Deep Sub-micron Photolithography Control Through In-line Metrology PDF Download
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Author: Nickhil Harsh Jakatdar
Publisher:
ISBN:
Category :
Languages : en
Pages : 240
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Author: Nickhil Harsh Jakatdar
Publisher:
ISBN:
Category :
Languages : en
Pages : 240
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Author:
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ISBN:
Category : Electrical engineering
Languages : en
Pages : 620
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Author: James Moyne
Publisher: CRC Press
ISBN: 1420040669
Category : Technology & Engineering
Languages : en
Pages : 367
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Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
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Category : Measurement
Languages : en
Pages : 548
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Author: National Institute of Standards and Technology (U.S.)
Publisher:
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Category :
Languages : en
Pages : 406
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Author: Hsu-Ting Huang
Publisher:
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Category :
Languages : en
Pages : 336
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Author: United States. National Bureau of Standards
Publisher:
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Category :
Languages : en
Pages : 404
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Author: Kevin M. Monahan
Publisher:
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Category : Technology & Engineering
Languages : en
Pages : 238
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Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566770965
Category : Technology & Engineering
Languages : en
Pages : 644
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Author:
Publisher:
ISBN:
Category : Electronic circuit design
Languages : en
Pages : 540
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