Floating Substrate Process Large-area Silicon Task, Low-cost Solar Array Project PDF Download
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Languages : en
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Author: M. Garfinkel
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Category :
Languages : en
Pages : 92
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Author: M. Garfinkel
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Category : Silane
Languages : en
Pages : 0
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Author: M. Garfinkel
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Category :
Languages : en
Pages : 0
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Languages : en
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The work described was directed toward the demonstration of the practical feasibility of the Floating Substrate Process for the growth of silicon sheet. Supercooling of silicon--tin alloy melts was studied. Values as high as 78°C at 1100°C and 39°C at 1200°C were observed, corresponding to supersaturation parameter values 0.025 and 0.053 at 1050°C and 1150°C, respectively. The interaction of tin with silane gas streams was investigated over the temperature range 1000 to 1200°C. Single-pass conversion efficiencies exceeding 30% were obtained. The growth habit of spontaneously-nucleated surface growth was determined to be consistent with dendritic and web growth from 111 singly-twinned triangular nucleii. Surface growth of interlocking silicon crystals, thin enough to follow the surface of the liquid and with growth velocity as high as 5 mm/min, was obtained. Large area single-crystal growth along the melt surface was not achieved. Small single-crystal surface growth was obtained which did not propagate beyond a few millimeters. The probable reason for the polycrystalline growth is the poisoning of the growth interface by impurities.
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Languages : en
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The Seeded Growth Furnace was completed and operated extensively during the third quarter. Optimum thermal geometry, gas flows, and withdrawal rates are being determined. Surface growth was obtained having growth velocity as high as 5 to 6 mm/min. The surface growth has generally taken the form of interlocking crystals and is thin enough to follow the liquid surface. Its thickness has been determined in one case to be 20 microns. A molybdenum susceptor has been made for the seeded growth furnace. It is anticipated that this new design will eliminate the problems caused by films on the melt and seed crystal and lead to improved crystal structure in the silicon growth. A series of experiments were performed in order to determine whether the reactor gas streams were sources of contamination. Nitrogen reacts with silicon at 1100°C to coat its surface with a film 30 to 150A thick. Silicon heated in hydrogen at temperatures between 1000 and 1200°C maintains a very clean, film-free surface.
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Category : Solar energy
Languages : en
Pages : 704
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Author: United States. Superintendent of Documents
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Category : Government publications
Languages : en
Pages : 1250
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February issue includes Appendix entitled Directory of United States Government periodicals and subscription publications; September issue includes List of depository libraries; June and December issues include semiannual index
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Category : Aeronautics
Languages : en
Pages : 1068
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Author: United States. Energy Research and Development Administration
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Category : Medicine
Languages : en
Pages : 852
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