Reaction Diffusion and Solid State Chemical Kinetics PDF Download
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Author: V.I. Dybkov
Publisher: Trans Tech Publications Ltd
ISBN: 3038134457
Category : Technology & Engineering
Languages : en
Pages : 330
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Book Description
Volume is indexed by Thomson Reuters BCI (WoS). This monograph deals with a physico-chemical approach to the problem of the solid-state growth of chemical compound layers and reaction-diffusion in binary heterogeneous systems formed by two solids; as well as a solid with a liquid or a gas. It is explained why the number of compound layers growing at the interface between the original phases is usually much lower than the number of chemical compounds in the phase diagram of a given binary system. For example, of the eight intermetallic compounds which exist in the aluminium-zirconium binary system, only ZrAl3 was found to grow as a separate layer at the Al–Zr interface under isothermal conditions. The physico-chemical approach predicts that, in most cases, the number of compound layers should not exceed two; with the main factor, resulting in the appearance of additional layers, being crack formation due to thermal expansion and volume effects.
Author: V.I. Dybkov
Publisher: Trans Tech Publications Ltd
ISBN: 3038134457
Category : Technology & Engineering
Languages : en
Pages : 330
Get Book Here
Book Description
Volume is indexed by Thomson Reuters BCI (WoS). This monograph deals with a physico-chemical approach to the problem of the solid-state growth of chemical compound layers and reaction-diffusion in binary heterogeneous systems formed by two solids; as well as a solid with a liquid or a gas. It is explained why the number of compound layers growing at the interface between the original phases is usually much lower than the number of chemical compounds in the phase diagram of a given binary system. For example, of the eight intermetallic compounds which exist in the aluminium-zirconium binary system, only ZrAl3 was found to grow as a separate layer at the Al–Zr interface under isothermal conditions. The physico-chemical approach predicts that, in most cases, the number of compound layers should not exceed two; with the main factor, resulting in the appearance of additional layers, being crack formation due to thermal expansion and volume effects.
Author: Richard J. Borg
Publisher: Elsevier
ISBN: 0323138403
Category : Science
Languages : en
Pages : 377
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Book Description
The energetics and mechanisms of diffusion control the kinetics of such diverse phenomena as the fabrication of semiconductors and superconductors, the tempering of steel, geological metamorphism, the precipitation hardening of nonferrous alloys and corrosion of metals and alloys. This work explains the fundamentals of diffusion in the solid state at a level suitable for upper-level undergraduate and beginning graduate students in materials science, metallurgy, mineralogy, and solid state physics and chemistry. A knowledge of physical chemistry such as is generally provided by a one-year undergraduate course is a prerequisite, though no detailed knowledge of solid state physics or crystallography is required.
Author: Helmut Mehrer
Publisher: Springer Science & Business Media
ISBN: 354071488X
Category : Technology & Engineering
Languages : en
Pages : 645
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Book Description
This book describes the central aspects of diffusion in solids, and goes on to provide easy access to important information about diffusion in metals, alloys, semiconductors, ion-conducting materials, glasses and nanomaterials. Coverage includes diffusion-controlled phenomena including ionic conduction, grain-boundary and dislocation pipe diffusion. This book will benefit graduate students in such disciplines as solid-state physics, physical metallurgy, materials science, and geophysics, as well as scientists in academic and industrial research laboratories.
Author: Aloke Paul
Publisher: Elsevier
ISBN: 0128043601
Category : Science
Languages : en
Pages : 550
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Book Description
Handbook of Solid State Diffusion, Volume 1: Diffusion Fundamentals and Techniques covers the basic fundamentals, techniques, applications, and latest developments in the area of solid-state diffusion, offering a pedagogical understanding for students, academicians, and development engineers. Both experimental techniques and computational methods find equal importance in the first of this two-volume set. Volume 1 covers the fundamentals and techniques of solid-state diffusion, beginning with a comprehensive discussion of defects, then different analyzing methods, and finally concluding with an exploration of the different types of modeling techniques. - Presents a handbook with a short mathematical background and detailed examples of concrete applications of the sophisticated methods of analysis - Enables readers to learn the basic concepts of experimental approaches and the computational methods involved in solid-state diffusion - Covers bulk, thin film, and nanomaterials - Introduces the problems and analysis in important materials systems in various applications - Collates contributions from academic and industrial problems from leading scientists involved in developing key concepts across the globe
Author: H. Y. Sohn
Publisher: Elsevier
ISBN: 0128164662
Category : Science
Languages : en
Pages : 538
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Book Description
Fluid-Solid Reactions, Second Edition takes a detailed and thorough look at the scope of fluid-solid reaction systems, focusing on the four phenomena: external mass transfer, pore diffusion, chemical reaction, and adsorption/desorption. This completely revised new edition builds on the classic original edition through the introduction of cutting-edge new theories and applications, including the formulation and application of a new and convenient law that governs fluid-solid reaction kinetics. This book will be of primary interest to practicing engineers engaged in process research, development, and design in the many fields where fluid-solid reactions are critical to workflow and research. Fluid-solid reactions play a major role in the technology of most industrialized nations. These reactions encompass a very broad field, including the extraction of metals from their ores, the combustion of solid fuels, coal gasification, and the incineration of solid refuse. Features 50% new and revised content, arming researchers with the latest developments in the field Details a new unified approach to modeling the rates of fluid-solid reaction systems Authored by one of the world’s foremost experts on fluid-solid reactions and their applications in the field
Author: G E Murch
Publisher: Academic Press
ISBN: 0323140300
Category : Science
Languages : en
Pages : 503
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Book Description
Diffusion in Crystalline Solids addresses some of the most active areas of research on diffusion in crystalline solids. Topics covered include measurement of tracer diffusion coefficients in solids, diffusion in silicon and germanium, atom transport in oxides of the fluorite structure, tracer diffusion in concentrated alloys, diffusion in dislocations, grain boundary diffusion mechanisms in metals, and the use of the Monte Carlo Method to simulate diffusion kinetics. This book is made up of eight chapters and begins with an introduction to the measurement of diffusion coefficients with radioisotopes. The following three chapters consider diffusion in materials of substantial technological importance such as silicon and germanium. Atomic transport in oxides of the fluorite structure is described, and diffusion in concentrated alloys, including intermetallic compounds, is analyzed. The next two chapters delve into diffusion along short-circuiting paths, focusing on the effect of diffusion down dislocations on the form of the tracer concentration profile. The book also discusses the mechanisms of diffusion in grain boundaries in metals by invoking considerable work done on grain-boundary structure. The last two chapters are concerned with computer simulation, paying particular attention to machine calculations and the Monte Carlo method. The book concludes by exploring the fundamental atomic migration process and presenting some state-of-the-art calculations for defect energies and the topology of the saddle surface. Students and researchers of material science will find this book extremely useful.
Author: Aloke Paul
Publisher: Springer
ISBN: 331907461X
Category : Science
Languages : en
Pages : 543
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Book Description
In this book basic and some more advanced thermodynamics and phase as well as stability diagrams relevant for diffusion studies are introduced. Following, Fick’s laws of diffusion, atomic mechanisms, interdiffusion, intrinsic diffusion, tracer diffusion and the Kirkendall effect are discussed. Short circuit diffusion is explained in detail with an emphasis on grain boundary diffusion. Recent advances in the area of interdiffusion will be introduced. Interdiffusion in multi-component systems is also explained. Many practical examples will be given, such that researches working in this area can learn the practical evaluation of various diffusion parameters from experimental results. Large number of illustrations and experimental results are used to explain the subject. This book will be appealing for students, academicians, engineers and researchers in academic institutions, industry research and development laboratories.
Author: A.S. Nowick
Publisher: Elsevier
ISBN: 0323147763
Category : Science
Languages : en
Pages : 506
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Book Description
Diffusion in Solids: Recent Developments provides an overview of diffusion in crystalline solids. This book discusses the various aspects of the theory of diffusion. Organized into nine chapters, this volume starts with a discussion on the process of diffusion in solids. This book then examines the tools that supplement the conventional diffusion measurements, including electromigration, ionic conductivity, isotope effects, and vacancy wind effects. This text explores the molecular dynamic calculation by which the interatomic forces must be assumed. Other chapters discuss the method of measurement of the isotope effect on diffusion, which is the most powerful method of determining relevant information about the correlation factor. This volume extensively discusses diffusion in organic and amorphous materials, as well as interstitial diffusion in solids. The final chapter deals with ionic motion and diffusion in various groups of materials called fast ionic conductors. Solid-state physicists, materials scientists, physical chemists, and electrochemists will find this book extremely useful.
Author: John Wood
Publisher: Springer Science & Business Media
ISBN: 1468423401
Category : Science
Languages : en
Pages : 770
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Book Description
New Crystallographic Developments Applicable in Studies of Reactions in Solids (Introductory Lecture).- Reactions at Surfaces and Interfaces (Plenary Lecture).- Reaction Kinetics in the Ca-Mn-O System.- Surface Reactivity Towards Olefin Oxidation of Cadmium Molybdate Doped with Transition Metal Ions.- Chemisorption of Sulfur on Iron and Its Influence on Iron-Gas Reactions, Surface Self Diffusion and Sintering of Iron.- The Influence of Intrinsic Defects on the Mechanism of the Solid State Reaction Between CdTe and HgSe.- Characterization and Surface Reactivity of Finely-Divided CoO-MgO Solid S.
Author: Devendra Gupta
Publisher: Springer Science & Business Media
ISBN: 0080947085
Category : Science
Languages : en
Pages : 552
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Book Description
This new game book for understanding atoms at play aims to document diffusion processes and various other properties operative in advanced technological materials. Diffusion in functional organic chemicals, polymers, granular materials, complex oxides, metallic glasses, and quasi-crystals among other advanced materials is a highly interactive and synergic phenomenon. A large variety of atomic arrangements are possible. Each arrangement affects the performance of these advanced, polycrystalline multiphase materials used in photonics, MEMS, electronics, and other applications of current and developing interest. This book is written by pioneers in industry and academia for engineers, chemists, and physicists in industry and academia at the forefront of today's challenges in nanotechnology, surface science, materials science, and semiconductors.
