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Author: Robert S. Freund
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
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Book Description
Author: Robert S. Freund
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
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Book Description
Author:
Publisher: Elsevier
ISBN: 0080542921
Category : Science
Languages : en
Pages : 434
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Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Author: Kenneth A. Jackson
Publisher: John Wiley & Sons
ISBN: 3527611797
Category : Technology & Engineering
Languages : en
Pages : 210
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Book Description
Silicon is the most important material for the electronics industry. In modern microelectronics silicon devices like diodes and transistors play a major role, and devices like photodetectors or solar cells gain ever more importance. This concise handbook deals with one of the most important topics for the electronics industry. World renowned authors have contributed to this unique overview of the processing of silicon and silicon devices.
Author: Kenneth A. Jackson
Publisher: Wiley-VCH
ISBN:
Category : Science
Languages : en
Pages : 716
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Book Description
This self-contained handbook deals with the enabling materials technology for the electronics industry. World renowned authors have contributed to this unique treatment of the processing of semiconductors and related technologies. Contents: Wilkes: Silicon Processing. Mullin: Compound Semiconductor Processing, Kuech/BleLagally/Tischler: Epitaxial Growth. Leuschner/Pawlowski: Photolithography. Griffin: Doping. Turner/Donohoe: Etching Processes in Semiconductor Manufacturing. Chang/Sze: Silicon Device Structures. Lam/Stanchina: Compound Semiconductor Device Structures. Kwong: Silicon Device Processing. Parsey, Jr: Compound Semiconductor Device Processing. Amey: Chip Carriers. Knausenberger/Turlik: Interconnection Systems.
Author: G. S. Mathad
Publisher:
ISBN: 9781566773416
Category : Technology & Engineering
Languages : en
Pages : 342
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Author: Peter W. Hawkes
Publisher: Elsevier
ISBN: 0080465358
Category : Technology & Engineering
Languages : en
Pages : 263
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Book Description
Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.
Author:
Publisher:
ISBN:
Category : Mechanics, Applied
Languages : en
Pages : 400
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Author: Terry R. Turner
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 710
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Author:
Publisher:
ISBN:
Category : DEC computers
Languages : en
Pages : 548
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Author: Jagdish Narayan
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 236
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Book Description
