Author: John M. Hill
Publisher:
ISBN:
Category : Adhesion
Languages : en
Pages : 78

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Author: Anatoliǐ Davydovich Zimon
Publisher: Springer
ISBN: 1489966005
Category : Science
Languages : en
Pages : 429

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Author: Kash L. Mittal
Publisher: CRC Press
ISBN: 1466562412
Category : Science
Languages : en
Pages : 462

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Book Description
This volume documents the proceedings of the 7th International Symposium on Particles on Surfaces: Detection, Adhesion and Removal held in Newark, NJ, June 19-21, 2000. The study of particles on surfaces is extremely important in a host of diverse technological areas, ranging from microelectronics to optics to biomedical. This volume contains a total of 28 papers, which were all properly peer reviewed, revised and edited before inclusion. Therefore, this book is not merely a collection of unreviewed manuscripts, but rather represents information which has passed peer scrutiny. Furthermore, the authors were asked to update their manuscripts, so the information contained in this book should be current and fresh. This volume is divided into two parts: 1) Particle Analysis and General Cleaning-Related Topics; and 2) Particle Adhesion and Removal. The topics covered include: surface analysis techniques for particle identification; cleaning, rinsing and drying issues in post-CMP cleaning; fundamental forces involved in particle adhesion; factors affecting adhesion of small (nanosize) particles; factors important in particle detachment; particle adhesion measurement by AFM; various (wet and dry) techniques for particle removal, e.g., laser, ultrasonic, megasonic, use of surfactants; toner particles and pharmaceutical particles. This volume offers a wealth of information on the tremendously technologically important field of particles on surfaces and should provide a consolidated source of current R&D activity in this arena. Therefore, it will be of value and use to anyone interested in the topic of particles on surfaces.

Author: Jeffery S. Marshall
Publisher: Cambridge University Press
ISBN: 1139952382
Category : Technology & Engineering
Languages : en
Pages : 361

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Book Description
Offering a comprehensive treatment of adhesive particle flows, this book adopts a particle-level approach oriented toward directly simulating the various fluid, electric field, collision, and adhesion forces and torques acting on the particles, within the framework of a discrete-element model. It is ideal for professionals and graduate students working in engineering and atmospheric and condensed matter physics, materials science, environmental science, and other disciplines where particulate flows have a significant role. The presentation is applicable to a wide range of flow fields, including aerosols, colloids, fluidized beds, and granular flows. It describes both physical models of the various forces and torques on the particles as well as practical aspects necessary for efficient implementation of these models in a computational framework.

Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461573882
Category : Science
Languages : en
Pages : 414

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Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, SIld disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS) * at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dissemination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all con cerned if the printing and distribution of the volumes were handled by an interna and broader dissemination. tional publishing house to assure improved service Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Cor poration of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 30 (thesis year 1985) a total of 12,400 theses titles from 26 Canadian and 186 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this important annual reference work.

Author: David J. Quesnel
Publisher: CRC Press
ISBN: 9789056997250
Category : Science
Languages : en
Pages : 546

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Whenever a curved surface interacts with another surface, the principles of adhesion are at work. From the cells in your body to the dust on your glasses, intermolecular forces cause materials to attract one another. Elastic deformations resulting from these adhesive interactions store strain that can be liberated during particle detachment. Time dependent changes in adhesion can result from plastic deformation that both increases the real effective contact area and reduces the stored energy available to assist in particle removal. Processes such as these, based on the fundamentals tenets of particle adhesion, are now finding applications across many disciplines leading to a rich and rapid development of knowledge. This book documents the use of particle adhesion concepts in a variety of disciplines. Fields as varied as the cleaning of semiconductors, to the controlling of cancer metastasis, to the abatement of environmental pollution all benefit from applications of particle adhesion concepts.

Author: K. L. Mittal
Publisher: John Wiley & Sons
ISBN: 1118831543
Category : Technology & Engineering
Languages : en
Pages : 482

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Book Description
The book provides a comprehensive and easily accessible reference source covering all important aspects of particle adhesion and removal. The core objective is to cover both fundamental and applied aspects of particle adhesion and removal with emphasis on recent developments. Among the topics to be covered include: 1. Fundamentals of surface forces in particle adhesion and removal. 2. Mechanisms of particle adhesion and removal. 3. Experimental methods (e.g. AFM, SFA,SFM,IFM, etc.) to understand particle-particle and particle-substrate interactions. 4. Mechanics of adhesion of micro- and nanoscale particles. 5. Various factors affecting particle adhesion to a variety of substrates. 6. Surface modification techniques to modulate particle adhesion. 7. Various cleaning methods (both wet & dry) for particle removal. 8. Relevance of particle adhesion in a host of technologies ranging from simple to ultra-sophisticated.

Author: Chi Tien
Publisher: Butterworth-Heinemann
ISBN: 1483162427
Category : Science
Languages : en
Pages : 380

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Book Description
Granular Filtration of Aerosols and Hydrosols is concerned with the fundamental aspects of granular filtration of both liquid and gas suspensions. This book takes a unifying approach to the treatment of granular aerosol and hydrosol filtration. The text begins with the introduction of the process of granular filtration and its various applications. Subsequent chapters discuss the aspects of filtration, such as, the macroscopic description of fixed-bed granular filtration; the methods for making representations based on various porous media models for both clean and clogged filter media; the mechanisms of particle deposition; and the trajectory analysis of particle deposition. The final chapter presents and discusses case studies which deal with predicting and calculating the dynamic behavior of granular filtration of hydrosols and aerosols. Researchers in granular filtration and graduate students dealing with separation technology will find the book highly useful.

Author: Sergiy Antonyuk
Publisher: Springer
ISBN: 3030158993
Category : Technology & Engineering
Languages : en
Pages : 662

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Book Description
This book contains the latest scientific findings in the area of granular materials, their physical fundamentals and applications in particle technology focused on the description of interactions of fine adhesive particles.In collaboration between physicists, chemists, mathematicians and mechanics and process engineers from 24 universities, new theories and methods for multiscale modeling and reliable measurement of particles are developed, with a focus on:• Basic physical-chemical processes in the contact zone: particle-particle and particle-wall contacts,• Particle collisions and their dynamics• Constitutive material laws for particle systems on the macro level.

Author: Ker-Ching Hsieh
Publisher:
ISBN:
Category : Abherents
Languages : en
Pages : 760

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