Micromachining of Monocrystalline Silicon Membranes for Sensor Applications Using Porous Silicon PDF Download
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Author: Simon Armbruster
Publisher:
ISBN: 9783899594072
Category :
Languages : de
Pages : 150
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Book Description
Author: Simon Armbruster
Publisher:
ISBN: 9783899594072
Category :
Languages : de
Pages : 150
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Book Description
Author: Ghenadii Korotcenkov
Publisher: CRC Press
ISBN: 1482264579
Category : Science
Languages : en
Pages : 418
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Book Description
Porous silicon is rapidly attracting increasing interest from various fields, including optoelectronics, microelectronics, photonics, medicine, chemistry, and biosensing. This nanostructured and biodegradable material has a range of unique properties that make it ideal for many applications. For example, the pores and surface chemistry of the mater
Author: Ghenadii Korotcenkov
Publisher: CRC Press
ISBN: 1482264595
Category : Science
Languages : en
Pages : 431
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Book Description
Porous silicon is rapidly attracting increasing interest from various fields, including optoelectronics, microelectronics, photonics, medicine, sensor and energy technologies, chemistry, and biosensing. This nanostructured and biodegradable material has a range of unique properties that make it ideal for many applications. This book, the third of a
Author: Hélder A. Santos
Publisher: Woodhead Publishing
ISBN: 0128225246
Category : Science
Languages : en
Pages : 646
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Book Description
Porous Silicon for Biomedical Applications, Second Edition, provides an updated guide to the diverse range of biomedical applications of porous silicon, from biosensing and imaging to tissue engineering and cancer therapy. Across biomedical disciplines, there is an ongoing search for biomaterials that are biocompatible, modifiable, structurally sound, and versatile. Porous silicon possesses a range of properties that make it ideal for a variety of biomedical applications, such as controllable geometry, tunable nanoporous structure, large pore volume/high specific surface area, and versatile surface chemistry. This book provides a fully updated and detailed overview of the range of biomedical applications for porous silicon. Part One offers the reader a helpful insight into the fundamentals and beneficial properties of porous silicon, including thermal properties and stabilization, photochemical and nonthermal chemical modification, protein modification, and biocompatibility. The book then builds on the systematic detailing of each biomedical application using porous silicon, from bioimaging and sensing to drug delivery and tissue engineering. This new edition also includes new chapters on in-vivo assessment of porous silicon, photodynamic and photothermal therapy, micro- and nanoneedles, Raman imaging, cancer immunotherapy, and more. With its acclaimed editor and international team of expert contributors, Porous Silicon for Biomedical Applications, Second Edition, is a technical resource and indispensable guide for all those involved in the research, development, and application of porous silicon and other biomaterials, while providing a comprehensive introduction for students and academics interested in this field. Reviews the fundamental aspects of porous silicon, including the fabrication and unique properties of this useful material. Discusses a broad selection of biomedical applications, offering a detailed insight into the benefits of porous silicon in both research and clinical settings. Includes fully updated content from the previous edition, as well as brand new chapters, covering topics such as porous silicon micro- and nanoneedles, and cancer immunotherapy.
Author: Meifang Lai
Publisher:
ISBN:
Category : Micromachining
Languages : en
Pages : 172
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Book Description
[Truncated abstract] Porous silicon (PS), which exhibits valuable characteristics including photoluminescence, easily tunable refractive index, and large surface area, has gained enormous attention worldwide for innovative photoelectronic applications, such as light-emitting diodes, photodetectors, and sensors. However, only rudimentary PS optical devices and sensors exist at the present stage, due to the environmental and chemical instability of PS. For the next generation of PS devices, patterning of PS after its formation using CMOS-compatible processes to achieve PS devices with homogenous properties, and integration with electronics is desired. In this work, a low-temperature annealing technique is investigated for passivation of PS to achieve environmental and chemical stability. The low-temperature annealed PS (LTA-PS) was obtained by annealing as-fabricated PS in a rapid thermal processor at temperatures as low as 600°C under nitrogen flow. After passivation a very thin layer of SiOxNy was formed on the pore surface, acting as a protective layer against chemical attack and a diffusion barrier against further oxidation. Immersion in HF solution removed the SiOxNy passivation layer, leading to only a 2 % porosity increase. The PS surface is re-terminated with Si-H bonds after HF immersion, enabling it to be reanodised or re-passivated. Compared to as-fabricated PS, LTA-PS has significantly enhanced environmental and chemical stability. It can survive in 1 % KOH (this is a common concentration for alkaline developers in photolithography) for 100 s with an optical thickness change of less than 10 %. The annealing temperature, annealing duration and N2 flow rate were all found to influence the passivation properties. By optimising these conditions, PS annealed at 600°C for 48 minutes with a N2 flow rate of 1000 sccm exhibited excellent chemical resistance to 1 % KOH for at least 10 minutes with negligible film degradation. As LTA-PS is chemically resistant, the compatibility of LTA-PS to photolithography was investigated. It was found that the photoresist seeped into the pores, and could not be completely removed during development. A polymer protective layer (ProLIFT) was used prior to the coating of photoresist to prevent photoresist seepage and enable clean development. By use of the polymer protective layer, the LTA-PS exhibited excellent compatibility with photolithographic processes using alkaline developers. Once photolithographic process can be used with LTA-PS, both additive and subtractive processes can be employed to pattern PS. Metal deposition and definition on a PS surface was successfully achieved and demonstrated as an example of additive processes. As an example of subtractive processes, dry etching of PS was investigated in detail to find the optimum recipe for etching PS. A recipe using CF4/CH4 was selected for achieving near-90° sidewalls with a smooth post-etching surface...
Author: Baoguo Han
Publisher: Elsevier
ISBN: 0128199237
Category : Technology & Engineering
Languages : en
Pages : 962
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Book Description
Nanosensors for Smart Cities covers the fundamental design concepts and emerging applications of nanosensors for the creation of smart city infrastructures. Examples of major applications include logistics management, where nanosensors could be used in active transport tracking devices for smart tracking and tracing, and in agri-food productions, where nanosensors are used in nanochips for identity, and food inspection, and smart storage. This book is essential reading for researchers working in the field of advanced sensors technology, smart city technology and nanotechnology, and stakeholders involved in city management. Nanomaterials based sensors (nanosensors) can offer many advantages over their microcounterparts, including lower power consumption, high sensitivity, lower concentration of analytes, and smaller interaction distance between object and sensor. With the support of artificial intelligence (AI) tools, such as fuzzy logic, genetic algorithms, neural networks, and ambient-intelligence, sensor systems are becoming smarter. Provides information on the fabrication and fundamental design concepts of nanosensors for intelligent systems Explores how nanosensors are being used to better monitor and maintain infrastructure services, including street lighting, traffic management and pollution control Assesses the challenges for creating nanomaterials-enhanced sensors for mass-market consumer products
Author: Marc J. Madou
Publisher: CRC Press
ISBN: 1482274663
Category : Technology & Engineering
Languages : en
Pages : 1992
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Book Description
Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.
Author: Mojtaba Kahrizi
Publisher: BoD – Books on Demand
ISBN: 9533079061
Category : Science
Languages : en
Pages : 316
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Book Description
Micromachining is used to fabricate three-dimensional microstructures and it is the foundation of a technology called Micro-Electro-Mechanical-Systems (MEMS). Bulk micromachining and surface micromachining are two major categories (among others) in this field. This book presents advances in micromachining technology. For this, we have gathered review articles related to various techniques and methods of micro/nano fabrications, like focused ion beams, laser ablation, and several other specialized techniques, from esteemed researchers and scientists around the world. Each chapter gives a complete description of a specific micromachining method, design, associate analytical works, experimental set-up, and the final fabricated devices, followed by many references related to this field of research available in other literature. Due to the multidisciplinary nature of this technology, the collection of articles presented here can be used by scientists and researchers in the disciplines of engineering, materials sciences, physics, and chemistry.
Author: Masayoshi Esashi
Publisher: John Wiley & Sons
ISBN: 3527823255
Category : Technology & Engineering
Languages : en
Pages : 528
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Book Description
Explore heterogeneous circuit integration and the packaging needed for practical applications of microsystems MEMS and system integration are important building blocks for the “More-Than-Moore” paradigm described in the International Technology Roadmap for Semiconductors. And, in 3D and Circuit Integration of MEMS, distinguished editor Dr. Masayoshi Esashi delivers a comprehensive and systematic exploration of the technologies for microsystem packaging and heterogeneous integration. The book focuses on the silicon MEMS that have been used extensively and the technologies surrounding system integration. You’ll learn about topics as varied as bulk micromachining, surface micromachining, CMOS-MEMS, wafer interconnection, wafer bonding, and sealing. Highly relevant for researchers involved in microsystem technologies, the book is also ideal for anyone working in the microsystems industry. It demonstrates the key technologies that will assist researchers and professionals deal with current and future application bottlenecks. Readers will also benefit from the inclusion of: A thorough introduction to enhanced bulk micromachining on MIS process, including pressure sensor fabrication and the extension of MIS process for various advanced MEMS devices An exploration of epitaxial poly Si surface micromachining, including process condition of epi-poly Si, and MEMS devices using epi-poly Si Practical discussions of Poly SiGe surface micromachining, including SiGe deposition and LP CVD polycrystalline SiGe A concise treatment of heterogeneously integrated aluminum nitride MEMS resonators and filters Perfect for materials scientists, electronics engineers, and electrical and mechanical engineers, 3D and Circuit Integration of MEMS will also earn a place in the libraries of semiconductor physicists seeking a one-stop reference for circuit integration and the practical application of microsystems.
Author:
Publisher:
ISBN:
Category : Actuators
Languages : en
Pages : 1020
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Book Description
