Ion Implantation and Synthesis of Materials PDF Download
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Author: Michael Nastasi
Publisher: Springer Science & Business Media
ISBN: 3540452982
Category : Science
Languages : en
Pages : 271
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Book Description
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Author: Michael Nastasi
Publisher: Springer Science & Business Media
ISBN: 3540452982
Category : Science
Languages : en
Pages : 271
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Book Description
Ion implantation is one of the key processing steps in silicon integrated circuit technology. Some integrated circuits require up to 17 implantation steps and circuits are seldom processed with less than 10 implantation steps. Controlled doping at controlled depths is an essential feature of implantation. Ion beam processing can also be used to improve corrosion resistance, to harden surfaces, to reduce wear and, in general, to improve materials properties. This book presents the physics and materials science of ion implantation and ion beam modification of materials. It covers ion-solid interactions used to predict ion ranges, ion straggling and lattice disorder. Also treated are shallow-junction formation and slicing silicon with hydrogen ion beams. Topics important for materials modification, such as ion-beam mixing, stresses, and sputtering, are also described.
Author: Boyd J. Tomasetti
Publisher: Springer Nature
ISBN: 3030441997
Category : Medical
Languages : en
Pages : 334
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Book Description
This comprehensive guide to short implants will take the reader through their research and development, explain the clinical indications, evaluate the outcomes achieved with various implants, and explore restorative and laboratory considerations. Short implants have steadily gained greater market share in the last decade as practitioners sought alternatives to traditional length implants in order to avoid grafting procedures. Current manufacturers offer a variety of implant lengths and widths, allowing surgeons and restorative dentists the ability to select the best implant for each clinical circumstance. Cutting edge information is provided on the research and clinical results achieved utilizing a range of implants, specifically those developed by Nobel Biocare, Straumann, Jack Hahn, and Bicon. Readers will also find an extensive description of the role of ultra-short implants involving reconstruction in both cleft patients and cancer patients who have lost portions of their mandible and/or maxilla. This book is a must-have for those interested in learning how the use of short and ultra-short implants offers both surgeons and restorative dentists an opportunity to stand out from those that use only the traditional length implants.
Author: Gabor Kovacs
Publisher: Cambridge University Press
ISBN: 1108244386
Category : Medical
Languages : en
Pages : 217
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Book Description
The last step in the IVF treatment cycle, embryo transfer, is also the process with the highest failure rate. No matter how good the laboratory technique is, a successful pregnancy will not be achieved without meticulous preparation of the uterus to accept the embryo. This book reviews the scientific evidence on endometrial receptivity, including histological, hormonal, biochemical, and immunological factors. Practical and concise, it supports gynecologists and embryologists to make evidence-based decisions that can influence the success rates of implantation and live births. Part of a series of books offering treatments and strategies for fertility and conception to optimize IVF outcomes, this volume is for all clinicians and embryologists working in reproductive medicine.
Author: Emanuele Rimini
Publisher: Springer Science & Business Media
ISBN: 1461522595
Category : Technology & Engineering
Languages : en
Pages : 400
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Book Description
Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.
Author: Nancy M Young
Publisher: Springer
ISBN: 1493927884
Category : Medical
Languages : en
Pages : 362
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Book Description
This book will move the field of pediatric cochlear implantation forward by educating clinicians in the field as to current and emerging best practices and inspiring research in new areas of importance, including the relationship between cognitive processing and pediatric cochlear implant outcomes. The book discusses communication practices, including sign language for deaf children with cochlear implants and the role of augmentative/alternative communication for children with multiple disabilities. Focusing exclusively on cochlear implantation as it applies to the pediatric population, this book also discusses music therapy, minimizing the risk of meningitis in pediatric implant recipients, recognizing device malfunction and failure in children, perioperative anesthesia and analgesia considerations in children, and much more. Cochlear Implants in Children is aimed at clinicians, including neurotologists, pediatric otolaryngologists, audiologists and speech-language pathologists, as well as clinical scientists and educators of the deaf. The book is also appropriate for pre-and postdoctoral students, including otolaryngology residents and fellows in Neurotology and Pediatric Otolaryngology.
Author: Jason M. Franasiak
Publisher: Springer
ISBN: 331971967X
Category : Health & Fitness
Languages : en
Pages : 221
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Book Description
This unique text discusses the wide range of causes and pathophysiologic conditions contributing to recurrent implantation failure (RIF) and the current treatment approaches to best approach this challenging patient population. Beginning with a presentation of the mechanism of normal implantation, the physiologic synchrony between embryo and endometrium, and the roles of both gametes and embryos in RIF, the book then examines the various genetic, immune and environmental factors involved. Abnormalities of the hematologic and endocrine system, as well as those of the anatomy and microbiome, are described in detail. Last but no less important, the psychological stress and treatment of patients experiencing RIF is discussed. Assisted reproductive technology (ART) success has increased substantially over the past three decades. However, despite these advances, recurrent implantation failure is still a common issue confronting patients and clinicians, and RIF represents one of the greatest challenges in ART and remains a source of frustration and disappointment for patients, clinicians, and researchers involved in the process. Providing an in-depth investigation into the pathophysiology and biological mechanisms of RIF and its clinical management, this will be an excellent resource for reproductive endocrinologists and infertility specialists.
Author: M.S. Dresselhaus
Publisher: Springer Science & Business Media
ISBN: 3642771718
Category : Science
Languages : en
Pages : 212
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Book Description
Carbon has always been a unique and intriguing material from a funda mental standpoint and, at the same time, a material with many technological uses. Carbon-based materials, diamond, graphite and their many deriva tives, have attracted much attention in recent years for many reasons. Ion implantation, which has proven to be most useful in modifying the near surface properties of many kinds of materials, in particular semiconductors, has also been applied to carbon-based materials. This has yielded, mainly in the last decade, many scientifically interesting and technologically impor tant results. Reports on these studies have been published in a wide variety of journals and topical conferences, which often have little disciplinary overlap, and which often address very different audiences. The need for a review to cover in an integrated way the various diverse aspects of the field has become increasingly obvious. Such a review should allow the reader to get an overview of the research that has been done thus far, to gain an ap preciation of the common features in the response of the various carbon to ion impact, and to become aware of current research oppor allotropes tunities and unresolved questions waiting to be addressed. Realizing this, and having ourselves both contributed to the field, we decided to write a review paper summarizing the experimental and theoretical status of ion implantation into diamond, graphite and related materials.
Author: Koji Yoshinaga
Publisher: Adams Publishing Group
ISBN:
Category : Medical
Languages : en
Pages : 264
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Book Description
Author: Michael Sonick
Publisher: John Wiley & Sons
ISBN: 0470963190
Category : Medical
Languages : en
Pages : 862
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Book Description
With the desire for dental implant therapy ever escalating, clinicians are faced with the challenge of augmenting deficient natural physiology to provide effective sites for implantation. Implant Site Development helps the clinician decide if, when, and how to create a ridge site amenable to implantation. This practical book offers solutions to many implant site preservation scenarios, discussing different treatment options, timing, a variety of materials and techniques, and their application to the clinical practice. With a unique integrated clinical approach, Implant Site Development covers a range of site development techniques. Highly illustrated, Implant Site Development presents diagrams and clinical photographs to aid with clinical judgment and will prove useful for any dental professional involved in implant therapy, from general practitioners to prosthodontists, but especially surgeons. This literature-based, yet user-friendly, reference will be indispensable to the novice or veteran clinician.
Author: Stuart J. Froum
Publisher: John Wiley & Sons
ISBN: 1118976452
Category : Medical
Languages : en
Pages : 736
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Book Description
Dental implants have become one of the most popular and rapidly growing techniques for replacing missing teeth. While their predictability, functionality, and durability make them an attractive option for patients and clinicians alike, complications can arise at any stage from patient assessment to maintenance therapy. Dental Implant Complications: Etiology, Prevention, and Treatment, Second Edition, updates and expands the hallmark first edition, which was the first comprehensive reference designed to provide clinicians of all skill levels with practical instruction grounded in evidence-based research. Featuring cases from a variety of dental specialties, the book covers the most commonly occurring implant complications as well as the unique. Dental Implant Complications: Etiology, Prevention, and Treatment, Second Edition, is organized sequentially, guiding the reader through complications associated with the diagnosis, treatment planning, placement, restoration, and maintenance of implants at any stage. Complications associated with various bone augmentation and sinus lift procedures are also discussed in detail with emphasis on their etiology and prevention. Each chapter utilizes a highly illustrated and user-friendly format to showcase key pedagogical features, including a list of “take home tips” summarizing the fundamental points of each chapter. New chapters include discussions of complications from drug prescribing, implant naturalization, cemented restorations, loose implant restoration syndrome, and craniofacial growth. Readers will also find more case presentations to see how complications have been managed in real-world situations. Dental Implant Complications: Etiology, Prevention, and Treatment, Second Edition, brings together contributions from leading experts in the field under the superior editorship of Dr. Stuart Froum. With its pragmatic approach to preventing and managing implant complications, this expertly crafted text continues to serve as an indispensable clinical reference and guide for all dentists placing or restoring implants.
