Indium–tin Oxide Films Obtained by DC Magnetron Sputtering for Improved Si Heterojunction Solar Cell Applications*Project Supported by the National High Technology Research and Development Program of China (Grant No. 2011AA050501).

Indium–tin Oxide Films Obtained by DC Magnetron Sputtering for Improved Si Heterojunction Solar Cell Applications*Project Supported by the National High Technology Research and Development Program of China (Grant No. 2011AA050501). PDF Author:
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Category :
Languages : en
Pages :

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Transparent Conducting Pure and Tin Doped Indium Oxide Films - Preparation and Characterization

Transparent Conducting Pure and Tin Doped Indium Oxide Films - Preparation and Characterization PDF Author: Dr. B. Radhakrishna
Publisher: Lulu.com
ISBN: 0359510280
Category : Education
Languages : en
Pages : 132

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Badeker in 1907 observed that some materials are optically transparent in the visible light and electrically conducting [1]. Because of the increasing interest in electrically and electronically active materials, the search for materials and the techniques for producing semi-transparent electrically conducting films have gained much importance. In an intrinsic stoichiometric material, it is not possible to have simultaneously high transparency (>80%%) in the visible region and high electrical conductivity (>103 Ω cm-1). A variety of metals in thin film form (

Optimized Indium Oxide Films Prepared by DC Magnetron Sputtering

Optimized Indium Oxide Films Prepared by DC Magnetron Sputtering PDF Author: Gady Golan
Publisher:
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Category :
Languages : en
Pages :

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Indium Tin Oxide-Magnesium Fluoride Co-Deposited Films for Spacecraft Applications

Indium Tin Oxide-Magnesium Fluoride Co-Deposited Films for Spacecraft Applications PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 22

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Sputtered Indium Tin Oxide Films for Optoelectronic Applications

Sputtered Indium Tin Oxide Films for Optoelectronic Applications PDF Author: Oleksandr Malik
Publisher:
ISBN:
Category : Technology
Languages : en
Pages :

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High-quality indium tin oxide (ITO) films have been fabricated using a DC sputtering technique in a pure argon atmosphere with a postannealing in an oxygen environment at atmosphere pressure. Structural, morphological, and electro-optical parameters of the ITO films were studied at different annealing temperatures for the films fabricated on two types of glass substrates, soda lime and alkali-free substrates. A comparative analysis shows that low-cost soda lime substrates are suitable for the fabrication of high-quality nanocrystalline ITO films after annealing them at 300°C. This result is of great importance for reducing the cost of thin film solar cells, in which ITO films serve as transparent conducting electrodes. We present a comparison of the properties of sputtered ITO films with those fabricated using a spray pyrolysis deposition technique, which is useful for some optoelectronic applications.

Growth and Characterization of Ito Thin Film by Magnetron Sputtering

Growth and Characterization of Ito Thin Film by Magnetron Sputtering PDF Author: Öcal Tuna
Publisher: LAP Lambert Academic Publishing
ISBN: 9783838365695
Category :
Languages : en
Pages : 100

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In this study Indium Tin Oxide (ITO) thin films were grown by both DC and RF magnetron sputtering techniques. To know deposition rate of ITO, system was calibrated for both DCMS and RFMS and then ITO were grown on glass substrate with the thickness of 70 nm and 40 nm by changing substrate temperature. The effect of substrate temperature, film thickness and sputtering method on structural, electrical and optical properties were investigated. The results show that substrate temperature and film thickness substantially affects the film properties, especially crystallization and resistivity. The thin films grown at the lower than 150 oC showed amorphous structure. However, crystallization was detected with the furtherincrease of substrate temperature. Band gap of ITO was calculated to be about 3.64eV at the substrate temperature of 150 oC, and itwidened with substrate temperature increment. From electrical measurements the resistivity at room temperature was obtained 1.28x10-4 and 1.29x10-4 D-cm, for DC and RF sputtered films, respectively. We also measured temperature dependence resistivity and the Hall coefficient of the films, and we calculated carrier concentration and Hall mobility."

Indium-tin-oxide Thin Film and Its Applications to Solar Cell

Indium-tin-oxide Thin Film and Its Applications to Solar Cell PDF Author: Xiaowei Gu
Publisher:
ISBN:
Category : Oxide coating
Languages : en
Pages : 228

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Characterization of DC Reactive Sputtered Indium Tin Oxide Thin Films

Characterization of DC Reactive Sputtered Indium Tin Oxide Thin Films PDF Author: Philip Infante
Publisher:
ISBN:
Category : Indium
Languages : en
Pages : 212

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Indium tin oxide (ITO) is a widely used transparent conductor due to its ability to ofer higher conductance and better etch ability over other transparent conductors. ITO has been utilized as transparent electrodes in liquid crystal displays and heterojunction solar cells, as transparent heat reflecting films, as the sensing medium in gas sensors, and in optoelectronic device applications. In general, these films are characterized by high transparency in the visible spectra, high reflectance in the IR and absorption in the UV regions, and near metallic conductivity.

Characterization of Inert Gas RF Plasma-treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering

Characterization of Inert Gas RF Plasma-treated Indium Tin Oxide Thin Films Deposited Via Pulsed DC Magnetron Sputtering PDF Author: Amber Nicole Reed
Publisher:
ISBN:
Category : Oxide coating
Languages : en
Pages : 48

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Study of Indium Tin Oxide (ITO) Thin Films Prepared by Pulsed DC Facing-target Sputtering (FTS)

Study of Indium Tin Oxide (ITO) Thin Films Prepared by Pulsed DC Facing-target Sputtering (FTS) PDF Author: Chi Keung Fung
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages :

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