New Methods, Mechanisms and Models of Vapor Deposition: Volume 616

New Methods, Mechanisms and Models of Vapor Deposition: Volume 616 PDF Author: Haydn N. G. Wadley
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 274

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

New Methods, Mechanisms and Models of Vapor Deposition: Volume 616

New Methods, Mechanisms and Models of Vapor Deposition: Volume 616 PDF Author: Haydn N. G. Wadley
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 274

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

The Granular State: Volume 627

The Granular State: Volume 627 PDF Author: Surajit Sen
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 338

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Book Description
These 38 papers from the April 2000 symposium study granular structure, granular flows, nonlinear waves in granular media, vibrated and rotated granular media, and stress distributions. Topics include jamming in liquids and granular materials, nuclear magnetic resonance studies of granular flows, the blueprint of a concept for a nozzle- free inkjet printer, mixing and segregation processes in a Turbula blender, persistence of granular structure during die compaction of ceramic powders, and humidity-induced cohesion effects in granular media. c. Book News Inc.

Encyclopedia of Chemical Processing

Encyclopedia of Chemical Processing PDF Author: Sunggyu Lee
Publisher: Taylor & Francis US
ISBN: 9780824755607
Category : Science
Languages : en
Pages : 682

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Book Description
Collecting information of vital interest to chemical, polymer, mechanical, electrical, and civil engineers, as well as chemists and chemical researchers, this "Encyclopedia "supplies nearly 350 articles on current design, engineering, science, and manufacturing practices-offering expertly written articles on technologies at the forefront of the field to maximize and enhance the research and production phases of current and emerging chemical manufacturing practices and techniques.

Nanotubes and Related Materials: Volume 633

Nanotubes and Related Materials: Volume 633 PDF Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 352

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Fundamentals of Nanoindentation and Nanotribology II

Fundamentals of Nanoindentation and Nanotribology II PDF Author: Shefford P. Baker
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 342

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Book Description


Interfaces, Adhesion, and Processing in Polymer Systems

Interfaces, Adhesion, and Processing in Polymer Systems PDF Author: Spiros Haralambos Anastasiadis
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 232

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Book Description


Microphotonics - Materials, Physics and Applications: Volume 637

Microphotonics - Materials, Physics and Applications: Volume 637 PDF Author: Kazumi Wada
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 234

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610

Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610 PDF Author: Aditya Agarwal
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448

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Book Description
This proceedings of the April 2000 symposium deals with formation of electrical junctions in the front-end processing of devices for the approaching end-of-the-roadmap. The 60 papers address 2D dopant characterization, ion implantation and shallow junction technology, group III diffusion and activation, carbon diffusion and activation, group V diffusion and activation, vacancy-type defects, regrown amorphous layers, and structure and properties of point and extended defects. Topics include ultra-shallow junction formation and gate activation in deep-submicron CMOS, low energy implantation of boron with decaborane ions, modeling ramp rate effects on shallow junction formation, clustering equilibrium and deactivation kinetics in As doped silicon, and atomistic modeling of complex silicon processing scenarios. c. Book News Inc.

Recent Developments in Oxide and Metal Epitaxy - Theory and Experiment: Volume 619

Recent Developments in Oxide and Metal Epitaxy - Theory and Experiment: Volume 619 PDF Author: Mark Yeadon
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 248

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Materials Science of Novel Oxide-Based Electronics: Volume 623

Materials Science of Novel Oxide-Based Electronics: Volume 623 PDF Author: David S. Ginley
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 464

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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.