GaN and Related Alloys - 2002: Volume 743 PDF Download
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Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 900
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Book Description
This year's nitride symposium showed the scope of nitride-related advances spanning basic materials physics over process technology to high-performance devices. Progress was reported in bulk growth of GaN and AlN, growth on various substrates and substrate orientations, optical properties of InN, defect and doping analysis of p-doped GaN, and polarization properties. These led to new performance records in visible light emitter technology, i.e., higher efficiency/higher brightness, UV emitters with shorter wavelength, and UV and photo detectors. Advances in the development of nitride-based electronic devices with new heterostructure FET designs for RF power applications, including those on Si substrates and wafer fusion, are also reported. This book captures the exciting developments in this rapidly progressing field. Topics include: epitaxy - devices and defect reduction; defects and characterization; epitaxy - nonpolar orientations and alloys; optical properties; UV emitters and detectors; visible light emitters; electronic devices; characterization of defects and transport; and contacts, processing and p-type nitrides.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 900
Get Book Here
Book Description
This year's nitride symposium showed the scope of nitride-related advances spanning basic materials physics over process technology to high-performance devices. Progress was reported in bulk growth of GaN and AlN, growth on various substrates and substrate orientations, optical properties of InN, defect and doping analysis of p-doped GaN, and polarization properties. These led to new performance records in visible light emitter technology, i.e., higher efficiency/higher brightness, UV emitters with shorter wavelength, and UV and photo detectors. Advances in the development of nitride-based electronic devices with new heterostructure FET designs for RF power applications, including those on Si substrates and wafer fusion, are also reported. This book captures the exciting developments in this rapidly progressing field. Topics include: epitaxy - devices and defect reduction; defects and characterization; epitaxy - nonpolar orientations and alloys; optical properties; UV emitters and detectors; visible light emitters; electronic devices; characterization of defects and transport; and contacts, processing and p-type nitrides.
Author:
Publisher:
ISBN:
Category : Electroluminescent devices
Languages : en
Pages : 896
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Book Description
Author: Christopher C. Berndt
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 510
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Book Description
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Ferroelectric devices
Languages : en
Pages : 528
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Book Description
Author: Surajit Sen
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 192
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Book Description
The past decade has seen an explosive growth of interest in the physics of granular materials. Granular media are comprised of macroscopic objects with internal degrees of freedom. Granular assemblies exhibit phenomena that incorporate the properties of traditional solids, liquids and gases, making it a unique state. In many ways, the granular state is a generalized state of matter. This new volume from the Materials Research Society brings together researchers from many countries and disciplines to assess issues and problems concerned with the collective behavior of granular assemblies as encountered in the context of various applications. In particular, these applications include ceramic science, shock propagation and absorption, design and maintenance of stable natural and artificial structures, processing of pharmaceuticals, and self-assembly processes associated with the synthesis of ultrahigh-density magnetic tapes. The volume should be of value to researchers involved in exploring granular material-based technologies, and is expected to stimulate further research in this arena. Topics include: electromagnetic fields; structural issues; flow behavior; and dynamical problems.
Author: Ulrich Simon
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
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Book Description
Author: Alberto Piqué
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 240
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 234
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Book Description
Author: Michael J. Zehetbauer
Publisher: John Wiley & Sons
ISBN: 3527604944
Category : Technology & Engineering
Languages : en
Pages : 872
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Book Description
These proceedings of the "Second International Conference on Nanomaterials by Severe Plastic Deformation" review the enormous scientific avalanche that has been developing in the field over recent years. A valuable resource for any scientist and engineer working in this emerging field of nanotechnology.
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
