Author: David Fisher
Publisher: Trans Tech Publications Ltd
ISBN: 3038133787
Category : Technology & Engineering
Languages : en
Pages : 194
Book Description
This second volume in a new series covering entirely general results in the fields of defects and diffusion includes 356 abstracts of papers which appeared between the end of 2009 and the end of 2010. As well as the abstracts, the volume includes original papers on theory/simulation, semiconductors and metals: “Predicting Diffusion Coefficients from First Principles ...” (Mantina, Chen & Liu), “Gouge Assessment for Pipes ...” (Meliani, Pluvinage & Capelle), “Simulation of the Impact Behaviour of ... Hollow Sphere Structures” (Ferrano, Speich, Rimkus, Merkel & Öchsner), “Elastic-Plastic Fracture Mechanics Model ...” (Liao), “Calculation of Fracture Toughness for Hydrogen Embrittlement ...” (Mahdavi & Mashhadi), “... Method to Describe the Role of Diffusion in Catalyst Design” (Zeynali), “... Axial Shift and Spin Hamiltonian Parameters for Mn2+ in CdS ...” (Wang, Wu, Hu & Xu), “Structure and Electronic Properties of Evaporated Thin Films of Lead Sulfide” (Ibrahim), “Acoustic Emission during Isothermal Oxidation of ... Steel” (Jha, Mishra & Ojha), “... Carbon Content versus Heating Temperature in Austenitizing of Cast Iron” (Gong & Xiang), “Exploration of Parameters of Ashcroft’s Potential ...” (Ghorai), Effect of Tribological Parameters upon Mechanical Wear ...” (El Azizi, Meliani, Belalia & Benamar)
Defects and Diffusion, Theory & Simulation II
Author: David Fisher
Publisher: Trans Tech Publications Ltd
ISBN: 3038133787
Category : Technology & Engineering
Languages : en
Pages : 194
Book Description
This second volume in a new series covering entirely general results in the fields of defects and diffusion includes 356 abstracts of papers which appeared between the end of 2009 and the end of 2010. As well as the abstracts, the volume includes original papers on theory/simulation, semiconductors and metals: “Predicting Diffusion Coefficients from First Principles ...” (Mantina, Chen & Liu), “Gouge Assessment for Pipes ...” (Meliani, Pluvinage & Capelle), “Simulation of the Impact Behaviour of ... Hollow Sphere Structures” (Ferrano, Speich, Rimkus, Merkel & Öchsner), “Elastic-Plastic Fracture Mechanics Model ...” (Liao), “Calculation of Fracture Toughness for Hydrogen Embrittlement ...” (Mahdavi & Mashhadi), “... Method to Describe the Role of Diffusion in Catalyst Design” (Zeynali), “... Axial Shift and Spin Hamiltonian Parameters for Mn2+ in CdS ...” (Wang, Wu, Hu & Xu), “Structure and Electronic Properties of Evaporated Thin Films of Lead Sulfide” (Ibrahim), “Acoustic Emission during Isothermal Oxidation of ... Steel” (Jha, Mishra & Ojha), “... Carbon Content versus Heating Temperature in Austenitizing of Cast Iron” (Gong & Xiang), “Exploration of Parameters of Ashcroft’s Potential ...” (Ghorai), Effect of Tribological Parameters upon Mechanical Wear ...” (El Azizi, Meliani, Belalia & Benamar)
Publisher: Trans Tech Publications Ltd
ISBN: 3038133787
Category : Technology & Engineering
Languages : en
Pages : 194
Book Description
This second volume in a new series covering entirely general results in the fields of defects and diffusion includes 356 abstracts of papers which appeared between the end of 2009 and the end of 2010. As well as the abstracts, the volume includes original papers on theory/simulation, semiconductors and metals: “Predicting Diffusion Coefficients from First Principles ...” (Mantina, Chen & Liu), “Gouge Assessment for Pipes ...” (Meliani, Pluvinage & Capelle), “Simulation of the Impact Behaviour of ... Hollow Sphere Structures” (Ferrano, Speich, Rimkus, Merkel & Öchsner), “Elastic-Plastic Fracture Mechanics Model ...” (Liao), “Calculation of Fracture Toughness for Hydrogen Embrittlement ...” (Mahdavi & Mashhadi), “... Method to Describe the Role of Diffusion in Catalyst Design” (Zeynali), “... Axial Shift and Spin Hamiltonian Parameters for Mn2+ in CdS ...” (Wang, Wu, Hu & Xu), “Structure and Electronic Properties of Evaporated Thin Films of Lead Sulfide” (Ibrahim), “Acoustic Emission during Isothermal Oxidation of ... Steel” (Jha, Mishra & Ojha), “... Carbon Content versus Heating Temperature in Austenitizing of Cast Iron” (Gong & Xiang), “Exploration of Parameters of Ashcroft’s Potential ...” (Ghorai), Effect of Tribological Parameters upon Mechanical Wear ...” (El Azizi, Meliani, Belalia & Benamar)
Defects and Diffusion Theory and Simulation III
Author: David Fisher
Publisher: Trans Tech Publications Ltd
ISBN: 3038137014
Category : Technology & Engineering
Languages : en
Pages : 152
Book Description
This volume on materials engineering comprises a collection of abstracts of recent scholarly papers and articles concerning a wide variety of topics related to the effects of structural defects and diffusion in many material areas, including thin-film manufacturing and facing metals.
Publisher: Trans Tech Publications Ltd
ISBN: 3038137014
Category : Technology & Engineering
Languages : en
Pages : 152
Book Description
This volume on materials engineering comprises a collection of abstracts of recent scholarly papers and articles concerning a wide variety of topics related to the effects of structural defects and diffusion in many material areas, including thin-film manufacturing and facing metals.
Defects and Diffusion in Metals IV
Author: David Fisher
Publisher: Trans Tech Publications Ltd
ISBN: 3035707111
Category : Technology & Engineering
Languages : en
Pages : 517
Book Description
An Annual Retrospective IV
Publisher: Trans Tech Publications Ltd
ISBN: 3035707111
Category : Technology & Engineering
Languages : en
Pages : 517
Book Description
An Annual Retrospective IV
Diffusion in Solids and Liquids, DSL-2006 I
Author: Andreas Öchsner
Publisher: Trans Tech Publications Ltd
ISBN: 3038130885
Category : Technology & Engineering
Languages : en
Pages : 625
Book Description
Mass Diffusion 2nd International Conference on Diffusion in Solids and Liquids, Mass Transfer - Heat Transfer - Microstructure & Properties, DSL-2006, 26-28 July 2006, University of Aveiro, Portugal
Publisher: Trans Tech Publications Ltd
ISBN: 3038130885
Category : Technology & Engineering
Languages : en
Pages : 625
Book Description
Mass Diffusion 2nd International Conference on Diffusion in Solids and Liquids, Mass Transfer - Heat Transfer - Microstructure & Properties, DSL-2006, 26-28 July 2006, University of Aveiro, Portugal
Defect and Diffusion Forum
Author:
Publisher:
ISBN:
Category : Crystals
Languages : en
Pages : 524
Book Description
Publisher:
ISBN:
Category : Crystals
Languages : en
Pages : 524
Book Description
Proceedings of the Third International Symposium on Defects in Silicon
Author: Takao Abe
Publisher: The Electrochemical Society
ISBN: 9781566772235
Category : Science
Languages : en
Pages : 548
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566772235
Category : Science
Languages : en
Pages : 548
Book Description
Defects and Diffusion in Metals
Author:
Publisher:
ISBN:
Category : Diffusion
Languages : en
Pages : 280
Book Description
Publisher:
ISBN:
Category : Diffusion
Languages : en
Pages : 280
Book Description
Diffusion and Defect Data
Author:
Publisher:
ISBN:
Category : Crystals
Languages : en
Pages : 918
Book Description
Publisher:
ISBN:
Category : Crystals
Languages : en
Pages : 918
Book Description
C, H, N and O in Si and Characterization and Simulation of Materials and Processes
Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Theory and Simulation in Physics for Materials Applications
Author: Elena V. Levchenko
Publisher: Springer Nature
ISBN: 3030377903
Category : Technology & Engineering
Languages : en
Pages : 292
Book Description
This book provides a unique and comprehensive overview of the latest advances, challenges and accomplishments in the rapidly growing field of theoretical and computational materials science. Today, an increasing number of industrial communities rely more and more on advanced atomic-scale methods to obtain reliable predictions of materials properties, complement qualitative experimental analyses and circumvent experimental difficulties. The book examines some of the latest and most advanced simulation techniques currently available, as well as up-to-date theoretical approaches adopted by a selected panel of twelve international research teams. It covers a wide range of novel and advanced materials, exploring their structural, elastic, optical, mass and electronic transport properties. The cutting-edge techniques presented appeal to physicists, applied mathematicians and engineers interested in advanced simulation methods in materials science. The book can also be used as additional literature for undergraduate and postgraduate students with majors in physics, chemistry, applied mathematics and engineering.
Publisher: Springer Nature
ISBN: 3030377903
Category : Technology & Engineering
Languages : en
Pages : 292
Book Description
This book provides a unique and comprehensive overview of the latest advances, challenges and accomplishments in the rapidly growing field of theoretical and computational materials science. Today, an increasing number of industrial communities rely more and more on advanced atomic-scale methods to obtain reliable predictions of materials properties, complement qualitative experimental analyses and circumvent experimental difficulties. The book examines some of the latest and most advanced simulation techniques currently available, as well as up-to-date theoretical approaches adopted by a selected panel of twelve international research teams. It covers a wide range of novel and advanced materials, exploring their structural, elastic, optical, mass and electronic transport properties. The cutting-edge techniques presented appeal to physicists, applied mathematicians and engineers interested in advanced simulation methods in materials science. The book can also be used as additional literature for undergraduate and postgraduate students with majors in physics, chemistry, applied mathematics and engineering.