Photon, Beam and Plasma Assisted Processing PDF Download
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Author: E.F. Krimmel
Publisher: Elsevier
ISBN: 0444596364
Category : Technology & Engineering
Languages : en
Pages : 744
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Book Description
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: E.F. Krimmel
Publisher: Elsevier
ISBN: 0444596364
Category : Technology & Engineering
Languages : en
Pages : 744
Get Book Here
Book Description
This symposium attracted 82 papers which were presented orally or as posters. Fourteen invited speakers presented state of the art reviews and aspects of future key topics in this increasingly important area of materials science. The high level of scientific presentation during the conference enhanced the aim of the symposium, which was to stimulate discussion amongst materials scientists, chemists, engineers and physicists with a common interest in this field and to disseminate knowledge of progress.
Author: I. W. Boyd
Publisher:
ISBN:
Category :
Languages : en
Pages : 703
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Book Description
Author: A. Golanski
Publisher:
ISBN:
Category : Manufacturing processes
Languages : en
Pages : 742
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 9781402005244
Category : Science
Languages : en
Pages : 392
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Book Description
Proceedings of the NATO Advanced Study Institute, held in Kaunas, Lithuania, from 3-14 September 2001
Author: Y.I. Nissim
Publisher: Elsevier
ISBN: 0444596933
Category : Technology & Engineering
Languages : en
Pages : 173
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Book Description
Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronics device fabrication. Up till now single chamber processing has been an elusive manufacturing objective throughout the history of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realised and their potential has already innovated the industry. The 14 papers in this volume cover topics such as: The background of this approach and up-dated status; Design and concepts of relevant cluster tools equipment; Specific process modules such as deposition chambers (CVD, RTCVD, UVCVD, ...) annealing or etching reactors; and Standardization efforts. The work will provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
Author: G. Zerbi
Publisher: Elsevier
ISBN: 0444596852
Category : Technology & Engineering
Languages : en
Pages : 454
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Book Description
In the past ten years the science of Polyconjugated Organic Materials has grown rapidly and is now experiencing the uncorrelated explosive development typical of a new science. The transfer of the basic scientific knowledge of these materials to the field of technology and industry is presently the focus of interest in academic and industrial circles. New devices are being developed which are paving the way for future technologies. Organic materials have become the focus of attention in these technologies. The large and very fast nonlinear optical response of organic molecules has generated new theoretical and experimental physics as well as new synthetic chemistry. The advancement of knowledge and the new achievements in this field require the interdisciplinary practice of chemists, physicists and engineers who can talk the same technical language on molecular systems which show specific physical properties. The purpose of this book is to introduce beginners to the field of nonlinear optics in organic materials and to expose specialists in one field to the problems of the other fields. Since organic molecules with a large and very fast nonlinear optical response are being continuously discovered the contributions focus on this class of materials. The volume provides a useful introduction for all those interested in the theoretical and experimental aspects of this expanding field.
Author: I.W. Boyd
Publisher: Elsevier
ISBN: 0444596801
Category : Technology & Engineering
Languages : en
Pages : 552
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Book Description
The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Author: Y. Shiraki
Publisher: Elsevier
ISBN: 0444596895
Category : Science
Languages : en
Pages : 289
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Book Description
The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this book. Special emphasis is given to ultrathin Si/Ge superlattices. Topics covered include: Wafer preparation and epitaxial growth; surface effects driven phenomena, such as clustering, segregation, 'surfactants'; Analysis, both in situ and ex situ; Strain adjustment methods; High quality buffers; Modification of material properties by quantum wells and superlattices; Devices: Novel concepts, processing, modelling, demonstrators. The questions highlighted, particularly those articles comparing related or competing activities, will provide a wealth of knowledge for all those interested in the future avenues of theory and applications in this field.
Author: G.M. Crean
Publisher: Elsevier
ISBN: 0444596917
Category : Science
Languages : en
Pages : 352
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Book Description
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
