Description and Modification of Electron Beam Induced Deposits for Plasmonics PDF Download
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Author: Caspar Haverkamp
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Caspar Haverkamp
Publisher:
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Category :
Languages : en
Pages :
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Author: Tigran V. Shahbazyan
Publisher: Springer Science & Business Media
ISBN: 9400778058
Category : Science
Languages : en
Pages : 581
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Book Description
This contributed volume summarizes recent theoretical developments in plasmonics and its applications in physics, chemistry, materials science, engineering, and medicine. It focuses on recent advances in several major areas of plasmonics including plasmon-enhanced spectroscopies, light scattering, many-body effects, nonlinear optics, and ultrafast dynamics. The theoretical and computational methods used in these investigations include electromagnetic calculations, density functional theory calculations, and nonequilibrium electron dynamics calculations. The book presents a comprehensive overview of these methods as well as their applications to various current problems of interest.
Author: Tibor Lehnert
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Author: Zhaowei Liu
Publisher: CRC Press
ISBN: 135179731X
Category : Science
Languages : en
Pages : 278
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Book Description
Plasmonics is an emerging field mainly developed within the past two decades. Due to its unique capabilities to manipulate light at deep subwavelength scales, plasmonics has been commonly treated as the most important part of nanophotonics. Plasmonic-assisted optical microscopy techniques, especially super-resolution microscopy, have shown tremendous potential and attracted much attention. This book aims to collect cutting-edge studies in various optical imaging technologies with advanced performances that are enabled or enhanced by plasmonics. The basic working principles, development details, and potential future direction and perspectives are discussed. Edited by Zhaowei Liu, a prominent researcher in the field of super-resolution microscopy, this book will be an excellent reference for anyone in the field of nanophotonics, plasmonics, and optical microscopy.
Author:
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ISBN:
Category :
Languages : en
Pages : 200
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To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Author: Stefan Alexander Maier
Publisher: Springer Science & Business Media
ISBN: 0387378251
Category : Technology & Engineering
Languages : en
Pages : 234
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Book Description
Considered a major field of photonics, plasmonics offers the potential to confine and guide light below the diffraction limit and promises a new generation of highly miniaturized photonic devices. This book combines a comprehensive introduction with an extensive overview of the current state of the art. Coverage includes plasmon waveguides, cavities for field-enhancement, nonlinear processes and the emerging field of active plasmonics studying interactions of surface plasmons with active media.
Author: Keiji Tanaka
Publisher: Springer Nature
ISBN: 3030695980
Category : Technology & Engineering
Languages : en
Pages : 300
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Book Description
This book provides introductory, comprehensive, and concise descriptions of amorphous chalcogenide semiconductors and related materials. It includes comparative portraits of the chalcogenide and related materials including amorphous hydrogenated Si, oxide and halide glasses, and organic polymers. It also describes effects of non-equilibrium disorder, in comparison with those in crystalline semiconductors.
Author: Stefan A Maier
Publisher: World Scientific
ISBN: 9813228741
Category : Science
Languages : en
Pages : 2001
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Book Description
Metamaterials represent a new emerging innovative field of research which has shown rapid acceleration over the last couple of years. In this handbook, we present the richness of the field of metamaterials in its widest sense, describing artificial media with sub-wavelength structure for control over wave propagation in four volumes.Volume 1 focuses on the fundamentals of electromagnetic metamaterials in all their richness, including metasurfaces and hyperbolic metamaterials. Volume 2 widens the picture to include elastic, acoustic, and seismic systems, whereas Volume 3 presents nonlinear and active photonic metamaterials. Finally, Volume 4 includes recent progress in the field of nanoplasmonics, used extensively for the tailoring of the unit cell response of photonic metamaterials.In its totality, we hope that this handbook will be useful for a wide spectrum of readers, from students to active researchers in industry, as well as teachers of advanced courses on wave propagation.
Author: Martin Ziegler
Publisher: Springer Nature
ISBN: 3031367057
Category :
Languages : en
Pages : 439
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Author: Frances M. Ross
Publisher: Cambridge University Press
ISBN: 1107116570
Category : Science
Languages : en
Pages : 529
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2.6.2 Electrodes for Electrochemistry
