Electrostatic Lens Systems, 2nd edition PDF Download
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Author: D.W.O. Heddle
Publisher: CRC Press
ISBN: 1420034391
Category : Technology & Engineering
Languages : en
Pages : 264
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Book Description
Electrostatic Lens Systems: Second Edition enables readers to design lens systems for focusing beams of charged particles that have useful characteristics. The book covers the basic theory of the motion of charged particles in electrostatic fields and describes several methods for the calculation of the potential and field distribution for various electrode geometries. It emphasizes the Bessel function expansion method, developed by the author and his students, and the nine-point implementation of the finite difference method. Demonstration programs of other methods can be found via the websites provided. A chapter on aberrations presents formulae that enable the coefficients to be determined by an extension to the ray tracing procedures, demonstrating optimum conditions for lens operation. The book is accompanied by a disk that provides a suite of computer programs (LENSYS for MS-DOS) intended for practical use in the design and analysis of systems using round lenses with apertures or cylindrical elements. These programs are of value even to experienced workers in the field who may be quite familiar with much of the material in the text.
Author: D.W.O. Heddle
Publisher: CRC Press
ISBN: 1420034391
Category : Technology & Engineering
Languages : en
Pages : 264
Get Book Here
Book Description
Electrostatic Lens Systems: Second Edition enables readers to design lens systems for focusing beams of charged particles that have useful characteristics. The book covers the basic theory of the motion of charged particles in electrostatic fields and describes several methods for the calculation of the potential and field distribution for various electrode geometries. It emphasizes the Bessel function expansion method, developed by the author and his students, and the nine-point implementation of the finite difference method. Demonstration programs of other methods can be found via the websites provided. A chapter on aberrations presents formulae that enable the coefficients to be determined by an extension to the ray tracing procedures, demonstrating optimum conditions for lens operation. The book is accompanied by a disk that provides a suite of computer programs (LENSYS for MS-DOS) intended for practical use in the design and analysis of systems using round lenses with apertures or cylindrical elements. These programs are of value even to experienced workers in the field who may be quite familiar with much of the material in the text.
Author: D.W.O. Heddle
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 120
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Book Description
The use of electrostatic lenses for the control of ion and electron beams has grown considerably in recent years. In addition, innovations in the production of low energy positrons have opened a whole new field of research for which electrostatic lenses are required. Electrostatic Lens Systems is therefore a timely treatise on the practical aspects of lens system design. The text gives a clear and concise treatment of the motion of charged particles in electrostatic fields and describes several methods of calculating the potential and field distributions for various electrode geometries. Electrostatic Lens Systems is also intended to be an interactive tutor on the practical design and analysis of systems using round lenses (both apertures and cylinders) through a unique suite of programs (provided on IBM compatible disc). Combined with an emphasis on the Bessel function expansion method and a thorough description of the well known relaxation methods, this volume will be a significant reference work and learning tool for experienced workers and new researchers alike. If you need to use electrostatic lenses then you need to read Electrostatic Lens Systems.
Author: Jon Orloff
Publisher: CRC Press
ISBN: 1420045555
Category : Science
Languages : en
Pages : 666
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Book Description
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
Author: Jon Orloff
Publisher: CRC Press
ISBN: 1351835777
Category : Science
Languages : en
Pages : 938
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Book Description
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0080984169
Category : Science
Languages : en
Pages : 755
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Book Description
The three volumes in the PRINCIPLES OF ELECTRON OPTICS Series constitute the first comprehensive treatment of electron optics in over forty years. While Volumes 1 and 2 are devoted to geometrical optics, Volume 3 is concerned with wave optics and effects due to wave length. Subjects covered include: Derivation of the laws of electron propagation from SchrUdinger's equation Image formation and the notion of resolution The interaction between specimens and electrons Image processing Electron holography and interference Coherence, brightness, and the spectral function Together, these works comprise a unique and informative treatment of the subject. Volume 3, like its predecessors, will provide readers with both a textbook and an invaluable reference source.
Author: David Taniar
Publisher: Springer Science & Business Media
ISBN: 3642121640
Category : Computers
Languages : en
Pages : 620
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Book Description
The four-volume set LNCS 6016 - 6019 constitutes the refereed proceedings of the International Conference on Computational Science and Its Applications, ICCSA 2010, held in Fukuoka, Japan, in March 2010. The four volumes contain papers presenting a wealth of original research results in the field of computational science, from foundational issues in computer science and mathematics to advanced applications in virtually all sciences making use of computational techniques. The topics of the fully refereed papers are structured according to the five major conference themes: computational methods, algorithms and scientific application, high performance computing and networks, geometric modelling, graphics and visualization, advanced and emerging applications, and information systems and technologies. Moreover, submissions from more than 30 special sessions and workshops contribute to this publication. These cover These cover topics such as geographical analysis, urban modeling, spatial statistics, wireless and ad hoc networking, logical, scientific and computational aspects of pulse phenomena in transitions, high-performance computing and information visualization, sensor network and its applications, molecular simulations structures and processes, collective evolutionary systems, software engineering processes and applications, molecular simulations structures and processes, internet communication security, security and privacy in pervasive computing environments, and mobile communications.
Author:
Publisher: Academic Press
ISBN: 0128210028
Category : Technology & Engineering
Languages : en
Pages : 284
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Book Description
Advances in Imaging and Electron Physics, Volume 215, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Contains contributions from leading authorities on the subject matter Informs and updates on the latest developments in the field of imaging and electron physics Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing
Author: Pierre Grivet
Publisher:
ISBN:
Category : Electron optics
Languages : en
Pages : 870
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Book Description
Author: Lawrence E Murr
Publisher: CRC Press
ISBN: 1482293358
Category : Technology & Engineering
Languages : en
Pages : 856
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Book Description
The publication date of the first edition is not stated, but the new edition is apparently considerably revised and expanded. It was written to serve as a multi-purpose text at the senior or graduate level and as a reference for the practicing scientist or engineer. Readers should have a math backgr
Author: John N. Helbert
Publisher: William Andrew
ISBN: 0815517807
Category : Technology & Engineering
Languages : en
Pages : 1025
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Book Description
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
