Author: David Edward KoteckiPublisher:
ISBN:
Category :
Languages : en
Pages : 452
Book Description
Nucleation and Growth of Silicon Thin Film Microstructures by Localized Laser Chemical Vapor Deposition
Author: David Edward KoteckiPublisher:
ISBN:
Category :
Languages : en
Pages : 452
Book Description
Scientific and Technical Aerospace Reports
Author: Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692
Book Description
Energy Research Abstracts
Author: Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 536
Book Description
Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
Author: Y. PauleauPublisher:
ISBN: 9789401003544
Category :
Languages : en
Pages : 382
Book Description
Thin Films by Chemical Vapour Deposition
Author: C. E. MoroșanuPublisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 724
Book Description
Laser Processing of Thin Films and Microstructures
Author: Ian W. BoydPublisher: Springer
ISBN:
Category : Science
Languages : en
Pages : 336
Book Description
Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition
![Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition PDF](https://books.google.com/books/content/images/frontcover/TWLutgAACAAJ?fife=w80-h100)
Author: JiPing LiPublisher:
ISBN:
Category :
Languages : en
Pages : 278
Book Description
Handbook of Thin Film Deposition
Author: Krishna SeshanPublisher: William Andrew
ISBN: 1437778747
Category : Technology & Engineering
Languages : en
Pages : 411
Book Description
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned ‘Moore’s Law’ relating to the technology development cycle in the semiconductor industry
Thin Film Deposition Employing Supersonic Molecular Beams
Author: Todd William SchroederPublisher:
ISBN:
Category :
Languages : en
Pages : 660
Book Description
Nucleation Promotion and Kinetics on Chemical Vapor Deposited Thin Films
Author: Kai-Ann YangPublisher:
ISBN:
Category :
Languages : en
Pages : 368
Book Description
