Monolithic Polycrystalline-silicon Passive Devices PDF Download
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Author: Nicky Chau-Chun Lu
Publisher:
ISBN:
Category : Bipolar integrated circuits
Languages : en
Pages :
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Author: Nicky Chau-Chun Lu
Publisher:
ISBN:
Category : Bipolar integrated circuits
Languages : en
Pages :
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Book Description
Author: Nicky Chau-Chun Lu
Publisher:
ISBN:
Category : Electric resistors, Film
Languages : en
Pages : 196
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Author: Stanford University. Stanford Electronics Laboratories. Integrated Circuits Laboratory
Publisher:
ISBN:
Category : Diffusion
Languages : en
Pages : 106
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Author: Ted Kamins
Publisher: Springer Science & Business Media
ISBN: 1461316812
Category : Technology & Engineering
Languages : en
Pages : 302
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Book Description
Recent years have seen silicon integrated circuits enter into an increasing number of technical and consumer applications, until they now affect everyday life, as well as technical areas. Polycrystalline silicon has been an important component of silicon technology for nearly two decades, being used first in MOS integrated circuits and now becoming pervasive in bipolar circuits, as well. During this time a great deal of informa tion has been published about polysilicon. A wide range of deposition conditions has been used to form films exhibiting markedly different properties. Seemingly contradictory results can often be explained by considering the details of the structure formed. This monograph is an attempt to synthesize much of the available knowledge about polysilicon. It represents an effort to interrelate the deposition, properties, and applications of polysilicon so that it can be used most effectively to enhance device and integrated-circuit perfor mance. As device performance improves, however, some of the proper ties of polysilicon are beginning to restrict the overall performance of integrated circuits, and the basic limitations of the properties of polysili con also need to be better understood to minimize potential degradation of circuit behavior.
Author: Laurent Vivien
Publisher: Taylor & Francis
ISBN: 1439836116
Category : Science
Languages : en
Pages : 831
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Book Description
The development of integrated silicon photonic circuits has recently been driven by the Internet and the push for high bandwidth as well as the need to reduce power dissipation induced by high data-rate signal transmission. To reach these goals, efficient passive and active silicon photonic devices, including waveguide, modulators, photodetectors,
![Passive Device Models for Monolithic Millimeter-wave Integrated Circuits on Silicon [microform] PDF](https://books.google.com/books/content/images/frontcover/UPh8twAACAAJ?fife=w80-h100)
Author: Marc-André LaCroix
Publisher: National Library of Canada = Bibliothèque nationale du Canada
ISBN: 9780612797055
Category : Bipolar transistors
Languages : en
Pages : 302
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Author: Badih El-Kareh
Publisher: Springer
ISBN: 3030150852
Category : Technology & Engineering
Languages : en
Pages : 648
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Book Description
This book covers modern analog components, their characteristics, and interactions with process parameters. It serves as a comprehensive guide, addressing both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. Based on the authors’ extensive experience in the development of analog devices, this book is intended for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science. Enables engineers to understand analog device physics, and discusses important relations between process integration, device design, component characteristics, and reliability; Describes in step-by-step fashion the components that are used in analog designs, the particular characteristics of analog components, while comparing them to digital applications; Explains the second-order effects in analog devices, and trade-offs between these effects when designing components and developing an integrated process for their manufacturing.
Author: John D. Cressler
Publisher: CRC Press
ISBN: 1420066951
Category : Technology & Engineering
Languages : en
Pages : 360
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Book Description
No matter how you slice it, semiconductor devices power the communications revolution. Skeptical? Imagine for a moment that you could flip a switch and instantly remove all the integrated circuits from planet Earth. A moment’s reflection would convince you that there is not a single field of human endeavor that would not come to a grinding halt, be it commerce, agriculture, education, medicine, or entertainment. Life, as we have come to expect it, would simply cease to exist. Drawn from the comprehensive and well-reviewed Silicon Heterostructure Handbook, this volume covers SiGe circuit applications in the real world. Edited by John D. Cressler, with contributions from leading experts in the field, this book presents a broad overview of the merits of SiGe for emerging communications systems. Coverage spans new techniques for improved LNA design, RF to millimeter-wave IC design, SiGe MMICs, SiGe Millimeter-Wave ICs, and wireless building blocks using SiGe HBTs. The book provides a glimpse into the future, as envisioned by industry leaders.
Author: Milo Macha
Publisher:
ISBN:
Category : Ceramic materials
Languages : en
Pages : 90
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Book Description
The report comprises a detailed description of the materials, techniques and problems in each of the three major areas of thin film applications--dielectrics, magnetics and semiconductors. Included in the report are also basic theories necessary for a complete understanding of the physical and chemical processes related to the areas of interest. Theoretical analysis leads to a description of the critical physical, chemical and structural requirements of films for device applications. The state of the art of all aspects of ceramic thin film technology is critically reviewed, and recommendations are suggested to overcome existing limitations.
Author: J. M. Blocher
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 844
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Book Description
