Microscopy of Semiconducting Materials 1995, Proceedings of the Institute of Physics Conference Held at Oxford University, 20-23 March 1995 PDF Download
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Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 824
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Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 824
Get Book Here
Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.
Author: A.G Cullis
Publisher: CRC Press
ISBN: 9780750306508
Category : Technology & Engineering
Languages : en
Pages : 782
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Book Description
With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigate semiconducting structures. It also covers specimen preparation using focused ion beam milling and advances in microscopy techniques using different types of scanning probes, such as AFM, STM, and SCM. In addition, the book discusses a range of materials, from finished devices to partly processed materials and structures, including nanoscale wires and dots. This volume provides an authoritative reference for all academics and researchers in materials science, electrical and electronic engineering and instrumentation, and condensed matter physics.
Author: A.G. Cullis
Publisher: CRC Press
ISBN: 1351083074
Category : Science
Languages : en
Pages : 626
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Book Description
The Institute of Physics Conference Series is a leading International medium for the rapid publication of proceedings of major conferences and symposia reviewing new developments in physics and related areas. Volumes in the series comprise original refereed papers and are regarded as standard referee works. As such, they are an essential part of major libration collections worldwide. The twelfth conference on the Microscopy of Semiconducting Materials (MSM) was held at the University of Oxford, 25-29 March 2001. MSM conferences focus on recent international advances in semiconductor studies carried out by all forms of microscopy. The event was organized with scientific sponsorship by the Royal Microscopical Society, The Electron Microscopy and Analysis Group of the Institute of Physics and the Materials Research Society. With the continual shrinking of electronic device dimensions and accompanying enhancement in device performance, the understanding of semiconductor microscopic properties at the nanoscale (and even at the atomic scale) is increasingly critical for further progress to be achieved. This conference proceedings provides an overview of the latest instrumentation, analysis techniques and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and materials scientists.
Author: A.G Cullis
Publisher: CRC Press
ISBN: 1482268698
Category : Science
Languages : en
Pages : 775
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Book Description
With IC technology continuing to advance, the analysis of very small structures remains critically important. Microscopy of Semiconducting Materials provides an overview of advances in semiconductor studies using microscopy. The book explores the use of transmission and scanning electron microscopy, ultrafine electron probes, and EELS to investigat
Author: Cullis
Publisher: CRC Press
ISBN: 9780854981786
Category : Technology & Engineering
Languages : en
Pages : 836
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Book Description
The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Author: A.G. Cullis
Publisher: CRC Press
ISBN: 1000157016
Category : Science
Languages : en
Pages : 836
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Book Description
The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Author: A. G. Cullis
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 830
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Book Description
The seventh conference on the Microscopy of Semiconducting Materials was held at Oxford University on 25-28 March 1991. As in previous years the conference had a totally international flavour with many of the world's leading researchers present. Scientific sponsorship was provided by the Electron Microscopy and Analysis Group of the Institute of Physics, the Royal Microscopical Society and the Materials Research Society. This volume contains both the invited and contributed papers from the
Author: A. G. Cullis
Publisher:
ISBN:
Category : Electron microscopy
Languages : en
Pages : 540
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Book Description
Author: A.G. Cullis
Publisher: Springer Science & Business Media
ISBN: 3540319158
Category : Technology & Engineering
Languages : en
Pages : 543
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Book Description
The 14th conference in the series focused on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques were also covered and included the latest work using scanning probe microscopy and also X-ray topography and diffraction.
Author: A. G. Cullis
Publisher: CRC Press
ISBN: 9780750303477
Category : Art
Languages : en
Pages : 848
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Book Description
This volume continues the tradition of previous meetings in the series and provides researchers with an overview of recent developments in the field. Contains invited review papers together with in-depth coverage of the latest research results. Encompassing techniques from transmission and scanning electron microscopy, X-ray topography and diffraction, scanning probe microscopy and atom probe microanalysis, as applied to the whole range of semiconducting materials.