Handbook of Ellipsometry PDF Download
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Author: Harland Tompkins
Publisher: William Andrew
ISBN: 0815517475
Category : Science
Languages : en
Pages : 887
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Book Description
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
Author: Harland Tompkins
Publisher: William Andrew
ISBN: 0815517475
Category : Science
Languages : en
Pages : 887
Get Book Here
Book Description
The Handbook of Ellipsometry is a critical foundation text on an increasingly critical subject. Ellipsometry, a measurement technique based on phase and amplitude changes in polarized light, is becoming popular in a widening array of applications because of increasing miniaturization of integrated circuits and breakthroughs in knowledge of biological macromolecules deriving from DNA and protein surface research. Ellipsometry does not contact or damage samples, and is an ideal measurement technique for determining optical and physical properties of materials at the nano scale. With the acceleration of new instruments and applications now occurring, this book provides an essential foundation for the current science and technology of ellipsometry for scientists and engineers in industry and academia at the forefront of nanotechnology developments in instrumentation, integrated circuits, biotechnology, and pharmaceuticals. Divided into four parts, this comprehensive handbook covers the theory of ellipsometry, instrumentation, applications, and emerging areas. Experts in the field contributed to its twelve chapters, covering various aspects of ellipsometry.
Author: Mahmood Aliofkhazraei
Publisher: Elsevier
ISBN: 044463245X
Category : Science
Languages : en
Pages : 500
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Book Description
Handbook of Modern Coating Technologies: Advanced Characterization Methods reviews advanced characterization methods of modern coating technologies. The topics in this volume consist of scanning vibrating electrode technique, spectroscopic ellipsometry, advances in X-ray diffraction, neutron reflectivity, micro- and nanoprobes, fluorescence technique, stress measurement methods in thin films, micropotentiometry, and localized corrosion studies.
Author: Michael Bass
Publisher: McGraw Hill Professional
ISBN: 0071629254
Category : Technology & Engineering
Languages : en
Pages : 1251
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Book Description
The most comprehensive and up-to-date optics resource available Prepared under the auspices of the Optical Society of America, the five carefully architected and cross-referenced volumes of the Handbook of Optics, Third Edition, contain everything a student, scientist, or engineer requires to actively work in the field. From the design of complex optical systems to world-class research and development methods, this definitive publication provides unparalleled access to the fundamentals of the discipline and its greatest minds. Individual chapters are written by the world's most renowned experts who explain, illustrate, and solve the entire field of optics. Each volume contains a complete chapter listing for the entire Handbook, extensive chapter glossaries, and a wealth of references. This pioneering work offers unprecedented coverage of optics data, techniques, and applications. Volume I covers geometrical and physical optics, polarized light, components, and instruments.
Author: Toru Yoshizawa
Publisher: CRC Press
ISBN: 1351831844
Category : Technology & Engineering
Languages : en
Pages : 866
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Book Description
Handbook of Optical Metrology: Principles and Applications begins by discussing key principles and techniques before exploring practical applications of optical metrology. Designed to provide beginners with an introduction to optical metrology without sacrificing academic rigor, this comprehensive text: Covers fundamentals of light sources, lenses, prisms, and mirrors, as well as optoelectronic sensors, optical devices, and optomechanical elements Addresses interferometry, holography, and speckle methods and applications Explains Moiré metrology and the optical heterodyne measurement method Delves into the specifics of diffraction, scattering, polarization, and near-field optics Considers applications for measuring length and size, displacement, straightness and parallelism, flatness, and three-dimensional shapes This new Second Edition is fully revised to reflect the latest developments. It also includes four new chapters—nearly 100 pages—on optical coherence tomography for industrial applications, interference microscopy for surface structure analysis, noncontact dimensional and profile metrology by video measurement, and optical metrology in manufacturing technology.
Author: Toru Yoshizawa
Publisher: CRC Press
ISBN: 1420019511
Category : Science
Languages : en
Pages : 746
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Book Description
The field of optical metrology offers a wealth of both practical and theoretical accomplishments, and can cite any number of academic papers recording such. However, while several books covering specific areas of optical metrology do exist, until the pages herein were researched, written, and compiled, the field lacked for a comprehensive handbook, one providing an overview of optical metrology that covers practical applications as well as fundamentals. Carefully designed to make information accessible to beginners without sacrificing academic rigor, the Handbook of Optical Metrology: Principles and Applications discusses fundamental principles and techniques before exploring practical applications. With contributions from veterans in the field, as well as from up-and-coming researchers, the Handbook offers 30 substantial and well-referenced chapters. In addition to the introductory matter, forward-thinking descriptions are included in every chapter that make this a valuable reference for all those involved with optical metrology.
Author: Edward D. Palik
Publisher:
ISBN:
Category : Optical constants
Languages : en
Pages : 838
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Book Description
Author: Harland G. Tompkins
Publisher: Momentum Press
ISBN: 1606507281
Category : Technology & Engineering
Languages : en
Pages : 138
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Book Description
Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.
Author: Edward D. Palik
Publisher: Academic Press
ISBN: 0080556302
Category : Science
Languages : en
Pages : 1121
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Book Description
This handbook--a sequel to the widely used Handbook of Optical Constants of Solids--contains critical reviews and tabulated values of indexes of refraction (n) and extinction coefficients (k) for almost 50 materials that were not covered in the original handbook. For each material, the best known n and k values have been carefully tabulated, from the x-ray to millimeter-wave region of the spectrum by expert optical scientists. In addition, the handbook features thirteen introductory chapters that discuss the determination of n and k by various techniques.* Contributors have decided the best values for n and k* References in each critique allow the reader to go back to the original data to examine and understand where the values have come from* Allows the reader to determine if any data in a spectral region needs to be filled in* Gives a wide and detailed view of experimental techniques for measuring the optical constants n and k* Incorporates and describes crystal structure, space-group symmetry, unit-cell dimensions, number of optic and acoustic modes, frequencies of optic modes, the irreducible representation, band gap, plasma frequency, and static dielectric constant
Author: Zhe Chuan Feng
Publisher: Taylor & Francis
ISBN: 143985582X
Category : Science
Languages : en
Pages : 992
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Book Description
Through their application in energy-efficient and environmentally friendly devices, zinc oxide (ZnO) and related classes of wide gap semiconductors, including GaN and SiC, are revolutionizing numerous areas, from lighting, energy conversion, photovoltaics, and communications to biotechnology, imaging, and medicine. With an emphasis on engineering a
Author: Alain C. Diebold
Publisher: CRC Press
ISBN: 0203904540
Category : Technology & Engineering
Languages : en
Pages : 703
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Book Description
Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs, this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay
