Diffraction from Rough Surfaces and Dynamic Growth Fronts PDF Download
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Author: Hong-Ning Yang
Publisher: World Scientific
ISBN: 9789810215361
Category : Technology & Engineering
Languages : en
Pages : 244
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Book Description
Designed both for experimentalists who study rough surfaces and the dynamics of thin film growth using diffraction techniques and for theorists who wish to learn of such rough surfaces and dynamic behavior in Fourier space, this monograph quickly brings the readers to forefront research in the area of the dynamics of interface growth. Graduate and advanced undergraduate students as well as those readers who have very little prior knowledge of diffraction can pick up the subject matter with little difficulty.This monograph gives a brief review and summary at the end of each chapter. After the introduction of the elementary theory of diffraction in Chapter I, Chapter II discusses the various parameters and correlation functions that are essential in describing a rough surface. In Chapter III, the authors not only show analytical forms of the diffraction structure factor for both rough crystalline and non-crystalline surfaces, but also outline the methods of extracting the interface width, the lateral correlation length and the roughness parameter from the diffraction structure factor. To present the basic physical concepts underlying the scaling hypothesis during dynamic growth, in Chapter IV, a detailed description of the dynamic scaling properties of the height-height correlation function, the height difference function and the structure factor is given. The structure factor from a dynamic growth front is derived in Chapter V. An example of a quantitative measurement of the dynamic growth front of an epitaxial system is also given in this chapter. In Chapter VI, a particular type of rough surfaces having a diverging interface width associated with an equilibrium surface roughening transition is discussed. A comparison of the diffraction characteristics from divergent and non-divergent interface is also summarized.
Author: Hong-Ning Yang
Publisher: World Scientific
ISBN: 9789810215361
Category : Technology & Engineering
Languages : en
Pages : 244
Get Book Here
Book Description
Designed both for experimentalists who study rough surfaces and the dynamics of thin film growth using diffraction techniques and for theorists who wish to learn of such rough surfaces and dynamic behavior in Fourier space, this monograph quickly brings the readers to forefront research in the area of the dynamics of interface growth. Graduate and advanced undergraduate students as well as those readers who have very little prior knowledge of diffraction can pick up the subject matter with little difficulty.This monograph gives a brief review and summary at the end of each chapter. After the introduction of the elementary theory of diffraction in Chapter I, Chapter II discusses the various parameters and correlation functions that are essential in describing a rough surface. In Chapter III, the authors not only show analytical forms of the diffraction structure factor for both rough crystalline and non-crystalline surfaces, but also outline the methods of extracting the interface width, the lateral correlation length and the roughness parameter from the diffraction structure factor. To present the basic physical concepts underlying the scaling hypothesis during dynamic growth, in Chapter IV, a detailed description of the dynamic scaling properties of the height-height correlation function, the height difference function and the structure factor is given. The structure factor from a dynamic growth front is derived in Chapter V. An example of a quantitative measurement of the dynamic growth front of an epitaxial system is also given in this chapter. In Chapter VI, a particular type of rough surfaces having a diverging interface width associated with an equilibrium surface roughening transition is discussed. A comparison of the diffraction characteristics from divergent and non-divergent interface is also summarized.
Author:
Publisher: Elsevier
ISBN: 0080531385
Category : Technology & Engineering
Languages : en
Pages : 437
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Book Description
The structure of a growth or an etch front on a surface is not only a subject of great interest from the practical point of view but also is of fundamental scientific interest. Very often surfaces are created under non-equilibrium conditions such that the morphology is not always smooth. In addition to a detailed description of the characteristics of random rough surfaces, Experimental Methods in the Physical Sciences, Volume 37, Characterization of Amorphous and Crystalline Rough Surface-Principles and Applications will focus on the basic principles of real and diffraction techniques for quantitative characterization of the rough surfaces. The book thus includes the latest development on the characterization and measurements of a wide variety of rough surfaces. The complementary nature of the real space and diffraction techniques is fully displayed. Key Features * An accessible description of quantitative characterization of random rough surfaces and growth/etch fronts * A detailed description of the principles, experimentation, and limitations of advanced real-space imaging techniques (such as atomic force microscopy) and diffraction techniques (such as light scattering, X-ray diffraction, and electron diffraction) * Characterization of a variety of rough surfaces (e.g., self-affine, mounded, anisotropic, and two-level surfaces) accompanied by quantitative examples to illustrate the essence of the principles * An insightful description of how rough surfaces are formed * Presentation of the most recent examples of the applications of rough surfaces in various areas
Author: Paul Meakin
Publisher: Cambridge University Press
ISBN: 9780521452533
Category : Mathematics
Languages : en
Pages : 700
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Book Description
A comprehensive, 1998 account of the practical aspects and pitfalls of the applications of fractal modelling in the physical sciences.
Author: A.- L. Barabási
Publisher: Cambridge University Press
ISBN: 9780521483186
Category : Mathematics
Languages : en
Pages : 392
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Book Description
This book brings together two of the most exciting and widely studied subjects in modern physics: namely fractals and surfaces. To the community interested in the study of surfaces and interfaces, it brings the concept of fractals. To the community interested in the exciting field of fractals and their application, it demonstrates how these concepts may be used in the study of surfaces. The authors cover, in simple terms, the various methods and theories developed over the past ten years to study surface growth. They describe how one can use fractal concepts successfully to describe and predict the morphology resulting from various growth processes. Consequently, this book will appeal to physicists working in condensed matter physics and statistical mechanics, with an interest in fractals and their application. The first chapter of this important new text is available on the Cambridge Worldwide Web server: http://www.cup.cam.ac.uk/onlinepubs/Textbooks/textbookstop.html
Author: Gwo-Ching Wang
Publisher: Springer Science & Business Media
ISBN: 1461492874
Category : Technology & Engineering
Languages : en
Pages : 231
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Book Description
This unique book covers the fundamental principle of electron diffraction, basic instrumentation of RHEED, definitions of textures in thin films and nanostructures, mechanisms and control of texture formation, and examples of RHEED transmission mode measurements of texture and texture evolution of thin films and nanostructures. Also presented is a new application of RHEED in the transmission mode called RHEED pole figure technique that can be used to monitor the texture evolution in thin film growth and nanostructures and is not limited to single crystal epitaxial film growth. Details of the construction of RHEED pole figures and the interpretation of observed pole figures are presented. Materials covered include metals, semiconductors, and thin insulators. This book also: Presents a new application of RHEED in the transmission mode Introduces a variety of textures from metals, semiconductors, compound semiconductors, and their characteristics in RHEED pole figures Provides examples of RHEED measurements of texture and texture evolution, construction of RHEED pole figures, and interpretation of observed pole figures RHEED Transmission Mode and Pole Figures: Thin Film and Nanostructure Texture Analysis is ideal for researchers in materials science and engineering and nanotechnology.
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
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Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques
Author: Gertjan Koster
Publisher: Woodhead Publishing
ISBN: 0081029462
Category : Science
Languages : en
Pages : 534
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Book Description
Epitaxial Growth of Complex Metal Oxides, Second Edition reviews techniques and recent developments in the fabrication quality of complex metal oxides, which are facilitating advances in electronic, magnetic and optical applications. Sections review the key techniques involved in the epitaxial growth of complex metal oxides and explore the effects of strain and stoichiometry on crystal structure and related properties in thin film oxides. Finally, the book concludes by discussing selected examples of important applications of complex metal oxide thin films, including optoelectronics, batteries, spintronics and neuromorphic applications. This new edition has been fully updated, with brand new chapters on topics such as atomic layer deposition, interfaces, STEM-EELs, and the epitaxial growth of multiferroics, ferroelectrics and nanocomposites. Examines the techniques used in epitaxial thin film growth for complex oxides, including atomic layer deposition, sputtering techniques, molecular beam epitaxy, and chemical solution deposition techniques Reviews materials design strategies and materials property analysis methods, including the impacts of defects, strain, interfaces and stoichiometry Describes key applications of epitaxially grown metal oxides, including optoelectronics, batteries, spintronics and neuromorphic applications
Author: M.C. Tringides
Publisher: Springer Science & Business Media
ISBN: 1489902627
Category : Science
Languages : en
Pages : 701
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Book Description
The interest in the problem of surface diffusion has been steadily growing over the last fifteen years. This is clearly evident from the increase in the number of papers dealing with the problem, the development of new experimental techniques, and the specialized sessions focusing on diffusion in national and international meetings. Part of the driving force behind this increasing activity is our recently acquired ability to observe and possibly control atomic scale phenomena. It is now possible to look selectively at individual atomistic processes and to determine their relative importance during growth and reactions at surfaces. The number of researchers interested in this problem also has been growing steadily which generates the need for a good reference source to farniliarize newcomers to the problem. While the recent emphasis is on the role of diffusion during growth, there is also continuing progress on the more traditional aspects of the problem describing mass transport in an ensemble of particles. Such a description is based on the statistical mechanical analysis of a collection of particles that mutually interact and develop correlations. An average over the multitude of atomistic processes that operate under these conditions is necessary to fully describe the dynamics in the system.
Author: C Trico
Publisher: World Scientific
ISBN: 9814550574
Category :
Languages : en
Pages : 298
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Book Description
Fractal sets serve as excellent models in Physics, Chemistry, Biology and other fields. However, the actual applications of these fascinating models are often unknown even to specialists in fractal theories. The communication of the most recent results utilising fractal concepts in experimental and industrial engineering research was thus a major challenge discussed in the above conference.The resulting proceedings are organised around five main themes: Materials Processing, Flow, Natural Sciences, Signal and Image Analysis and Mathematical Methods. Almost 50 papers are included in this volume. Besides the classical topics, the book also introduces an important session on Fractal Signal and Image Analysis, a subject which is rapidly gaining recognition in computer science and engineering for its promising industrial applications.
Author: Angelo Mascarenhas
Publisher: Springer Science & Business Media
ISBN: 146150631X
Category : Science
Languages : en
Pages : 483
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Book Description
The phenomenonofspontaneous ordering in semiconductoralloys, which can be categorized as a self-organized process, is observed to occur sponta neously during epitaxial growth of certain ternary alloy semiconductors and results in a modification of their structural, electronic, and optical properties. There has been a great dealofinterest in learning how to control this phenome non so that it may be used for tailoring desirable electronic and optical properties. There has been even greater interest in exploiting the phenomenon for its unique ability in providing an experimental environment of controlled alloy statistical fluctuations. As such, itimpacts areasofsemiconductorscience and technology related to the materials science ofepitaxial growth, statistical mechanics, and electronic structure of alloys and electronic and photonic devices. During the past two decades, significant progress has been made toward understanding the mechanisms that drive this phenomenon and the changes in physical properties that result from it. A variety of experimental techniques have been used to probe the phenomenon and several attempts made atproviding theoretical models both for the ordering mechanisms as well as electronic structure changes. The various chapters of this book provide a detailed account of these efforts during the past decade. The first chapter provides an elaborate account of the phenomenon, with an excellent perspective of the structural and elec tronic modifications itinduces.
