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Author: Radia Perlman
Publisher: Addison-Wesley Professional
ISBN: 9780201634488
Category : Computers
Languages : en
Pages : 566
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Book Description
Perlman, a bestselling author and senior consulting engineer for Sun Microsystems, provides insight for building more robust, reliable, secure and manageable networks. Coverage also includes routing and addressing strategies, VLANs, multicasting, IPv6, and more.
Author: Radia Perlman
Publisher: Addison-Wesley Professional
ISBN: 9780201634488
Category : Computers
Languages : en
Pages : 566
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Book Description
Perlman, a bestselling author and senior consulting engineer for Sun Microsystems, provides insight for building more robust, reliable, secure and manageable networks. Coverage also includes routing and addressing strategies, VLANs, multicasting, IPv6, and more.
Author: Ashok Goel
Publisher: Momentum Press
ISBN: 1606505130
Category : Technology & Engineering
Languages : en
Pages : 394
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Book Description
Quantitative understanding of the parasitic capacitances and inductances, and the resultant propagation delays and crosstalk phenomena associated with the metallic interconnections on the very large scale integrated (VLSI) circuits has become extremely important for the optimum design of the state-of-the-art integrated circuits. More than 65 percent of the delays on the integrated circuit chip occur in the interconnections and not in the transistors on the chip. Mathematical techniques to model the parasitic capacitances, inductances, propagation delays, crosstalk noise, and electromigration-induced failure associated with the interconnections in the realistic high-density environment on a chip will be discussed. A One-Semester Course in Modeling of VLSI Interconnections also includes an overview of the future interconnection technologies for the nanotechnology circuits.
Author: Ashok K. Goel
Publisher: John Wiley & Sons
ISBN: 0470165960
Category : Technology & Engineering
Languages : en
Pages : 433
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Book Description
This Second Edition focuses on emerging topics and advances in the field of VLSI interconnections In the decade since High-Speed VLSI Interconnections was first published, several major developments have taken place in the field. Now, updated to reflect these advancements, this Second Edition includes new information on copper interconnections, nanotechnology circuit interconnects, electromigration in the copper interconnections, parasitic inductances, and RLC models for comprehensive analysis of interconnection delays and crosstalk. Each chapter is designed to exist independently or as a part of one coherent unit, and several appropriate exercises are provided at the end of each chapter, challenging the reader to gain further insight into the contents being discussed. Chapter subjects include: * Preliminary Concepts * Parasitic Resistances, Capacitances, and Inductances * Interconnection Delays * Crosstalk Analysis * Electromigration-Induced Failure Analysis * Future Interconnections High-Speed VLSI Interconnections, Second Edition is an indispensable reference for high-speed VLSI designers, RF circuit designers, and advanced students of electrical engineering.
Author: Pascal Berthome
Publisher: Springer Science & Business Media
ISBN: 1475727917
Category : Science
Languages : en
Pages : 408
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Book Description
Optical media are now widely used in the telecommunication networks, and the evolution of optical and optoelectronic technologies tends to show that their wide range of techniques could be successfully introduced in shorter-distance interconnection systems. This book bridges the existing gap between research in optical interconnects and research in high-performance computing and communication systems, of which parallel processing is just an example. It also provides a more comprehensive understanding of the advantages and limitations of optics as applied to high-speed communications. Audience: The book will be a vital resource for researchers and graduate students of optical interconnects, computer architectures and high-performance computing and communication systems who wish to understand the trends in the newest technologies, models and communication issues in the field.
Author: G.G. Harman
Publisher: Springer Science & Business Media
ISBN: 9401151350
Category : Technology & Engineering
Languages : en
Pages : 295
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Book Description
MICROELECTRONIC INTERCONNECTIONS AND MICROASSEMBL Y WORKSHOP 18-21 May 1996, Prague, Czech Republic Conference Organizers: George Harman, NIST (USA) and Pavel Mach (Czech Republic) Summary of the Technical Program Thirty two presentations were given in eight technical sessions at the Workshop. A list of these sessions and their chairpersons is attached below. The Workshop was devoted to the technical aspects of advanced interconnections and microassembly, but also included papers on the education issues required to prepare students to work in these areas. In addition to new technical developments, several papers presented overviews predicting the future directions of these technologies. The basic issue is that electronic systems will continue to be miniaturized and at the same time performance must continue to improve. Various industry roadmaps were discussed as well as new smaller packaging and interconnection concepts. The newest chip packages are often based on the selection of an appropriate interconnection method. An example is the chip-scale package, which has horizontal (x-y) dimensions,;; 20% larger than the actual silicon chip itself. The chip is often flip-chip connected to a micro ball-grid-array, but direct chip attach was described also. Several papers described advances in the manufacture of such packages.
Author: Cher Ming Tan
Publisher: World Scientific
ISBN: 9814273325
Category : Technology & Engineering
Languages : en
Pages : 312
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Book Description
Electromigration in ULSI Interconnections provides a comprehensive description of the electromigration in integrated circuits. It is intended for both beginner and advanced readers on electromigration in ULSI interconnections. It begins with the basic knowledge required for a detailed study on electromigration, and examines the various interconnected systems and their evolution employed in integrated circuit technology. The subsequent chapters provide a detailed description of the physics of electromigration in both Al- and Cu-based Interconnections, in the form of theoretical, experimental and numerical modeling studies. The differences in the electromigration of Al- and Cu-based interconnections and the corresponding underlying physical mechanisms for these differences are explained. The test structures, testing methodology, failure analysis methodology and statistical analysis of the test data for the experimental studies on electromigration are presented in a concise and rigorous manner. Methods of numerical modeling for the interconnect electromigration and their applications to the understanding of electromigration physics are described in detail with the aspects of material properties, interconnection design, and interconnect process parameters on the electromigration performances of interconnects in ULSI further elaborated upon. Finally, the extension of the studies to narrow interconnections is introduced, and future challenges on the study of electromigration are outlined and discussed.
Author: Yoshitaka Okada
Publisher: Emerald Group Publishing
ISBN: 1801172145
Category : Business & Economics
Languages : en
Pages : 176
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Book Description
Institutional Interconnections and Cross-Boundary Cooperation in Inclusive Business explores the nature and characteristics of institutional interconnections in inclusive business and how these connections can be developed to help alleviate poverty through business activities in developing countries.
Author: Roberto Rojas-Cessa
Publisher: CRC Press
ISBN: 1315356031
Category : Computers
Languages : en
Pages : 214
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Book Description
This book introduces different interconnection networks applied to different systems. Interconnection networks are used to communicate processing units in a multi-processor system, routers in communication networks, and servers in data centers. Queuing techniques are applied to interconnection networks to support a higher utilization of resources. There are different queuing strategies, and these determine not only the performance of the interconnection network, but also the set of requirements to make them work effectively and their cost. Routing algorithms are used to find routes to destinations and directions in what information travels. Additional properties, such as avoiding deadlocks and congestion, are sought. Effective routing algorithms need to be paired up with these networks. The book will introduce the most relevant interconnection networks, queuing strategies, and routing algorithm. It discusses their properties and how these leverage the performance of the whole interconnection system. In addition, the book covers additional topics for memory management and congestion avoidance, used to extract higher performance from the interconnection network.
Author: Electrochemical Society. Dielectric Science and Technology Division
Publisher: The Electrochemical Society
ISBN: 9781566770033
Category : Technology & Engineering
Languages : en
Pages : 346
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Book Description
Papers in this volume are from the 180th ECS Meeting, held in held in Phoenix, Arizona, Fall 1991. This symposium addresses all aspects of reliability of semiconductor devices, multilevel interconnection and dielectric breakdown in VLSI and ULSI technologies. The symposium establishes reliability from design through manufacturing. The second part of the symposium addresses laser ablation/etching, laser planarization laser/UV. CVD of metal end dielectric films, laser/UV enhanced etching and deposition processesing liquid phase, and photomodification of surfaces.
Author: Cher Ming Tan
Publisher: Springer Science & Business Media
ISBN: 0857293109
Category : Technology & Engineering
Languages : en
Pages : 154
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Book Description
Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections provides a detailed description of the application of finite element methods (FEMs) to the study of ULSI interconnect reliability. Over the past two decades the application of FEMs has become widespread and continues to lead to a much better understanding of reliability physics. To help readers cope with the increasing sophistication of FEMs’ applications to interconnect reliability, Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections will: introduce the principle of FEMs; review numerical modeling of ULSI interconnect reliability; describe the physical mechanism of ULSI interconnect reliability encountered in the electronics industry; and discuss in detail the use of FEMs to understand and improve ULSI interconnect reliability from both the physical and practical perspective, incorporating the Monte Carlo method. A full-scale review of the numerical modeling methodology used in the study of interconnect reliability highlights useful and noteworthy techniques that have been developed recently. Many illustrations are used throughout the book to improve the reader’s understanding of the methodology and its verification. Actual experimental results and micrographs on ULSI interconnects are also included. Applications of Finite Element Methods for Reliability Studies on ULSI Interconnections is a good reference for researchers who are working on interconnect reliability modeling, as well as for those who want to know more about FEMs for reliability applications. It gives readers a thorough understanding of the applications of FEM to reliability modeling and an appreciation of the strengths and weaknesses of various numerical models for interconnect reliability.
