final part of the book reviews the emerging applications of microcavity and microchannel plasmas, the synthesis and assembly of nanomaterials through plasma electrochemistry, the large-scale generation of ozone using microplasmas and novel applications of atmospheric-pressure non-thermal plasmas in dentistry. Going beyond the scope of traditional plasma texts, the presentation is very well suited for senior undergraduate, graduate students and postdoctoral researchers specializing in plasma physics.
Author: P.F. Williams
Publisher: Springer Science & Business Media
ISBN: 9401158843
Category : Technology & Engineering
Languages : en
Pages : 610
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Book Description
Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author: Vladimir E Fortov
Publisher: CRC Press
ISBN: 9780367384630
Category :
Languages : en
Pages : 440
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Book Description
Dusty or complex plasmas are plasmas containing solid or liquid charged particles referred to as dust. Naturally occurring in space, they are present in planetary rings and comet tails, as well as clouds found in the vicinity of artificial satellites and space stations. On a more earthly level, dusty plasmas are now being actively researched as dust plays a key role in technological plasma applications associated with etching technologies in microelectronics, as well as with production of thin films and nanoparticles. Complex and Dusty Plasmas: From Laboratory to Space provides a balanced and consistent picture of the current status of the field by covering new developments in experimental and theoretical research. Drawing from research performed across the earth and even beyond by an internationally diverse group of pioneering researchers, this book covers a wealth of topics. It delves into -- Major types of complex plasmas in ground-based and microgravity experiments Properties of the magnetized, thermal, cryogenic, ultraviolet, nuclear-induced complex plasmas and plasmas with nonspherical particles Major forces acting on the particles and features of the particle dynamics in complex plasmas, as well as basic plasma-particle interactions, Recent research results on phase transitions between crystalline and liquid complex plasma states Astrophysical aspects of dusty plasmas and numerical simulation of their properties Dust as a source of contamination in many applications including reactors An important feature of this work is the detailed discussion of unique experimental and theoretical aspects of complex plasmas related to the investigations under microgravity conditions performed onboard Mir and ISS space stations. Much of what we know today would not be possible without cooperation between researchers of various nations, many of whom serve as key contributors to this book. Whether deepening their knowledge of things interstellar or developing new applications and products for use in manufacturing, energy, and communication or even fields yet dreamt of, these pages provide the knowledge, approaches, and insight that all researchers of complex plasmas need.
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author: Y. Nakamura
Publisher: Elsevier
ISBN: 0080532039
Category : Science
Languages : en
Pages : 581
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Book Description
The study of dusty plasmas is now in a vigorous state of development. Dust and plasma coexist in a vast variety of cosmic environments and their research received a major boost in the early 80's with the Voyager spacecraft observations of peculiar features in the Saturnian ring system (e.g. the radial spokes) which could not be explained purely in gravitational terms. In addition, dust streams were measured by the Galileo spacecraft in the Jovian magnetosphere and charged dust in the earth's mesosphere was detected by a direct rocket experiment. Since then the area has greatly expanded with dedicated laboratory experiments verifying aspects of basic physics of charged dust grains in plasmas.These proceedings contain invited and poster papers which were presented by scientists active in the field from more than twenty countries. The material contains new aspects of collective interactions in dusty plasmas. For example, discoveries of dust-acoustic Mach cones, dust ion-acoustic shocks, great dust voids, vortex formation, dust crystallization under microgravity, coexistence of positive negative dust grains in the mesosphere and dust in tokamaks. The more theoretical and simulation studies focus on dynamical and structural properties and kinetic theories of strongly coupled dusty plasmas, as well as on self-organizations and structures, in addition to identifying forces (viz. wakefields, electrostatic and dipolar interactions etc.), which are responsible for charged dust grain attraction and phase transitions.The resulting book is a valuable, state-of-the-art review of the field of dusty plasma physics and will be welcomed by both researchers and graduate students who want to keep up to date in this rapidly growing field.
