Handbook of VLSI Microlithography, 2nd Edition PDF Download
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Author: John N. Helbert
Publisher: Cambridge University Press
ISBN: 0080946801
Category : Technology & Engineering
Languages : en
Pages : 1026
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Book Description
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author: John N. Helbert
Publisher: Cambridge University Press
ISBN: 0080946801
Category : Technology & Engineering
Languages : en
Pages : 1026
Get Book Here
Book Description
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Author: Ellis Meng
Publisher: CRC Press
ISBN: 1420051237
Category : Medical
Languages : en
Pages : 410
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Book Description
Poised to dramatically impact human health, biomedical microsystems (bioMEMS) technologies incorporate various aspects from materials science, biology, chemistry, physics, medicine, and engineering. Reflecting the highly interdisciplinary nature of this area, Biomedical Microsystems covers the fundamentals of miniaturization, biomaterials, microfabrication, and nanotechnology, along with relevant applications. Written by an active researcher who was recently named one of Technology Review’s Young Innovators Under 35, the book begins with an introduction to the benefits of miniaturization. It then introduces materials, fabrication technology, and the necessary components of all bioMEMS. The author also covers fundamental principles and building blocks, including microfluidic concepts, lab-on-a-chip systems, and sensing and detection methods. The final chapters explore several important applications of bioMEMS, such as microdialysis, catheter-based sensors, MEMS implants, neural probes, and tissue engineering. For readers with a limited background in MEMS and bioMEMS, this book provides a practical introduction to the technology used to make these devices, the principles that govern their operation, and examples of their application. It offers a starting point for understanding advanced topics and encourages readers to begin to formulate their own ideas about the design of novel bioMEMS. A solutions manual is available for instructors who want to convert this reference to classroom use.
Author: Paul H. Holloway
Publisher: Cambridge University Press
ISBN: 0080946143
Category : Technology & Engineering
Languages : en
Pages : 937
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Book Description
This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 081551770X
Category : Technology & Engineering
Languages : en
Pages : 363
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Book Description
Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.
Author: Terry W. McDaniel
Publisher: Elsevier
ISBN: 0815517599
Category : Technology & Engineering
Languages : en
Pages : 967
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Book Description
This handbook brings together in a single volume expert contributions on the many aspects of MO data recording, including the materials in use, techniques for achieving recording function, and storage device subsystems. As a multiple author treatment, it brings perspective from many viewpoints and institutions. The insights delivered should be valuable to a wide audience from students to practitioners in all areas of information storage.
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517394
Category : Technology & Engineering
Languages : en
Pages : 420
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Book Description
This book is a review of the science and technology of the element carbon and its allotropes: graphite, diamond and the fullerenes. This field has expanded greatly in the last three decades stimulated by many major discoveries such as carbon fibers, low-pressure diamond, and the fullerenes. The need for such a book has been felt for some time. These carbon materials are very different in structure and properties. Some are very old (charcoal), others brand new (the fullerenes). They have different applications and markets and are produced by different segments of the industry.Few studies are available that attempt to review the entire field of carbon as a whole discipline. Moreover these studies were written several decades ago and a generally outdated since the development of the technology is moving very rapidly and scope of applications is constantly expanding and reaching into new fields such as aerospace, automotive, semiconductors, optics, and electronics. In this book the author provides a valuable, up-to-date account of both the newer and traditional forms of carbon, both naturally occurring and man-made. This volume will be a valuable resource for both specialists in, and occasional users of carbon materials.
Author: Raymond L. Boxman
Publisher: William Andrew
ISBN: 0815517793
Category : Technology & Engineering
Languages : en
Pages : 775
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Book Description
This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
Author: Chue San Yoo
Publisher: World Scientific
ISBN: 9812568239
Category : Technology & Engineering
Languages : en
Pages : 483
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Book Description
This textbook contains all the materials that an engineer needs to know to start a career in the semiconductor industry. It also provides readers with essential background information for semiconductor research. It is written by a professional who has been working in the field for over two decades and teaching the material to university students for the past 15 years. It includes process knowledge from raw material preparation to the passivation of chips in a modular format.
Author: William R. Acorn
Publisher: William Andrew
ISBN: 0815513380
Category : Law
Languages : en
Pages : 375
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Book Description
Facilities which utilize hazardous liquids and gases represent a significant potential liability to the owner, operator, and general public in terms of personnel safety and preservation of assets. It is obvious that a catastrophic incident or loss of property or personnel is to be avoided at all costs. This book was conceived to give the reader a guide to understanding the requirements of the various codes and regulations that apply to the design, construction, and operation of facilities utilizing hazardous materials in their processes.
Author: Robin F.C. Farrow
Publisher: Elsevier
ISBN: 0815518404
Category : Technology & Engineering
Languages : en
Pages : 795
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Book Description
In this volume, the editor and contributors describe the use of molecular beam epitaxy (MBE) for a range of key materials systems that are of interest for both technological and fundamental reasons. Prior books on MBE have provided an introduction to the basic concepts and techniques of MBE and emphasize growth and characterization of GaAs-based structures. The aim in this book is somewhat different; it is to demonstrate the versatility of the technique by showing how it can be utilized to prepare and explore a range of distinct and diverse materials. For each of these materials systems MBE has played a key role both in their development and application to devices.
