Author: Guelph Public Library
Publisher: Lulu.com
ISBN: 1928171532
Category : Fiction
Languages : en
Pages : 129
Book Description
ETCH 2017 is a collection of stories written for the Guelph Public Library's 2017 Teen Writing Contest. There's a story about a girl meeting her dead father's old friend, a story about two soldiers arguing over fruit, and a story about a couple realising they can invent their own fairy tale ending. There's a story here for everyone, so have a look and discover the one that's waiting for you.
ETCH 2017
Photodetectors
Author: Bahram Nabet
Publisher: Woodhead Publishing
ISBN: 0081028768
Category : Science
Languages : en
Pages : 516
Book Description
Every bit of information that circulates the internet across the globe is a pulse of light, that at some point will need to be converted to an electric signal in order to be processed by the electronic circuitry in our data centers, computers, and cell phones. Photodetectors (PD's) perform this conversion with ultra high speed and efficiency, in addition to being ubiquitously present in many other devices ranging from the mundane TV remote controls, to ultra high resolution instrumentation used in Laser Interferometer Gravitational Wave Observatory (LIGO) that reach the edge of the universe and measure gravitational waves. The second edition of "Photodetectors" fully updates the popular first edition with updated information covering the state-of-the-art in modern photodetectors. The 2nd edition starts with basic metrology of photodetectors and common figures-of-merit to compare various devices. It follows with chapters that discuss single-photon detection with Avalanche Photodiodes; organic photodetectors that can be inkjet printed; and silicon-germanium PDs popular in burgeoning field of Silicon Photonics. Internationally recognized experts contribute chapters on one-dimensional, nanowire, PDs as well as high speed zero-dimensional, quantum dot, versions that increase the spectral span as well as speed and sensitivity of PDs and can be produced on various substrates. Solar-blind PDs that operate in harsh environments such as deep space, or rocket engines, are reviewed and new devices in GaN technology . Novel Plasmonic PDs, as well as devices which employ micro-plasma of confined charge in order to make devices that overcome speed limitation of transfer of electronic charge, are covered in other chapters. Using different, novel technologies, CMOS compatible devices are described in two chapters, and ultra high speed PDs that use low-temperature-grown GaAs (LT-GaAs) to detect fast THz signals are reviewed in another chapter. Photodetectors used in application areas of Silicon-Photonics and Microwave-Photonics are reviewed in final chapters of this book. All chapters are of a review nature, providing a perspective of the field before concentrating on particular advancements. As such, the book should appeal to a wide audience that ranges from those with general interest in the topic, to practitioners, graduate students and experts who are interested in the state-of-the-art in photodetection. - Addresses various photodetector devices from ultra high speed to ultra high sensitivity, capable of operation in harsh environments - Considers a range of applications for this important technology, including silicon photonics and photonic integrated circuits - Includes discussions of detectors based on reduced dimensional systems such as quantum wells, nanowires, and quantum dots, as well as travelling wave, and plasmonic detectors
Publisher: Woodhead Publishing
ISBN: 0081028768
Category : Science
Languages : en
Pages : 516
Book Description
Every bit of information that circulates the internet across the globe is a pulse of light, that at some point will need to be converted to an electric signal in order to be processed by the electronic circuitry in our data centers, computers, and cell phones. Photodetectors (PD's) perform this conversion with ultra high speed and efficiency, in addition to being ubiquitously present in many other devices ranging from the mundane TV remote controls, to ultra high resolution instrumentation used in Laser Interferometer Gravitational Wave Observatory (LIGO) that reach the edge of the universe and measure gravitational waves. The second edition of "Photodetectors" fully updates the popular first edition with updated information covering the state-of-the-art in modern photodetectors. The 2nd edition starts with basic metrology of photodetectors and common figures-of-merit to compare various devices. It follows with chapters that discuss single-photon detection with Avalanche Photodiodes; organic photodetectors that can be inkjet printed; and silicon-germanium PDs popular in burgeoning field of Silicon Photonics. Internationally recognized experts contribute chapters on one-dimensional, nanowire, PDs as well as high speed zero-dimensional, quantum dot, versions that increase the spectral span as well as speed and sensitivity of PDs and can be produced on various substrates. Solar-blind PDs that operate in harsh environments such as deep space, or rocket engines, are reviewed and new devices in GaN technology . Novel Plasmonic PDs, as well as devices which employ micro-plasma of confined charge in order to make devices that overcome speed limitation of transfer of electronic charge, are covered in other chapters. Using different, novel technologies, CMOS compatible devices are described in two chapters, and ultra high speed PDs that use low-temperature-grown GaAs (LT-GaAs) to detect fast THz signals are reviewed in another chapter. Photodetectors used in application areas of Silicon-Photonics and Microwave-Photonics are reviewed in final chapters of this book. All chapters are of a review nature, providing a perspective of the field before concentrating on particular advancements. As such, the book should appeal to a wide audience that ranges from those with general interest in the topic, to practitioners, graduate students and experts who are interested in the state-of-the-art in photodetection. - Addresses various photodetector devices from ultra high speed to ultra high sensitivity, capable of operation in harsh environments - Considers a range of applications for this important technology, including silicon photonics and photonic integrated circuits - Includes discussions of detectors based on reduced dimensional systems such as quantum wells, nanowires, and quantum dots, as well as travelling wave, and plasmonic detectors
Principles of Plasma Discharges and Materials Processing
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 1394245394
Category : Technology & Engineering
Languages : en
Pages : 837
Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Publisher: John Wiley & Sons
ISBN: 1394245394
Category : Technology & Engineering
Languages : en
Pages : 837
Book Description
A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
The Life of George Morland
Author: George Dawe
Publisher:
ISBN:
Category : Engraving, English
Languages : en
Pages : 438
Book Description
Publisher:
ISBN:
Category : Engraving, English
Languages : en
Pages : 438
Book Description
Atomic Layer Processing
Author: Thorsten Lill
Publisher: John Wiley & Sons
ISBN: 3527824200
Category : Technology & Engineering
Languages : en
Pages : 304
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Publisher: John Wiley & Sons
ISBN: 3527824200
Category : Technology & Engineering
Languages : en
Pages : 304
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Nanowires for Energy Applications
Author:
Publisher: Academic Press
ISBN: 0128151404
Category : Science
Languages : en
Pages : 550
Book Description
Nanowires for Energy Applications, Volume 98, covers the latest breakthrough research and exciting developments in nanowires for energy applications. This volume focuses on various aspects of Nanowires for Energy Applications, presenting interesting sections on Electrospun semiconductor metal oxide nanowires for energy and sensing applications, Integration into flexible and functional materials, Nanowire Based Bulk Heterojunction Solar Cells, Semiconductor Nanowires for Thermoelectric Generation, Energy Scavenging: Mechanical, Thermoelectric, and Nanowire synthesis/growth methods, and more. - Features the latest breakthroughs and research and development in nanowires for energy applications - Covers a broad range of topics, including a wide variety of materials and many important aspects of solar fuels - Includes in-depth discussions on materials design, growth and synthesis, engineering, characterization and photoelectrochemical studies
Publisher: Academic Press
ISBN: 0128151404
Category : Science
Languages : en
Pages : 550
Book Description
Nanowires for Energy Applications, Volume 98, covers the latest breakthrough research and exciting developments in nanowires for energy applications. This volume focuses on various aspects of Nanowires for Energy Applications, presenting interesting sections on Electrospun semiconductor metal oxide nanowires for energy and sensing applications, Integration into flexible and functional materials, Nanowire Based Bulk Heterojunction Solar Cells, Semiconductor Nanowires for Thermoelectric Generation, Energy Scavenging: Mechanical, Thermoelectric, and Nanowire synthesis/growth methods, and more. - Features the latest breakthroughs and research and development in nanowires for energy applications - Covers a broad range of topics, including a wide variety of materials and many important aspects of solar fuels - Includes in-depth discussions on materials design, growth and synthesis, engineering, characterization and photoelectrochemical studies
Opto-VLSI Devices and Circuits for Biomedical and Healthcare Applications
Author: Ankur Kumar
Publisher: CRC Press
ISBN: 1000932443
Category : Technology & Engineering
Languages : en
Pages : 250
Book Description
The text comprehensively discusses the latest Opto-VLSI devices and circuits useful for healthcare and biomedical applications. It further emphasizes the importance of smart technologies such as artificial intelligence, machine learning, and the internet of things for the biomedical and healthcare industries. Discusses advanced concepts in the field of electro-optics devices for medical applications. Presents optimization techniques including logical effort, particle swarm optimization and genetic algorithm to design Opto-VLSI devices and circuits. Showcases the concepts of artificial intelligence and machine learning for smart medical devices and data auto-collection for distance treatment. Covers advanced Opto-VLSI devices including a field-effect transistor and optical sensors, spintronic and photonic devices. Highlights application of flexible electronics in health monitoring and artificial intelligence integration for better medical devices. The text presents the advances in the fields of optics and VLSI and their applicability in diverse areas including biomedical engineering and the healthcare sector. It covers important topics such as FET biosensors, optical biosensors and advanced optical materials. It further showcases the significance of smart technologies such as artificial intelligence, machine learning and the internet of things for the biomedical and healthcare industries. It will serve as an ideal design book for senior undergraduate, graduate students, and academic researchers in the fields including electrical engineering, electronics and communication engineering, computer engineering and biomedical engineering.
Publisher: CRC Press
ISBN: 1000932443
Category : Technology & Engineering
Languages : en
Pages : 250
Book Description
The text comprehensively discusses the latest Opto-VLSI devices and circuits useful for healthcare and biomedical applications. It further emphasizes the importance of smart technologies such as artificial intelligence, machine learning, and the internet of things for the biomedical and healthcare industries. Discusses advanced concepts in the field of electro-optics devices for medical applications. Presents optimization techniques including logical effort, particle swarm optimization and genetic algorithm to design Opto-VLSI devices and circuits. Showcases the concepts of artificial intelligence and machine learning for smart medical devices and data auto-collection for distance treatment. Covers advanced Opto-VLSI devices including a field-effect transistor and optical sensors, spintronic and photonic devices. Highlights application of flexible electronics in health monitoring and artificial intelligence integration for better medical devices. The text presents the advances in the fields of optics and VLSI and their applicability in diverse areas including biomedical engineering and the healthcare sector. It covers important topics such as FET biosensors, optical biosensors and advanced optical materials. It further showcases the significance of smart technologies such as artificial intelligence, machine learning and the internet of things for the biomedical and healthcare industries. It will serve as an ideal design book for senior undergraduate, graduate students, and academic researchers in the fields including electrical engineering, electronics and communication engineering, computer engineering and biomedical engineering.
Micro- and Nano-Fabrication by Metal Assisted Chemical Etching
Author: Lucia Romano
Publisher: MDPI
ISBN: 303943845X
Category : Technology & Engineering
Languages : en
Pages : 106
Book Description
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Publisher: MDPI
ISBN: 303943845X
Category : Technology & Engineering
Languages : en
Pages : 106
Book Description
Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Diamond Crystals
Author: Yuri N. Palyanov
Publisher: MDPI
ISBN: 303897630X
Category : Mathematics
Languages : en
Pages : 175
Book Description
This book is a printed edition of the Special Issue "Diamond Crystals" that was published in Crystals
Publisher: MDPI
ISBN: 303897630X
Category : Mathematics
Languages : en
Pages : 175
Book Description
This book is a printed edition of the Special Issue "Diamond Crystals" that was published in Crystals
Diamond for Quantum Applications Part 1
Author:
Publisher: Academic Press
ISBN: 0128202416
Category : Science
Languages : en
Pages : 318
Book Description
Diamond for Quantum Applications Part 1, Volume 103, the latest release in the Semiconductors and Semimetals series, highlights new advances in the field, with this new volume presenting interesting chapters on a variety of timely topics. Each chapter is written by an international board of authors. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Semiconductors and Semimetals series Updated release includes the latest information on the use of diamonds for quantum applications
Publisher: Academic Press
ISBN: 0128202416
Category : Science
Languages : en
Pages : 318
Book Description
Diamond for Quantum Applications Part 1, Volume 103, the latest release in the Semiconductors and Semimetals series, highlights new advances in the field, with this new volume presenting interesting chapters on a variety of timely topics. Each chapter is written by an international board of authors. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Semiconductors and Semimetals series Updated release includes the latest information on the use of diamonds for quantum applications