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Author: Litho-Media, inc., New York
Publisher:
ISBN:
Category : Advertising layout and typography
Languages : en
Pages : 326
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Book Description
Author: Litho-Media, inc., New York
Publisher:
ISBN:
Category : Advertising layout and typography
Languages : en
Pages : 326
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Book Description
Author: Di Hand
Publisher: Routledge
ISBN: 1317864026
Category : Social Science
Languages : en
Pages : 385
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Book Description
This essential guide provides you with a tailored introduction to the design techniques and production practices employed in the media industry. It presents clear and relevant explanations of how to design and produce any type of print and online publication to a professional standard, from pre-planning through to going to press or online. In providing the context, principles and thinking behind design over time, alongside the key practical techniques and know-how, this resource will enable you to present information clearly and effectively. Key features: Provides a complete resource, explaining the background, theory and application of design as well as the ‘how to’ Tutorials and exercises demonstrate how to create clean, attractive and well-targeted designs Supported by a comprehensive gallery of examples and case studies Highly illustrated throughout Colour ‘How to’ sections explain in detail how to create layouts and work with type, pictures and colour successfully Design for Media is a core resource for students and professionals in journalism, PR, advertising, design and across the media and creative sectors.
Author: John Bunyan
Publisher:
ISBN:
Category :
Languages : en
Pages : 310
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Book Description
Author: Daniel James
Publisher: Apress
ISBN: 1430218886
Category : Computers
Languages : en
Pages : 438
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Book Description
Open source software, also known as free software, now offers a creative platform with world-class programs. Just ask the people who have completed high-quality projects or developed popular web 2.0 sites using open source desktop applications. This phenomenon is no longer underground or restricted to techies—there have been more than 61 million downloads of the Audacity audio editor and more than 60 million downloads of the GIMP for Windows photographic tool from SourceForge.net alone. Crafting Digital Media is your foundation course in photographic manipulation, illustration, animation, 3D modelling, publishing, recording audio and making music, DJ’ing, mixing and mastering audio CDs, video editing and web content delivery. Every technique described in the book can be achieved on GNU/Linux, but many of the applications covered run on Windows and Mac OS X as well. New to GNU/Linux and a little daunted? Don’t worry—there’s a step-by-step tutorial on Ubuntu for either temporary use or permanent installation. If you are a creative type who wants to get started with open source software or an existing GNU/Linux user looking to explore this category of programs, this is the book for you! Realize your own personal projects and creative ambitions with the tools this book will place at your fingertips.
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 9780819458452
Category : Art
Languages : en
Pages : 1104
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Book Description
This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
Author: United States. Bureau of Foreign and Domestic Commerce
Publisher:
ISBN:
Category : Commerce
Languages : en
Pages : 446
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Author:
Publisher:
ISBN:
Category : Printing
Languages : en
Pages : 128
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Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
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Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: Andrew Stevens
Publisher: Chazen Museum of Art
ISBN: 0932900356
Category : Prints
Languages : en
Pages : 120
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Book Description
Founded in 1987 by Professor William Weege, the Tandem Press seeks to recreate the dynamic creative atmosphere of a visiting artist community where students and artists collaborate, work, and learn together. This catalog details the first five years of the program, and offers a color plate of one work from each of the visiting artists and a complete checklist of the exhibition. Distributed for theChazen Museum of Art, University of Wisconsin Madison"
Author: Library of Congress. Copyright Office
Publisher:
ISBN:
Category : Copyright
Languages : en
Pages : 1172
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Book Description
