Combinatorial Atmospheric Pressure Chemical Vapour Deposition for Optimising the Functional Properties of Titania Thin-films PDF Download
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Author: Andreas Kafizas
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Languages : en
Pages : 0
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Author: Andreas Kafizas
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Languages : en
Pages : 0
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Author: A. G. Kafizas
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Languages : en
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Author: Abdullah Mohmmed Alotaibi
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Languages : en
Pages : 0
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Titanium dioxide (TiO2) is the leading material for self-cleaning applications due to its unique propertiesAÌ‚ ̧ including the fact that it exhibits high photocatalysis, mechanical robustness, chemical inertness, low cost, environmentally friendliness and abundance. The bandgap of TiO2 is relatively large, and this limits its outdoor applications. Another obstacle for its use as a photocatalyst is the high level of electron"â€hole recombination and low rate of photoreaction with reactants. There have been great efforts to improve the photocatalytic properties of TiO2. These have involved searching for ways of decreasing the bandgap structure and recombination rate, as well as improving the electronic structure to enhance its functional properties under visible light. One useful approach for achieving a suitable bandgap and improving electron"â€hole separation is combining or doping TiO2 with anionic and/or cationic species. In this study, Cu-doped TiO2 films were deposited via aerosol-assisted chemical vapour deposition (AACVD). The Cu-doped TiO2 films system in both phases (anatase and rutile) were specifically investigated for improved photocatalytic and antimicrobial properties of TiO2 under UVA compared with pure TiO2 thin films. Interactions between substitutional (replacing oxygen sites) and interstitial (sitting in the TiO2 lattice) Cu in the anatase lattice may also explain the enhancement in exciton lifetimes. A range of copper concentrations (2, 5, 10 and 20%) was investigated so that the photocatalytic and antibacterial abilities (vs. S. aureus and E. coli) could be determined. Effective dopant selection and concentration control is key to providing the maximum efficiency in terms of carrier lifetimes for migration to the surface for the necessary reactions to take place in photocatalysis and antibacterial activity. Interestingly, the AACVD system could be used to deposit TiO2 in rutile form on a thin layer of ZrO2 at 500°C. Cu-doped rutile"â€TiO2 films using a range of copper concentrations (2, 5, 10 and 20%) were investigated as well. The films showed surface plasmon resonance (SPR). In addition, these films exhibited enhanced photocatalytic activity under visible light irradiation, which could have been due to SPR. To the best of our knowledge, this is the first time that the brookite thin film form has been deposited by AACVD; in using AACVD to deposit the brookite TiO2 thin films, the band structure and photocatalytic properties were investigated. The brookite films grown by AACVD showed a direct bandgap of 3.4 eV. It was found that the photocatalytic properties of the brookite form, in comparison with degradation of stearic acid, were greater than the activity of anatase TiO2 thin films, as well as active glass. In addition, transient absorption spectroscopy (TAS) measurements showed that the hole"â€electron recombination dynamics are similar in both phases. The high surface area of the brookite form compared with the surface area of the anatase thin film could be the primary reason for the super-photocatalytic properties. Surprisingly, the brookite film exhibited superhydrophilic properties prior to any irradiation. The addition of Zn and nitrogen into the matrix of TiO2 films by AACVD was studied most extensively to improve the functional properties of TiO2 and achieve its activity under visible light. The oxygen atom in TiO2 lattice can be replaced by a nitrogen atom, which is called Ns (substitutional doping) in this case; alternatively, nitrogen atoms can be set in the TiO2 lattice, and this is called Ni (interstitial doping). These approaches create NHX and NOX surface species, which were observed using the X-ray photoelectron spectroscopy (XPS) results in this research. Transient absorption spectroscopy (TAS) was used to investigate the addition of (N + Zn) on the charge carrier dynamics of TiO2. Heterojunction systems of semiconductor materials are employed in different applications, such as water splitting, catalysis and electronic devices. These systems strengthen the synergistic effect, electron tunnelling and electron transfer, thereby leading to improved performance compared with the individual components. By using AACVD and APCVD processes with heterojunction systems, TiO2/Fe2O3 films were deposited, and different thicknesses of TiO2 were used on the Fe2O3 films. The resulting TiO2/Fe2O3 films exhibited enhanced performance in terms of the photocatalytic properties for the degradation of stearic acid under white light, as well as better photocurrent density and stability of the TiO2/α-Fe2O3 heterojunction. The TAS measurements showed the extent of its lifetime photogenerated charges.
Author: Polly Wanda Chu
Publisher:
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Category :
Languages : en
Pages : 434
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Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author: John L. Hodgkinson
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Category :
Languages : en
Pages :
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Author: Anuj K. Basil
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Category :
Languages : en
Pages : 0
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Author: Hideki Matsumura
Publisher: John Wiley & Sons
ISBN: 3527818669
Category : Technology & Engineering
Languages : en
Pages : 560
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The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Author: Jong-Hee Park
Publisher: ASM International
ISBN: 161503224X
Category : Technology & Engineering
Languages : en
Pages : 477
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Author: Sarah R. Kurtz
Publisher:
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Category : Vapor-plating
Languages : en
Pages : 254
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Author: Luz Romero
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Category :
Languages : en
Pages :
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