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Author: Guelph Public Library
Publisher: Lulu.com
ISBN: 1928171702
Category : Fiction
Languages : en
Pages : 120
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Book Description
ETCH 2018 is a collection of stories written for the Guelph Public Library's 2018 Teen Writing Contest. There's a story about a ruler hunted by an assassin in her own castle, about a boy whose life is changed by a flat tire, and about a girl who inherits her grandfather's love of records. There's a story here for everyone, so have a look and discover the one that's waiting for you.
Author: Guelph Public Library
Publisher: Lulu.com
ISBN: 1928171702
Category : Fiction
Languages : en
Pages : 120
Get Book Here
Book Description
ETCH 2018 is a collection of stories written for the Guelph Public Library's 2018 Teen Writing Contest. There's a story about a ruler hunted by an assassin in her own castle, about a boy whose life is changed by a flat tire, and about a girl who inherits her grandfather's love of records. There's a story here for everyone, so have a look and discover the one that's waiting for you.
Author: Steve Suib
Publisher: Frontiers Media SA
ISBN: 2889635805
Category :
Languages : en
Pages : 910
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Book Description
The Frontiers in Chemistry Editorial Office team are delighted to present the inaugural “Frontiers in Chemistry: Rising Stars” article collection, showcasing the high-quality work of internationally recognized researchers in the early stages of their independent careers. All Rising Star researchers featured within this collection were individually nominated by the Journal’s Chief Editors in recognition of their potential to influence the future directions in their respective fields. The work presented here highlights the diversity of research performed across the entire breadth of the chemical sciences, and presents advances in theory, experiment and methodology with applications to compelling problems. This Editorial features the corresponding author(s) of each paper published within this important collection, ordered by section alphabetically, highlighting them as the great researchers of the future. The Frontiers in Chemistry Editorial Office team would like to thank each researcher who contributed their work to this collection. We would also like to personally thank our Chief Editors for their exemplary leadership of this article collection; their strong support and passion for this important, community-driven collection has ensured its success and global impact. Laurent Mathey, PhD Journal Development Manager
Author: Thorsten Lill
Publisher: John Wiley & Sons
ISBN: 3527346686
Category : Technology & Engineering
Languages : en
Pages : 306
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Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Author: Lado Filipovic
Publisher: MDPI
ISBN: 3039210106
Category : Technology & Engineering
Languages : en
Pages : 202
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Book Description
What is the future of CMOS? Sustaining increased transistor densities along the path of Moore's Law has become increasingly challenging with limited power budgets, interconnect bandwidths, and fabrication capabilities. In the last decade alone, transistors have undergone significant design makeovers; from planar transistors of ten years ago, technological advancements have accelerated to today's FinFETs, which hardly resemble their bulky ancestors. FinFETs could potentially take us to the 5-nm node, but what comes after it? From gate-all-around devices to single electron transistors and two-dimensional semiconductors, a torrent of research is being carried out in order to design the next transistor generation, engineer the optimal materials, improve the fabrication technology, and properly model future devices. We invite insight from investigators and scientists in the field to showcase their work in this Special Issue with research papers, short communications, and review articles that focus on trends in micro- and nanotechnology from fundamental research to applications.
Author:
Publisher: ASM International
ISBN: 1627080996
Category :
Languages : en
Pages :
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Book Description
The International Symposium for Testing and Failure Analysis (ISTFA) 2018 is co-located with the International Test Conference (ITC) 2018, October 28 to November 1, in Phoenix, Arizona, USA at the Phoenix Convention Center. The theme for the November 2018 conference is "Failures Worth Analyzing." While technology advances fast and the market demands the latest and the greatest, successful companies strive to stay competitive and remain profitable.
Author: Ekkes Bruck
Publisher: Academic Press
ISBN: 0323986021
Category : Science
Languages : en
Pages : 82
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Book Description
Handbook of Magnetic Materials, Volume 31 highlights new advances in the field, with this new volume presenting interesting chapters on a variety of timely and field specific topics, each contributed to by an international board of authors. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Handbook of Magnetic Materials series
Author: Dhiraj Sud
Publisher: CRC Press
ISBN: 1000630099
Category : Technology & Engineering
Languages : en
Pages : 308
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Book Description
In the manufacturing sector, nanomaterials offer promising outcomes for cost reduction in production, quality improvement, and minimization of environmental hazards. This book focuses on the application of nanomaterials across a wide range of manufacturing areas, including in paint and coatings, petroleum refining, textile and leather industries, electronics, energy storage devices, electrochemical sensors, as well as in industrial waste treatment. This book: Examines nanofluids and nanocoatings in manufacturing and their characterization. Discusses nanomaterial applications in fabricating lightweight structural components, oil refining, smart leather processing and textile industries, and the construction industry. Highlights the role of 3D printing in realizing the full potential of nanotechnology. Considers synthetic strategies with a focus on greener protocols for the fabrication of nanostructured materials with enhanced properties and better control, including these materials' characterization and significant properties for ensuring smart outputs. Offers a unique perspective on applications in industrial waste recycling and treatment, along with challenges in terms of safety, economics, and sustainability in industrial processes. This work is written for researchers and industry professionals across a variety of engineering disciplines, including materials, manufacturing, process, and industrial engineering.
Author: Bahram Nabet
Publisher: Woodhead Publishing
ISBN: 0081028768
Category : Science
Languages : en
Pages : 516
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Book Description
Every bit of information that circulates the internet across the globe is a pulse of light, that at some point will need to be converted to an electric signal in order to be processed by the electronic circuitry in our data centers, computers, and cell phones. Photodetectors (PD’s) perform this conversion with ultra high speed and efficiency, in addition to being ubiquitously present in many other devices ranging from the mundane TV remote controls, to ultra high resolution instrumentation used in Laser Interferometer Gravitational Wave Observatory (LIGO) that reach the edge of the universe and measure gravitational waves. The second edition of "Photodetectors" fully updates the popular first edition with updated information covering the state-of-the-art in modern photodetectors. The 2nd edition starts with basic metrology of photodetectors and common figures-of-merit to compare various devices. It follows with chapters that discuss single-photon detection with Avalanche Photodiodes; organic photodetectors that can be inkjet printed; and silicon-germanium PDs popular in burgeoning field of Silicon Photonics. Internationally recognized experts contribute chapters on one-dimensional, nanowire, PDs as well as high speed zero-dimensional, quantum dot, versions that increase the spectral span as well as speed and sensitivity of PDs and can be produced on various substrates. Solar-blind PDs that operate in harsh environments such as deep space, or rocket engines, are reviewed and new devices in GaN technology . Novel Plasmonic PDs, as well as devices which employ micro-plasma of confined charge in order to make devices that overcome speed limitation of transfer of electronic charge, are covered in other chapters. Using different, novel technologies, CMOS compatible devices are described in two chapters, and ultra high speed PDs that use low-temperature-grown GaAs (LT-GaAs) to detect fast THz signals are reviewed in another chapter. Photodetectors used in application areas of Silicon-Photonics and Microwave-Photonics are reviewed in final chapters of this book. All chapters are of a review nature, providing a perspective of the field before concentrating on particular advancements. As such, the book should appeal to a wide audience that ranges from those with general interest in the topic, to practitioners, graduate students and experts who are interested in the state-of-the-art in photodetection. Addresses various photodetector devices from ultra high speed to ultra high sensitivity, capable of operation in harsh environments Considers a range of applications for this important technology, including silicon photonics and photonic integrated circuits Includes discussions of detectors based on reduced dimensional systems such as quantum wells, nanowires, and quantum dots, as well as travelling wave, and plasmonic detectors
Author: Qiliang Li
Publisher: MDPI
ISBN: 3039212257
Category : Technology & Engineering
Languages : en
Pages : 242
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Book Description
As CMOS scaling is approaching the fundamental physical limits, a wide range of new nanoelectronic materials and devices have been proposed and explored to extend and/or replace the current electronic devices and circuits so as to maintain progress with respect to speed and integration density. The major limitations, including low carrier mobility, degraded subthreshold slope, and heat dissipation, have become more challenging to address as the size of silicon-based metal oxide semiconductor field effect transistors (MOSFETs) has decreased to nanometers, while device integration density has increased. This book aims to present technical approaches that address the need for new nanoelectronic materials and devices. The focus is on new concepts and knowledge in nanoscience and nanotechnology for applications in logic, memory, sensors, photonics, and renewable energy. This research on nanoelectronic materials and devices will be instructive in finding solutions to address the challenges of current electronics in switching speed, power consumption, and heat dissipation and will be of great interest to academic society and the industry.
Author: Catherine Jenkins
Publisher: Metropolitan Museum of Art
ISBN: 1588396495
Category : Art
Languages : en
Pages : 311
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Book Description
The Renaissance of Etching is a groundbreaking study of the origins of the etched print. Initially used as a method for decorating armor, etching was reimagined as a printmaking technique at the end of the fifteenth century in Germany and spread rapidly across Europe. Unlike engraving and woodcut, which required great skill and years of training, the comparative ease of etching allowed a wide variety of artists to exploit the expanding market for prints. The early pioneers of the medium include some of the greatest artists of the Renaissance, such as Albrecht Dürer, Parmigianino, and Pieter Bruegel the Elder, who paved the way for future printmakers like Rembrandt, Goya, and many others in their wake. Remarkably, contemporary artists still use etching in much the same way as their predecessors did five hundred years ago. Richly illustrated and including a wealth of new information, The Renaissance of Etching explores how artists in Germany, the Netherlands, Italy, and France developed the new medium of etching, and how it became one of the most versatile and enduring forms of printmaking. p.p1 {margin: 0.0px 0.0px 0.0px 0.0px; font: 14.0px Verdana}
