Author: R. A. Street
Publisher: Cambridge University Press
ISBN: 9780521019347
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
Divided roughly into two parts, the book describes the physical properties and device applications of hydrogenated amorphous silicon. The first section is concerned with the atomic and electronic structure, and covers growth defects and doping and defect reactions. The emphasis is on the optical and electronic properties that result from the disordered structure. The second part of the book describes electronic conduction, recombination, interfaces, and multilayers. The special attribute of a-Si:H which makes it useful is the ability to deposit the material inexpensively over large areas, while retaining good semiconducting properties, and the final chapter discusses various applications and devices.
Hydrogenated Amorphous Silicon
Author: R. A. Street
Publisher: Cambridge University Press
ISBN: 9780521019347
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
Divided roughly into two parts, the book describes the physical properties and device applications of hydrogenated amorphous silicon. The first section is concerned with the atomic and electronic structure, and covers growth defects and doping and defect reactions. The emphasis is on the optical and electronic properties that result from the disordered structure. The second part of the book describes electronic conduction, recombination, interfaces, and multilayers. The special attribute of a-Si:H which makes it useful is the ability to deposit the material inexpensively over large areas, while retaining good semiconducting properties, and the final chapter discusses various applications and devices.
Publisher: Cambridge University Press
ISBN: 9780521019347
Category : Technology & Engineering
Languages : en
Pages : 432
Book Description
Divided roughly into two parts, the book describes the physical properties and device applications of hydrogenated amorphous silicon. The first section is concerned with the atomic and electronic structure, and covers growth defects and doping and defect reactions. The emphasis is on the optical and electronic properties that result from the disordered structure. The second part of the book describes electronic conduction, recombination, interfaces, and multilayers. The special attribute of a-Si:H which makes it useful is the ability to deposit the material inexpensively over large areas, while retaining good semiconducting properties, and the final chapter discusses various applications and devices.
Focus on Amorphous Silicon
Author: Solar Energy Research Institute
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Plasma Deposition of Amorphous Silicon-Based Materials
Author: Pio Capezzuto
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
The Physics and Applications of Amorphous Semiconductors
Author: Arun Madan
Publisher: Elsevier
ISBN: 0080924433
Category : Science
Languages : en
Pages : 558
Book Description
This comprehensive, detailed treatise on the physics and applications of the new emerging technology of amorphous semiconductors focuses on specific device research problems such as the optimization of device performance. The first part of the book presents hydrogenated amorphous silicon type alloys, whose applications include inexpensive solar cells, thin film transistors, image scanners, electrophotography, optical recording and gas sensors. The second part of the book discusses amorphous chalcogenides, whose applications include electrophotography, switching, and memory elements. This book will serve as an excellent reference source for solid state scientists and engineers, and as a useful self-contained introduction to the field for graduate students.
Publisher: Elsevier
ISBN: 0080924433
Category : Science
Languages : en
Pages : 558
Book Description
This comprehensive, detailed treatise on the physics and applications of the new emerging technology of amorphous semiconductors focuses on specific device research problems such as the optimization of device performance. The first part of the book presents hydrogenated amorphous silicon type alloys, whose applications include inexpensive solar cells, thin film transistors, image scanners, electrophotography, optical recording and gas sensors. The second part of the book discusses amorphous chalcogenides, whose applications include electrophotography, switching, and memory elements. This book will serve as an excellent reference source for solid state scientists and engineers, and as a useful self-contained introduction to the field for graduate students.
Technology and Applications of Amorphous Silicon
Author: Robert A. Street
Publisher: Springer Science & Business Media
ISBN: 3662041413
Category : Technology & Engineering
Languages : en
Pages : 429
Book Description
This book gives the first systematic and complete survey of technology and application of amorphous silicon, a material with a huge potential in electronic applications. The book features contributions by world-wide leading researchers in this field.
Publisher: Springer Science & Business Media
ISBN: 3662041413
Category : Technology & Engineering
Languages : en
Pages : 429
Book Description
This book gives the first systematic and complete survey of technology and application of amorphous silicon, a material with a huge potential in electronic applications. The book features contributions by world-wide leading researchers in this field.
Photovoltaic Material and Device Measurements
Author: T. Coutts
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Plasma Deposition of Amorphous Silicon-based Materials
Author: Giovanni Bruno
Publisher:
ISBN: 9780121379407
Category : Science
Languages : en
Pages : 324
Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Publisher:
ISBN: 9780121379407
Category : Science
Languages : en
Pages : 324
Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Key Features * Focuses on the plasma chemistry of amorphous silicon-based materials * Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced * Features an international group of contributors * Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Amorphous and Nanocrystalline Silicon Science and Technology 2005: Volume 862
Author: Robert W. Collins
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 760
Book Description
This book continues the long-standing and highly successful series on amorphous silicon science and technology. The opening article honors the pioneering use of photons to probe silicon films and provides an historical overview of optical absorption for studies of the Urbach edge and disorder. Additional invited presentations focus on new approaches for the fabrication of higher stability amorphous silicon-based materials and solar cells, and on the characterization of materials and cells both structurally and electronically. The book includes topics relevant to solar cells, including the role of hydrogen in metastability phenomena and deposition processes, and the application of atomistic material simulations in elucidating film growth mechanisms and structure as characterized by in situ probes. Chapters are devoted to nanostructures, such as quantum dots and wires, and to nano/microcrystalline and poly/single crystalline films, the latter involving new concepts in crystalline grain growth and epitaxy. Device applications are also highlighted, such as thin-film transistors, solar cells, and image sensors, operable on the meter scale, to memories, operable on the nanometer scale.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 760
Book Description
This book continues the long-standing and highly successful series on amorphous silicon science and technology. The opening article honors the pioneering use of photons to probe silicon films and provides an historical overview of optical absorption for studies of the Urbach edge and disorder. Additional invited presentations focus on new approaches for the fabrication of higher stability amorphous silicon-based materials and solar cells, and on the characterization of materials and cells both structurally and electronically. The book includes topics relevant to solar cells, including the role of hydrogen in metastability phenomena and deposition processes, and the application of atomistic material simulations in elucidating film growth mechanisms and structure as characterized by in situ probes. Chapters are devoted to nanostructures, such as quantum dots and wires, and to nano/microcrystalline and poly/single crystalline films, the latter involving new concepts in crystalline grain growth and epitaxy. Device applications are also highlighted, such as thin-film transistors, solar cells, and image sensors, operable on the meter scale, to memories, operable on the nanometer scale.
Amorphous and Heterogeneous Silicon-Based Films - 2002: Volume 715
Author: J. David Cohen
Publisher: Cambridge University Press
ISBN: 9781558996519
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
This book on amorphous silicon technology shows a trend towards technologies based on amorphous and heterogeneous silicon (solar cells, TFTs, imaging arrays, sensors, etc.) and brings together researchers from around the world to share their expanding expertise. The book contains eleven chapters and focuses on basic mechanisms of growth (as well as new approaches to film growth); hot wire, CVD-produced amorphous and microcrystalline films and related subjects of film crystallization and recrystallization; the electronic structure and transport properties of silicon-based thin films are discussed, together with hydrogen microstructure and metastability. Silicon nitride, four on alloys with germanium, and two dealing predominantly with silicon carbide are looked at. There is also focus on photovoltaic devices based on either amorphous or microcrystalline (or mixed phase) materials. It also offers a look at thin-film transistors, as well as related types of imaging and sensing arrays and there are papers on novel device structures and new types of technologies being developed using amorphous/heterogeneous thin film, silicon-based materials.
Publisher: Cambridge University Press
ISBN: 9781558996519
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
This book on amorphous silicon technology shows a trend towards technologies based on amorphous and heterogeneous silicon (solar cells, TFTs, imaging arrays, sensors, etc.) and brings together researchers from around the world to share their expanding expertise. The book contains eleven chapters and focuses on basic mechanisms of growth (as well as new approaches to film growth); hot wire, CVD-produced amorphous and microcrystalline films and related subjects of film crystallization and recrystallization; the electronic structure and transport properties of silicon-based thin films are discussed, together with hydrogen microstructure and metastability. Silicon nitride, four on alloys with germanium, and two dealing predominantly with silicon carbide are looked at. There is also focus on photovoltaic devices based on either amorphous or microcrystalline (or mixed phase) materials. It also offers a look at thin-film transistors, as well as related types of imaging and sensing arrays and there are papers on novel device structures and new types of technologies being developed using amorphous/heterogeneous thin film, silicon-based materials.
Amorphous and Microcrystalline Silicon Technology - 1998:
Author: Ruud Schropp
Publisher: Cambridge University Press
ISBN: 9781107413603
Category : Technology & Engineering
Languages : en
Pages : 1034
Book Description
Although this is the 16th volume in a long-standing and successful series, the focus is no longer limited to hydrogenated amorphous silicon (a-Si:H). The distinction between short- and medium-range order, and between homogeneous and heterogeneous semiconductor materials, is indeed too difficult to maintain. Instead, the volume covers amorphous and microcrystalline silicon from materials physics to new applications. Papers from a joint session with a symposium on Flat-Panel Display Materials and Large-Area Processes are included. The volume also features special focused sessions on heterogeneous materials, color sensors and radiation imaging, and parameter extraction and device modelling. Topics include: amorphous and polycrystalline thin-film transistors; solar cells; color and X-ray sensors, novel devices, luminescence and sensitization; device modelling and parameter extraction; growth, alloys and clathrates; metastability, hydrogen, atomic and electronic structure; defects and charge transport; and heterogeneous silicon - formation, properties and devices.
Publisher: Cambridge University Press
ISBN: 9781107413603
Category : Technology & Engineering
Languages : en
Pages : 1034
Book Description
Although this is the 16th volume in a long-standing and successful series, the focus is no longer limited to hydrogenated amorphous silicon (a-Si:H). The distinction between short- and medium-range order, and between homogeneous and heterogeneous semiconductor materials, is indeed too difficult to maintain. Instead, the volume covers amorphous and microcrystalline silicon from materials physics to new applications. Papers from a joint session with a symposium on Flat-Panel Display Materials and Large-Area Processes are included. The volume also features special focused sessions on heterogeneous materials, color sensors and radiation imaging, and parameter extraction and device modelling. Topics include: amorphous and polycrystalline thin-film transistors; solar cells; color and X-ray sensors, novel devices, luminescence and sensitization; device modelling and parameter extraction; growth, alloys and clathrates; metastability, hydrogen, atomic and electronic structure; defects and charge transport; and heterogeneous silicon - formation, properties and devices.