Plasma-Assisted Atomic Layer Deposition of III-Nitride Thin Films PDF Download
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Author: Çağla Özgit-Akgün
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659208232
Category :
Languages : en
Pages : 180
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Book Description
III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures."
Author: Çağla Özgit-Akgün
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659208232
Category :
Languages : en
Pages : 180
Get Book Here
Book Description
III-nitride compound semiconductors (AlN, GaN, InN) and their alloys have emerged as versatile and high-performance materials for a wide range of electronic and optoelectronic device applications. Although high quality III-nitride thin films can be grown at high temperatures (>1000 C) with significant rates, deposition of these films on temperature-sensitive device layers and substrates necessitates the adaptation of low-temperature methods such as atomic layer deposition (ALD). When compared to other low-temperature thin film deposition techniques, ALD stands out with its self-limiting growth mechanism, which enables the deposition of highly uniform and conformal thin films with sub-angstrom thickness control. These unique characteristics make ALD a powerful method especially for depositing films on nanostructured templates, as well as preparing alloy thin films with well-defined compositions. This monograph reports on the development of low-temperature ( 200 C) plasma-assisted ALD processes for III-nitrides, and presents detailed characterization results for the deposited thin films and fabricated nanostructures."
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Kingsley Ukoba
Publisher: CRC Press
ISBN: 100099919X
Category : Technology & Engineering
Languages : en
Pages : 287
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Book Description
Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Andrew Y. C. Nee
Publisher: Springer
ISBN: 9781447146698
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.
Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639926
Category : Technology & Engineering
Languages : en
Pages : 463
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Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
![Atomic Layer Deposition of Metal Oxide and Nitride Thin Films [microform] PDF](https://books.google.com/books/content/images/frontcover/8hsXnQEACAAJ?fife=w80-h100)
Author: Becker, Jill Svenja
Publisher: Ann Arbor, Mich. : University Microfilms International
ISBN:
Category : Thin film devices
Languages : en
Pages : 308
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Book Description
Author: Tommi Kääriäinen
Publisher: John Wiley & Sons
ISBN: 1118062779
Category : Technology & Engineering
Languages : en
Pages : 274
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Book Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Author:
Publisher: World Scientific
ISBN: 9813277882
Category : Science
Languages : en
Pages : 2370
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Book Description
This comprehensive book set includes four volumes, covering the methods and protocols for the synthesis, fabrication, and characterization of nanomaterials. The first two books introduce the solution phase and gas synthesis approaches for nanomaterials, providing a number of most widely used protocols for each nanomaterial. An exhaustive list of nanomaterials are included, which are arranged according to the atomic number of the main element in the compound for easy search. For each material, the protocols are categorized according to the morphology of the nanostructure. A detailed reference is included in each protocol to point the readers to the source of the protocol. The third book describes many unconventional methods for the fabrication of nanostructures, including lithography and printing, self-assembly, chemical transformation, templated synthesis, electrospinning, laser induced synthesis, flame and plasma synthesis, and atomic layer deposition processes. The fourth book covers the typical methods for structural characterization of nanomaterials, including electron diffraction, electron microscopy, atomic force microscopy, scanning tunneling microscopy, X-ray diffraction, in-situ and operando X-ray techniques, X-ray absorption fine structure spectroscopy, static and dynamic light scattering, vibrational characterization methods, and NMR spectroscopy. In addition to the introduction of the basic operational principles of these tools, the book focuses explicitly on how they can be applied for analyzing nanomaterials. The handbook is a complete reference that can provide readers easily accessible information on how to synthesize and characterize nanomaterials desired for their target applications.
Author: Akinwumi Abimbola Amusan
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
