Plasma Assisted Chemical Vapor Deposition of Molybdenum Disulfide Nanosheets PDF Download
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Author: Jiyang Chen
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
The sulfurization of MoO3 using Chemical Vapor Deposition is a common technique to synthesize MoS2 nanomaterials such as horizontal mono- and few layer nanosheets. Vertically aligned nanosheets can also be deposited under certain conditions using this method. To our knowledge, however, growth of MoS2 nanosheets with plasma enhanced CVD has not been explored so far. In this study, a remote plasma was introduced into the CVD chamber and the effect of plasma on MoS2 growth was investigated. Sulfur and MoO3 powders were used as the source materials, and the reaction temperature was controlled from 500 to 850 °C. Raman spectroscopy, x-ray diffraction, and scanning electron microscopy were used to characterize the structure and properties of the nanostructures. Introduction of plasma was found to affect the growth mode of MoS2 significantly, depending on the pressure, plasma power, and temperature. The plasma tends to promote the growth of flat nanosheets at lower pressure and high temperature or high pressure and low temperature while it enhances the growth of vertical nanosheets at high pressure and high temperature or low pressure and low temperature. These two growth modes compete with each other and the resultant morphology depends on the growth conditions and plasma power and time to be introduced. This study helps to understand the growth mechanism of MoS2 and opens an opportunity for controlling the material growth and doping by plasma.
Author: Jiyang Chen
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
The sulfurization of MoO3 using Chemical Vapor Deposition is a common technique to synthesize MoS2 nanomaterials such as horizontal mono- and few layer nanosheets. Vertically aligned nanosheets can also be deposited under certain conditions using this method. To our knowledge, however, growth of MoS2 nanosheets with plasma enhanced CVD has not been explored so far. In this study, a remote plasma was introduced into the CVD chamber and the effect of plasma on MoS2 growth was investigated. Sulfur and MoO3 powders were used as the source materials, and the reaction temperature was controlled from 500 to 850 °C. Raman spectroscopy, x-ray diffraction, and scanning electron microscopy were used to characterize the structure and properties of the nanostructures. Introduction of plasma was found to affect the growth mode of MoS2 significantly, depending on the pressure, plasma power, and temperature. The plasma tends to promote the growth of flat nanosheets at lower pressure and high temperature or high pressure and low temperature while it enhances the growth of vertical nanosheets at high pressure and high temperature or low pressure and low temperature. These two growth modes compete with each other and the resultant morphology depends on the growth conditions and plasma power and time to be introduced. This study helps to understand the growth mechanism of MoS2 and opens an opportunity for controlling the material growth and doping by plasma.
Author: Nicholas Simonson
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Two-dimensional (2D) transition metal dichalcogenides (TMDs) have demonstrated promising proof-of-concept performance in electronic and optoelectronic applications. Aside from desirable electronic properties, TMDs also exhibit inherent flexibility and transparency due to their atomically thin nature. Fabrication of TMD-based nanoelectronics directly on transparent, flexible substrates remains a challenge due to the high processing temperatures required for synthesis of highly crystalline material, temperatures which are generally not compatible with industrially relevant multicomponent glasses such as flexible Willow Glass, LCD display Lotus Glass, and the ubiquitous Gorilla Glass. This dissertation addresses the limitations of TMD growth on glass by examining the impact of glass surface chemistry, synthesis parameters, and alkali ion species on the nucleation and growth of MoS2 and WSe¬2 using metalorganic chemical vapor deposition (MOCVD). Chapter 1 introduces the necessary background, overarching hypothesis, technical motivation, and relevant literature on low-temperature CVD, alkali-assisted CVD, and CVD-on-glass of TMDs. Chapter 2 discusses the requisite experimental methods, particularly the synthesis processes and characterization techniques used. Chapter 3 presents the findings regarding initial synthesis optimization of MoS2 and WSe2 as well as alkali-assisted CVD. Chapter 3 also presents findings regarding the effect of glass chemistry on low-temperature CVD of TMDs through use of alkali-containing glass and substrate surface treatment. Chapter 4 introduces a carbon-free H2S precursor to further improve domain size and electronic properties, and examines the benefits of a combined approach involving various alkali-containing glass chemistries, alkali halides, and H2S-based growth. Chapter 5 includes MoS2 synthesis of vertically oriented films for electrochemical catalysis and lateral MoS2-graphene heterostructures. Lastly, Chapter 6 discusses the implications and future work in the growth of device-quality TMDs directly on multicomponent glasses.
Author: Michael Binnewies
Publisher: Walter de Gruyter
ISBN: 3110254654
Category : Science
Languages : en
Pages : 644
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Book Description
This comprehensive handbook covers the diverse aspects of chemical vapor transport reactions from basic research to important practical applications. The book begins with an overview of models for chemical vapor transport reactions and then proceeds to treat the specific chemical transport reactions for the elements, halides, oxides, sulfides, selenides, tellurides, pnictides, among others. Aspects of transport from intermetallic phases, the stability of gas particles, thermodynamic data, modeling software and laboratory techniques are also covered. Selected experiments using chemical vapor transport reactions round out the work, making this book a useful reference for researchers and instructors in solid state and inorganic chemistry.
Author: Jeffrey Scott Cross
Publisher:
ISBN:
Category :
Languages : en
Pages : 202
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Book Description
Author: T. J. Mason
Publisher: Wiley-VCH
ISBN:
Category : Science
Languages : en
Pages : 328
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Book Description
Power ultrasound has been used for many years in two specific industrial areas: cleaning and plastic welding. Over the last ten years an increasing interest has been shown in its potential for use over a much wider range of chemistry and processing which has been grouped together under the general title of sonochemistry. Most of these uses depend on the generation of acoustic cavitation in liquid media but this text, while underlining the importance of the physics and mathematics of cavitation, mainly concentrates on applications of the technology. After an introduction to the topic and some historical background to the uses of power ultrasound the general principles of acoustic cavitation are explored including some background physics, bubble dynamics and factors which influence cavitation. The remainder of the book incorporates a series of applications of sonochemistry which illustrate the types of physical and chemical effects of ultrasonically induced cavitation which will interest chemists and engineers alike. Amongst the major topics included are chemical synthesis, environmental protection and remediation of water, sewage and soils, polymer synthesis and processing, electrochemistry including both analytical and synthetic aspects and plating. The final chapter reviews the range of ultrasonic equipment available in the laboratory and the progress made towards the scale-up of sonochemistry. The level is introductory to semi-advanced and no topic has been taken to a particularly specialist level since it is intended that this should be of general interest to readers with a scientific background.
Author: Pietro Mandracci
Publisher: BoD – Books on Demand
ISBN: 1789849608
Category : Technology & Engineering
Languages : en
Pages : 166
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Book Description
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Author: Roel van de Krol
Publisher: Springer Science & Business Media
ISBN: 146141380X
Category : Technology & Engineering
Languages : en
Pages : 322
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Book Description
Photoelectrochemical Hydrogen Production describes the principles and materials challenges for the conversion of sunlight into hydrogen through water splitting at a semiconducting electrode. Readers will find an analysis of the solid state properties and materials requirements for semiconducting photo-electrodes, a detailed description of the semiconductor/electrolyte interface, in addition to the photo-electrochemical (PEC) cell. Experimental techniques to investigate both materials and PEC device performance are outlined, followed by an overview of the current state-of-the-art in PEC materials and devices, and combinatorial approaches towards the development of new materials. Finally, the economic and business perspectives of PEC devices are discussed, and promising future directions indicated. Photoelectrochemical Hydrogen Production is a one-stop resource for scientists, students and R&D practitioners starting in this field, providing both the theoretical background as well as useful practical information on photoelectrochemical measurement techniques. Experts in the field benefit from the chapters on current state-of-the-art materials/devices and future directions.
Author: Daniel Dobkin
Publisher: Springer Science & Business Media
ISBN: 9781402012488
Category : Technology & Engineering
Languages : en
Pages : 298
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Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Zhiming M. Wang
Publisher: Springer Science & Business Media
ISBN: 3319028502
Category : Technology & Engineering
Languages : en
Pages : 296
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Book Description
This book reviews the structure and electronic, magnetic, and other properties of various MoS2 (Molybdenum disulfide) nanostructures, with coverage of synthesis, Valley polarization, spin physics, and other topics. MoS2 is an important, graphene-like layered nano-material that substantially extends the range of possible nanostructures and devices for nanofabrication. These materials have been widely researched in recent years, and have become an attractive topic for applications such as catalytic materials and devices based on field-effect transistors (FETs) and semiconductors. Chapters from leading scientists worldwide create a bridge between MoS2 nanomaterials and fundamental physics in order to stimulate readers' interest in the potential of these novel materials for device applications. Since MoS2 nanostructures are expected to be increasingly important for future developments in energy and other electronic device applications, this book can be recommended for Physics and Materials Science and Engineering departments and as reference for researchers in the field.
Author: Hung Duc Nguyen
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
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Book Description
