Author: Libor Juha
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Science
Languages : en
Pages : 246
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Damage to VUV, EUV, and X-ray Optics
Author: Libor Juha
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Science
Languages : en
Pages : 246
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Science
Languages : en
Pages : 246
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
High-precision EUV and X-ray Optics for Advanced Photon Source Facilities
Author: Qiushi Huang
Publisher: Frontiers Media SA
ISBN: 2832513182
Category : Science
Languages : en
Pages : 95
Book Description
Publisher: Frontiers Media SA
ISBN: 2832513182
Category : Science
Languages : en
Pages : 95
Book Description
Handbook of X-ray and Gamma-ray Astrophysics
Author: Cosimo Bambi
Publisher: Springer Nature
ISBN: 9811969604
Category :
Languages : en
Pages : 5912
Book Description
Publisher: Springer Nature
ISBN: 9811969604
Category :
Languages : en
Pages : 5912
Book Description
Optical Technologies for Extreme-Ultraviolet and Soft X-ray Coherent Sources
Author: Federico Canova
Publisher: Springer
ISBN: 3662474433
Category : Science
Languages : en
Pages : 205
Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Publisher: Springer
ISBN: 3662474433
Category : Science
Languages : en
Pages : 205
Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
X-Ray Free-Electron Laser
Author: Kiyoshi Ueda
Publisher: MDPI
ISBN: 3038428795
Category : Mathematics
Languages : en
Pages : 457
Book Description
This book is a printed edition of the Special Issue "X-Ray Free-Electron Laser" that was published in Applied Sciences
Publisher: MDPI
ISBN: 3038428795
Category : Mathematics
Languages : en
Pages : 457
Book Description
This book is a printed edition of the Special Issue "X-Ray Free-Electron Laser" that was published in Applied Sciences
Lithography
Author: Michael Wang
Publisher: BoD – Books on Demand
ISBN: 9533070641
Category : Science
Languages : en
Pages : 680
Book Description
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Publisher: BoD – Books on Demand
ISBN: 9533070641
Category : Science
Languages : en
Pages : 680
Book Description
Lithography, the fundamental fabrication process of semiconductor devices, plays a critical role in micro- and nano-fabrications and the revolution in high density integrated circuits. This book is the result of inspirations and contributions from many researchers worldwide. Although the inclusion of the book chapters may not be a complete representation of all lithographic arts, it does represent a good collection of contributions in this field. We hope readers will enjoy reading the book as much as we have enjoyed bringing it together. We would like to thank all contributors and authors of this book.
Damage to VUV, EUV, and X-ray Optics II
Author: Libor Juha
Publisher:
ISBN:
Category : Far ultraviolet radiation
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Far ultraviolet radiation
Languages : en
Pages :
Book Description
Damage to VUV, EUV, and X-Ray Optics VI
Author: Libor Juha
Publisher:
ISBN: 9781510609730
Category :
Languages : en
Pages : 80
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Publisher:
ISBN: 9781510609730
Category :
Languages : en
Pages : 80
Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Damage to VUV, EUV, and X-Ray Optics IV; and EUV and X-ray Optics
Author: Libor Juha
Publisher:
ISBN:
Category : Far ultraviolet radiation
Languages : en
Pages : 364
Book Description
Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.
Publisher:
ISBN:
Category : Far ultraviolet radiation
Languages : en
Pages : 364
Book Description
Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.
Laser-Induced Damage in Optical Materials
Author: Detlev Ristau
Publisher: CRC Press
ISBN: 1439872171
Category : Science
Languages : en
Pages : 544
Book Description
Dedicated to users and developers of high-powered systems, Laser-Induced Damage in Optical Materials focuses on the research field of laser-induced damage and explores the significant and steady growth of applications for high-power lasers in the academic, industrial, and military arenas. Written by renowned experts in the field, this book concentr
Publisher: CRC Press
ISBN: 1439872171
Category : Science
Languages : en
Pages : 544
Book Description
Dedicated to users and developers of high-powered systems, Laser-Induced Damage in Optical Materials focuses on the research field of laser-induced damage and explores the significant and steady growth of applications for high-power lasers in the academic, industrial, and military arenas. Written by renowned experts in the field, this book concentr