C, H, N and O in Si and Characterization and Simulation of Materials and Processes PDF Download
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Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
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Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: A. Borghesi
Publisher: Newnes
ISBN: 044459633X
Category : Technology & Engineering
Languages : en
Pages : 580
Get Book Here
Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry. The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
Author: 国立国会図書館 (Japan)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1592
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Book Description
Author: Kokuritsu Kokkai Toshokan (Japan)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1596
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Book Description
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Congresses and conventions
Languages : en
Pages : 860
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Book Description
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1594
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Book Description
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Tyler B. Coplen
Publisher:
ISBN:
Category : Geochemistry
Languages : en
Pages : 112
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Book Description
Documented variations in the isotopic compositions of some chemical elements are responsible for expanded uncertainties in the standard atomic weights published by the Commission on Atomic Weights and Isotopic Abundances of the International Union of Pure and Applied Chemistry. This report summarizes reported variations in the isotopic compositions of 20 elements that are due to physical and chemical fractionation processes (not due to radioactive decay) and their effects on the standard atomic weight uncertainties. For 11 of those elements (hydrogen, lithium, boron, carbon, nitrogen, oxygen, silicon, sulfur, chlorine, copper, and selenium), standard atomic weight uncertainties have been assigned values that are substantially larger than analytical uncertainties because of common isotope abundance variations in materials of natural terrestrial origin. For 2 elements (chromium and thallium), recently reported isotope abundance variations potentially are large enough to result in future expansion of their atomic weight uncertainties. For 7 elements (magnesium, calcium, iron, zinc, molybdenum, palladium, and tellurium), documented isotope-abundance variations in materials of natural terrestrial origin are too small to have a significant effect on their standard atomic weight uncertainties.
Author: Raivo Jaaniso
Publisher: Woodhead Publishing
ISBN: 0081025602
Category : Technology & Engineering
Languages : en
Pages : 512
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Book Description
Semiconductor Gas Sensors, Second Edition, summarizes recent research on basic principles, new materials and emerging technologies in this essential field. Chapters cover the foundation of the underlying principles and sensing mechanisms of gas sensors, include expanded content on gas sensing characteristics, such as response, sensitivity and cross-sensitivity, present an overview of the nanomaterials utilized for gas sensing, and review the latest applications for semiconductor gas sensors, including environmental monitoring, indoor monitoring, medical applications, CMOS integration and chemical warfare agents. This second edition has been completely updated, thus ensuring it reflects current literature and the latest materials systems and applications. - Includes an overview of key applications, with new chapters on indoor monitoring and medical applications - Reviews developments in gas sensors and sensing methods, including an expanded section on gas sensor theory - Discusses the use of nanomaterials in gas sensing, with new chapters on single-layer graphene sensors, graphene oxide sensors, printed sensors, and much more
Author: Bertrand Lavédrine
Publisher: Getty Publications
ISBN: 9780892367016
Category : Art
Languages : en
Pages : 304
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Book Description
A resource for the photographic conservator, conservation scientist, curator, as well as professional collector, this volume synthesizes both the masses of research that has been completed to date and the international standards that have been established on the subject.
Author: International Atomic Energy Agency
Publisher: IAEA Radiation Technology Repo
ISBN: 9789201251107
Category : Science
Languages : en
Pages : 145
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Book Description
This publication addresses recent developments in neutron generator (NG) technology. It presents information on compact instruments with high neutron yield to be used for neutron activation analysis (NAA) and prompt gamma neutron activation analysis in combination with high count rate spectrometers. Traditional NGs have been shown to be effective for applications including borehole logging, homeland security, nuclear medicine and the on-line analysis of aluminium, coal and cement. Pulsed fast thermal neutron analysis, as well as tagged and timed neutron analysis, are additional techniques which can be applied using NG. Furthermore, NG can effectively be used for elemental analysis and is also effective for analysis of hidden materials by neutron radiography. Useful guidelines for developing NG based research laboratories are also provided in this publication.
