Direct Growth of Metallic TiH2 Thin Films by Pulsed Laser Deposition PDF Download
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Author:
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Category :
Languages : en
Pages :
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Author:
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Category :
Languages : en
Pages :
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Author:
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Category :
Languages : en
Pages : 55
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Author: Jian Shen
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Category :
Languages : en
Pages : 56
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Author: Chrissy Emeny
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ISBN:
Category : Alloys
Languages : en
Pages : 97
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Author: Ian Laurence Farrell
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Category : Thin films
Languages : en
Pages : 274
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Author: Mihaela Filipescu
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Category : Technology
Languages : en
Pages :
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Book Description
The aim of this work is to show that material processing by laser-based technologies can lead to the growth of multifunctional thin films with potential in a large area of applications. The synthesis of Hf, Ta, Si, and Al metal oxides described here relies on the use of pulsed laser deposition (PLD), or radiofrequency (RF) assisted PLD. The morphology and structure of the as-grown thin films are investigated by atomic force microscopy, X-ray diffraction, and transmission electron microscopy, whilst the optical properties are determined by spectroellipsometry. The dielectric behaviour of the deposited layers is investigated by electrical measurements.
Author: Abdul Lateef Ali Mohammed
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Category :
Languages : en
Pages : 166
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Category :
Languages : en
Pages :
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We have studied growth of GdLiF4 thin films for optical waveguide applications. Epitaxial, c-axis oriented GdLiF4 films wer grown from undoped GdLiF4 targets in an on-axis Pulsed-laser deposition geometry on (100) CaF2. These films exhibit a high density of particulates on the surface which are ejected from the target in the ablation process. Growth from Nd-doped polycrystalline GdLiF4 ablation targets results in smooth films with lower particulate densities, as Nd doping increases the optical absorption of GdLiF4 at the ablation laser wavelength 193 nm and permits efficient pulsed-laser deposition. Optical emission spectra of the ablation pume reveals the presence of atomic F, Gd, and Li, indicating the dissociation of the metal-fluorine bonds in the ablation process. In addition, we find that the residual background oxygen pressure must be reduced to avoid formation of Gd4O3F6 as an impurity oxyfluoride phase in the films.
Author: Anna Marie Widdowson
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Category : Laser ablation
Languages : en
Pages : 288
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Author: H. A. Atwater
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 472
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Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
