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Author:
Publisher:
ISBN:
Category : Lithography Simulation
Languages : en
Pages : 175
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Book Description
Author:
Publisher:
ISBN:
Category : Lithography Simulation
Languages : en
Pages : 175
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Book Description
Author: Chris A. Mack
Publisher: Finle Technologies Incorporated
ISBN: 9780965092203
Category : Lithography Simulation
Languages : en
Pages : 175
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Book Description
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Ernst-Christian Richter
Publisher: Herbert Utz Verlag
ISBN: 9783896758453
Category :
Languages : en
Pages : 96
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Book Description
Author: Michael Wang
Publisher: BoD – Books on Demand
ISBN: 9533070641
Category : Science
Languages : en
Pages : 680
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Book Description
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Author: CJM van Rijn
Publisher: Elsevier
ISBN: 0080512348
Category : Technology & Engineering
Languages : en
Pages : 399
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Book Description
Nano and Micro Engineered Membrane Technology is about Nano and micro engineered membrane technology, an emerging new technological area in membrane technology. Potential applications cover a broad spectrum of science, such as micro and nano filtration, gas separation, optics and nanophotonics, catalysis, microbiology, controlled drug delivery, nanopatterning, micro contact printing, atomisation, cross flow emulsification, etc. A brief overview of filtration membranes and pore structures is presented in chapter 1 and in the subsequent chapter 2 an overview is presented of conventional micro perforation methods, like laser drilling, electroforming, precision etching etc. With micro engineering techniques (chapter 3), originating from the semiconductor industry, it is relatively easy to downscale and form submicron pores (down to 100 nm) using photolithographic methods, with e.g. contact masks and wafer steppers. In chapter 4 some elementary fluid mechanics related to fluid flow in conducts and single and multiple orifices is presented covering analytical methods as well as computational fluid dynamics. Much effort has been put in strength and maximum pressure load analysis (chapter 5) of perforated and unperforated membranes. New analytical expressions were obtained that were verified by a number of computer simulations and many experiments. A separate chapter (chapter 6) has been devoted to the pioneering work of manufacturing polymeric perforated membranes because of its potential future economical impact. Large scale microfiltration applications on e.g. skim milk and lager beer are presented in chapter 7, whereas in chapter 8 a micro scale Lab-on-a-Chip microfiltration/fractionation demonstrator is discussed. Nanotechnology and nano engineered membranes is the fascinating topic of chapter 9, with typical examples as nanopatterning, nanophotonics and nanomembrane technology. This book closes with novel pioneering applications on atomization (chapter 10) for deep pulmonary inhale and cross flow emulsification (chapter 11) for the manufacturing of e.g. functional foods and nano/micro emulsions. - Overview on the implementation of nano and micro engineering techniques in membrane science; which is an upcoming new cross-road technology - Demonstration of feasibility with respect to micro and nano filtration, gas separation, photonic structures, catalysis, microbiology, controlled drug delivery, nanopatterning, micro contact printing, atomisation and emulsification techniques - Informative introductions with rules of thumb for fluid flow in micro channels, pressure strength of thin supported perforated and unperforated membranes, silicon micro machining techniques, membrane filtration technology, Rayleigh breakup and cross-flow emulsification
Author: J. Greer
Publisher: Elsevier
ISBN: 0080537219
Category : Technology & Engineering
Languages : en
Pages : 264
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Book Description
The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design.Key Features:• Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone• Current status and future trends of micro and nanoelectronics research• Written by leading experts in the corresponding research areas• Excellent tutorial for graduate students and reference for "gurus"
Author:
Publisher:
ISBN:
Category : Photoresists
Languages : en
Pages : 780
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Book Description
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author: Gorgi Kostovski
Publisher: BoD – Books on Demand
ISBN: 9533076070
Category : Science
Languages : en
Pages : 202
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Book Description
The term Lithography encompasses a range of contemporary technologies for micro and nano scale fabrication. Originally driven by the evolution of the semiconductor industry, lithography has grown from its optical origins to demonstrate increasingly fine resolution and to permeate fields as diverse as photonics and biology. Today, greater flexibility and affordability are demanded from lithography more than ever before. Diverse needs across many disciplines have produced a multitude of innovative new lithography techniques. This book, which is the final instalment in a series of three, provides a compelling overview of some of the recent advances in lithography, as recounted by the researchers themselves. Topics discussed include nanoimprinting for plasmonic biosensing, soft lithography for neurobiology and stem cell differentiation, colloidal substrates for two-tier self-assembled nanostructures, tuneable diffractive elements using photochromic polymers, and extreme-UV lithography.
