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Author: Herbert W. Mishler
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 72
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Book Description
Operation of the electron-beam process for welding, melting, and achining is described. The different classes of equipment for each of the 3 processes are dicussed, and commercialy available equipment, both domestic and foreign, is described and illustrated.
Author: Robert Wray Hamm
Publisher: World Scientific
ISBN: 9814307041
Category : Science
Languages : en
Pages : 436
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Book Description
This unique new book is a comprehensive review of the many current industrial applications of particle accelerators, written by experts in each of these fields. Readers will gain a broad understanding of the principles of these applications, the extent to which they are employed, and the accelerator technology utilized. The book also serves as a thorough introduction to these fields for non-experts and laymen. Due to the increased interest in industrial applications, there is a growing interest among accelerator physicists and many other scientists worldwide in understanding how accelerators are used in various applications. The government agencies that fund scientific research with accelerators are also seeking more information on the many commercial applications that have been or can be developed with the technology developments they are funding. Many industries are also doing more research on how they can improve their products or processes using particle beams
Author: H Schultz
Publisher: Elsevier
ISBN: 1845698789
Category : Technology & Engineering
Languages : en
Pages : 245
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Book Description
Translated from the German, this is a practical book for engineers which explains the trials, development and manufacturing processes involved in electron beam welding.
Author: Pierre-Gilles de Gennes
Publisher: Springer Science & Business Media
ISBN: 0387216561
Category : Science
Languages : en
Pages : 298
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Book Description
The study of capillarity is in the midst of a veritable explosion. What is offered here is not a comprehensive review of the latest research but rather a compendium of principles designed for the undergraduate student and for readers interested in the physics underlying these phenomena.
Author: Yuan Lin
Publisher: John Wiley & Sons
ISBN: 3527696474
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
This concise reference summarizes the latest results in nano-structured thin films, the first to discuss both deposition methods and electronic applications in detail. Following an introduction to this rapidly developing field, the authors present a variety of organic and inorganic materials along with new deposition techniques, and conclude with an overview of applications and considerations for their technology deployment.
Author: Werner Zapka
Publisher: John Wiley & Sons
ISBN: 3527338322
Category : Technology & Engineering
Languages : en
Pages : 946
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Book Description
Unique in its integration of individual topics to achieve a full-system approach, this book addresses all the aspects essential for industrial inkjet printing. After an introduction listing the industrial printing techniques available, the text goes on to discuss individual topics, such as ink, printheads and substrates, followed by metrology techniques that are required for reliable systems. Three iteration cycles are then described, including the adaptation of the ink to the printhead, the optimization of the ink to the substrate and the integration of machine manufacturing, monitoring, and data handling, among others. Finally, the book summarizes a number of case studies and success stories from selected areas, including graphics, printed electronics, and 3D printing as well a list of ink suppliers, printhead manufacturers and integrators. Practical hints are included throughout for a direct hands-on experience. Invaluable for industrial users and academics, whether ink developers or mechanical engineers, and working in areas ranging from metrology to intellectual property.
Author: Maria Stepanova
Publisher: Springer Science & Business Media
ISBN: 3709104246
Category : Technology & Engineering
Languages : en
Pages : 344
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Book Description
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461537800
Category : Science
Languages : en
Pages : 682
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Book Description
The NATO . Advanced Research Insti tute on Nonequilibrium Processes in Partially Ionized Gases was held at Acquafredda di Maratea during 4-17 June 1989. The Institute considered the interconnections between scattering and transport theories and modeling of nonequilibrium systems generated by electrical discharges, emphasizing the importance of microscopic processes in affecting the bulk properties of plasmas. The book tries to reproduce these lines. In particular several contributions describe scattering cross sections involving electrons interacting with atoms and molecules in both ground and excited states (from theoretical and experimental point of view), of energy transfer processes as well as reactive ones involving excited molecules colliding with atoms and molecules as well as with metallic surfaces. Other contributions deal with the basis of transport theories (Boltzmann and Monte Carlo methods) for describing the bulk properties of non equilibrium plasmas as well as with the modeling of complicated systems emphasizing in particular the strong coupling between the Boltzmann equation and excited state kinetics. Finally the book contains several contributions describing applications in different fields such as Excimer Lasers, Negative Ion Production, RF Discharges, Plasma Chemistry, Atmospheric Processes and Physics of Lamps. The Organizing Committee gratefully acknowledges the generous financial support provided by the NATO Science Committee as well as by Azienda Autonoma di Soggiorno e Turismo of Maratea, by University of Bari, by C. N. R. (Centro di Studio per la Chimica dei Plasmi and Comitato per la Chimica), by ENEA, by Lawrence Livermore Laboratory and by US Army Research Office.
Author: Norman G. Einspruch
Publisher: Academic Press
ISBN: 148321785X
Category : Technology & Engineering
Languages : en
Pages : 559
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Book Description
Beam Processing Technologies is a collection of papers that deals with the miniaturization of devices that will be faster, consume less power, and cost less per operation or fabrication. One paper discusses metal oxide semiconductor (MOS) integrated circuit technology including the operation of devices whose lateral and vertical dimensions are scaled down. If the devices' silicon doping profiles are increased by the same scale factor, they can operate on lower voltages and currents, with the same performance. Another paper describes laser beam processing and wafer-scale integration as techniques to increase the number of devices on a silicon chip. Electron beam technologies can be used in many fabrication processes such as in microlithography, selective oxidation, doping, metrology. Ion beam applications depend on the presence of the ion introduced into the device (e.g. implantation doping), on pseudoelastic collisions (e.g. physical sputtering or crystal damage), and on inelastic scattering (e.g. polymer resist exposure). Silicon molecular beam epitaxy (SiMBE) can also grow high-quality layers at low temperature, particularly concerning germanium, especially as reagrds the growth system design and utilization of n- and p-type doping. Chemical beam epitaxy (CBE) is another epitaxial growth technique that can surpass MBE and metal organic chemical vapor deposition (MO-CVD). The collection is suitable chemical engineers, industrial physicists, and researchers whose work involve micro-fabrication and development of integrated circuits.
Author: Isaac Minkoff
Publisher: Springer Science & Business Media
ISBN: 3642955622
Category : Technology & Engineering
Languages : en
Pages : 136
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Book Description
This book is designed to give a short introduction to the field of materials pro cesses for students in the different engineering and physical sciences. It gives an overall treatment of processing and outlines principles and techniques related to the different categories of materials currently employed in technology. It should be used as a first year text and a selection made of the contents to provide a one or two term course. It is not intended to be fully comprehensive but treats major processing topics. In this way, the book has been kept within proportions suitable as an introductory course. The text has been directed to fundamental aspects of processes applied to metals, ceramics, polymers, glassy materials and composites. An effort has been made to cover as broad a range of processes as possible while keeping the treatment differentiated into clearly defined types. For broader treatments, a comprehensive bibliography directs the student to more specialised texts. In presenting this overall view of the field of processes, the text has been brought into line with current teaching in the field of materials. The student of engineering, in this way, may see the challenge and the advances made in applying scientific principles to modem processing techniques. This type of presentation may also be the more exciting one.
Author:
Publisher:
ISBN:
Category : Air
Languages : en
Pages : 132
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Book Description
