Further Development of Soft X-ray Scanning Microscopy with Anelliptical Undulator at the Advanced Light Source PDF Download
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Languages : en
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Soft x-ray scanning microscopy (1) is under continuing development at the Advanced Light Source. Significant progress has been made implementing new scan control systems in both operational microscopes (2) and they now operate at beam lines 5.3.2 and 11.0.2 with interferometer servo scanning and stabilization. The interferometer servo loop registers the images on a universal x/y coordinate system and locks the x-ray spot on selected features for spectro-microscopic studies. At the present time zone plates are in use with 35nm outer zone width and the imaging spatial resolution is at the diffraction limit of these lenses. Current research programs are underway in areas of polymer chemistry, environmental chemistry and materials science. A dedicated polymer STXM is in operation on a bend magnet beam line (4) and is the subject of a separate article (3) in this issue. Here we focus on the capabilities of STXM at a new beam line that employs an elliptical undulator (5) to give control of the polarization of the x-ray beam. This facility is in the process of commissioning and some results are available, other capabilities will be developed during the first half of 2003.
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Languages : en
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Book Description
Soft x-ray scanning microscopy (1) is under continuing development at the Advanced Light Source. Significant progress has been made implementing new scan control systems in both operational microscopes (2) and they now operate at beam lines 5.3.2 and 11.0.2 with interferometer servo scanning and stabilization. The interferometer servo loop registers the images on a universal x/y coordinate system and locks the x-ray spot on selected features for spectro-microscopic studies. At the present time zone plates are in use with 35nm outer zone width and the imaging spatial resolution is at the diffraction limit of these lenses. Current research programs are underway in areas of polymer chemistry, environmental chemistry and materials science. A dedicated polymer STXM is in operation on a bend magnet beam line (4) and is the subject of a separate article (3) in this issue. Here we focus on the capabilities of STXM at a new beam line that employs an elliptical undulator (5) to give control of the polarization of the x-ray beam. This facility is in the process of commissioning and some results are available, other capabilities will be developed during the first half of 2003.
Author: Challa S.S.R. Kumar
Publisher: Springer
ISBN: 3662486067
Category : Technology & Engineering
Languages : en
Pages : 835
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Fifth volume of a 40 volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about X-ray and Neutron Techniques for Nanomaterials Characterization. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
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Languages : en
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A variety of systems for performing spectromicroscopy, spatially resolved spectroscopy, are in operation or under construction at the Advanced Light Source (ALS). For example, part of the program is centered around the surface analysis problems of local semiconductor industries, and this has required the construction of a microscope with wafer handling, fiducialization, optical microscopy, coordinated ion beam etching, and X-ray Photoelectron Spectroscopy (XPS) integrated in this case with Kirkpatrick-Baez (K-B) grazing incidence micro-focusing optics. The microscope is to be used in conjunction with a highly efficient entrance slitless Spherical Grating Monochromator (SGM). The design and expected performance of this instrument will be described, with emphasis on the production of the elliptically curved surfaces of the K-B mirrors by elastic bending of flat mirror substrates. For higher resolution, zone-plate (Z-P) focusing optics are used and one instrument, a Scanning Transmission X-ray Microscope (STXM) is in routine operation on undulator beamline 7.0. A second Z-P based system is being commissioned on the same beamline, and differs from the STXM in that it will operate at Ultra-High Vacuum (UHV) and will be able to perform XPS at 0.1[micro]m spatial resolution. Spatially resolved X-ray Absorption Spectroscopy (XAS) can be performed by imaging electrons photoemitted from a material with a Photo-Emission Electron Microscope (PEEM). The optical requirements of a beamline designed for PEEM are very different to those of micro-focus systems and they give examples of bending magnet and undulator based instruments.
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Languages : en
Pages : 29
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Several third generation synchrotron radiation facilities are now operational and the high brightness of these photon sources offers new opportunities for x-ray microscopy. Well developed synchrotron radiation spectroscopy techniques are being applied in new instruments capable of imaging the surface of a material with a spatial resolution smaller than one micron. There are two aspects to this. One is to further the field of surface science by exploring the effects of spatial variations across a surface on a scale not previously accessible to x-ray measurements. The other is to open up new analytical techniques in materials science using x-rays, on a spatial scale comparable to that of the processes or devices to be studied. The development of the spectromicroscopy program at the Advanced Light Source will employ a variety of instruments, some are already operational. Their development and use will be discussed, and recent results will be presented to illustrate their capabilities.
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Languages : en
Pages : 20
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Third generation synchrotron sources of soft x-rays provide an excellent opportunity to apply established x-ray spectroscopic materials analysis techniques to surface imaging on a sub-micron scale. This paper describes an effort underway at the Advanced Light Source (ALS) to pursue this development using Fresnel zone plate lenses. These are used to produce a sub-micron spot of x-rays for use in scanning microscopy. Several groups have developed microscopes using this technique. A specimen is rastered in the focused x-ray spot and a detector signal is acquired as a function of position to generate an image. Spectroscopic capability is added by holding the small spot on a feature of interest and scanning through the spectrum. The authors are pursuing two spectroscopic techniques: Near Edge X-ray Absorption Spectroscopy (NEXAFS), X-ray Photoelectron Spectroscopy (XPS) which together provide a powerful capability for light element analysis in materials science.
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Languages : en
Pages : 5
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The brightness of the Advanced Light Source will be exploited by several new instruments for materials science spectromicroscopy over the next year or so. The first of these to become operational is a scanning transmission x-ray microscope with which near edge x-ray absorption spectra (NEXAFS) can be measured on spatial features of sub-micron size. Here the authors describe the instrument as it is presently implemented, its capabilities, some studies made to date and the developments to come. The Scanning Transmission X-ray Microscope makes use of a zone plate lens to produce a small x-ray spot with which to perform absorption spectroscopy through thin samples. The x-ray beam from ALS undulator beamline 7.0 emerges into the microscope vessel through a silicon nitride vacuum window 160nm thick and 300[mu]m square. The vessel is filled with helium at atmospheric pressure. The zone plate lens is illuminated 1mm downstream from the vacuum window and forms an image in first order of a pinhole which is 3m upstream in the beamline. An order sorting aperture passes the first order converging light and blocks the unfocused zero order. The sample is at the focus a few mm downstream of the zone plate and mounted from a scanning piezo stage which rasters in x and y so that an image is formed, pixel by pixel, by an intensity detector behind the sample. Absorption spectra are measured point-by-point as the photon energy is scanned by rotating the diffraction grating in the monochromator and changing the undulator gap.
Author: Anne Eugenie Sakdinawat
Publisher:
ISBN:
Category :
Languages : en
Pages : 270
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Author: A.G. Michette
Publisher: Springer
ISBN:
Category : Science
Languages : en
Pages : 352
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A fundamental problem in cell biology is the cause of aging. The solution to this problem has not yet been obtained because,(l) until recently, it was not possible to image living cells directly. The use of low-energy (soft) X rays has made such imaging possible, perhaps thereby allowing the aging process to be understood and possibly overcome (a result that may well generate further social, moral, and ethical problems). Fortun ately this is not the only aspect of cell biology amenable to soft X-ray imaging, and it is envisaged that many less controversial studies--such as investigations of the detailed differences between healthy and diseased or malignant cells (in their natural states) and processes of cell division and growth-will be made possible. The use of soft X rays is not limited to biological studies-many applications are possible in, for example, fusion research, materials science, and astronomy. Such studies have only recently begun in earnest because several difficulties had to be overcome, major among these being the lack (for some purposes) of sufficiently intense sources, and the technological difficulties associated with making efficient optical systems. As is well known, the advent of dedicated synchrotron radiation sources, in particular, has alleviated the first of these difficulties, not just for the soft X-ray region. It is the purpose of this book to consider progress in the second.
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Languages : en
Pages : 0
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This AFOSR grant has been used to support graduate students in the areas of coherence and microscopy at soft x-ray wavelengths. Techniques were developed for characterizing the spatial coherence of undulator radiation, table top soft x-ray lasers, and high harmonic generation of femtosecond pulses at short wavelengths, all in the 1-50 nm wavelength regime. With varying additional attributes, all three sources provide radiation exhibiting a high degree of spatial coherence. In the area of high resolution soft x-ray microscopy, a spatial resolution of 23 nanometers has been demonstrated using new, best-in-the-world, Fresnel zone plate lenses, special nanometer test patterns, and bending magnet radiation in the 1-4 nm region. State-of-the-art images have been obtained of magnetic recording materials with sub-5O nm domains, cryo-prepared biological samples showing detailed views of cells and sub-cellular structures, and modern nanochip interconnects. A new text has been published: D. Attwood, "Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications" (Cambridge Univ. Press, UK 2000). Several reprints are attached: "Soft X-ray Microscopy to 25 nm with Applications to Biology and Magnetic Materials" (NIM A, v467-468, p841-844, 2001); "Spatial Coherence and Properties of Undulator Radiation Based on Thompson-Wolf Two-pinhole Measurement" (NIM A, v467-468, p913-916, 2001); "Spatial Coherence Characterization of Undulator Radiation" (Optics Communications, v182, p25-34, 2000); "Achievement of Essentially Full Spatial Coherence in a High-Average-Power Soft X-ray Laser" (Phys. Rev. A, v63 n3, p33802-1 to 33802-5, 2001); "Nanofabrication and Diffractive Optics for High-Resolution X-ray Applications" (J. Vac. Sci. Technol. B, v18 n6, p2970-2975, Nov-Dec 2000); "High-Resolution Soft X-ray Microscopy" (Proc. of SPIE Reprint, v4146, p171-175, 2000); "Experimental Analysis of High-Resolution Soft X-ray Microscopy" (Proc. of SPIE Reprint, v4499, p134-141, 2001).7.
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Languages : en
Pages : 25
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The universal trend towards device miniaturization has driven the semiconductor industry to develop sophisticated and complex instrumentation for the characterization of microstructures. Many significant problems of relevance to the semiconductor industry cannot be solved with conventional analysis techniques, but can be addressed with soft x-ray spectromicroscopy. An active spectromicroscopy program is being developed at the Advanced Light Source, attracting both the semiconductor industry and the materials science academic community. Examples of spectromicroscopy techniques are presented. An ALS [mu]-XPS spectromicroscopy project is discussed, involving the first microscope completely dedicated and designed for microstructure analysis on patterned silicon wafers.
