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Author: Horacio E. Bergna
Publisher: CRC Press
ISBN: 1420028707
Category : Science
Languages : en
Pages : 926
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Book Description
In spite of the apparent simplicity of silica's composition and structure, scientists are still investigating fundamental questions regarding the formation, constitution, and behavior of colloidal silica systems. Colloidal Silica: Fundamentals and Applications introduces new information on colloid science related to silica chemistry as well
Author: Horacio E. Bergna
Publisher: CRC Press
ISBN: 1420028707
Category : Science
Languages : en
Pages : 926
Get Book Here
Book Description
In spite of the apparent simplicity of silica's composition and structure, scientists are still investigating fundamental questions regarding the formation, constitution, and behavior of colloidal silica systems. Colloidal Silica: Fundamentals and Applications introduces new information on colloid science related to silica chemistry as well
Author: Horacio E. Bergna
Publisher:
ISBN: 9781628706512
Category : Colloids
Languages : en
Pages : 912
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Book Description
Author: Horacio E. Bergna
Publisher:
ISBN:
Category : Nature
Languages : en
Pages : 728
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Book Description
Presents papers from the Ralph K. Iler Memorial Symposium on the colloid chemistry of silica. Includes an overview of the topic by the volume editor. Includes sections on preparation and stability of sols, surface chemistry of silica, particle size and characterization techniques, sol-gel technology, silica gels and powders, silica coatings, uses of colloidal silicas, and silica research in Russia. Of interest to colloid chemists, researchers, and industrial workers with an interest in silica.
Author: Ralph K. Iler
Publisher: Wiley-Interscience
ISBN:
Category : Nature
Languages : en
Pages : 904
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Book Description
Surfactants and Interfacial Phenomena Milton J. Rosen Bridging the gap between purely theoretical aspects of surface chemistry and the purely empirical experience of the industrial technologist, this book applies theoretical surface chemistry to understanding the action of surfactants in modifying interfacial phenomena. It surveys the structural types of commercially available surfactants and discusses interfacial phenomena, the physicochemical principles underlying the action of surfactants in each phenomenon, and the effect of structural changes in the surfactants and environmental changes on their action. Tables of data on various interfacial properties of surfactants, compiled and calculated from the latest scientific literature, are included. 1978 304 pp. An Introduction to Clay Colloid Chemistry, 2nd Ed. H. van Olphen This book provides valuable guidance in research and design efforts by giving a clear understanding of principles and concepts of colloid chemistry as applied to clay systems. Updated and enlarged, this edition includes new information on surface characterization and adsorption mechanisms; recent results in the area of clay-organic interaction--the intercalation and intersalation of kaolinite minerals; and increased attention to the possible role of clays in biological evolution. 1977 318 pp. Physicochemical Processes for Water Quality Control Walter J. Weber, Jr. Focusing on physicochemical rather than biological processes, this book presents a comprehensive treatise on the treatment of municipal and industrial water and wastewater. All of the physicochemical processes important to municipal and industrial water and wastewater treatment--coagulation, filtration, membrane processes, chemical oxidation, and others--are included and each is covered thoroughly from principle through application. To maintain a high level of expertise, contributions have been incorporated from specialists actively involved in research or engineering applications in each area considered. 1972 640 pp.
Author: Metin Çelik
Publisher: CRC Press
ISBN: 1420089188
Category : Medical
Languages : en
Pages : 360
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Book Description
Compaction of powder constituents-both active ingredient and excipients-is examined to ensure consistent and reproducible disintegration and dispersion profiles. Revised to reflect modern pharmaceutical compacting techniques, this second edition of Pharmaceutical Powder Compaction Technology guides pharmaceutical engineers, formulation scientists,
Author:
Publisher: ScholarlyEditions
ISBN: 148168017X
Category : Science
Languages : en
Pages : 836
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Book Description
Silicon Compounds—Advances in Research and Application: 2013 Edition is a ScholarlyEditions™ book that delivers timely, authoritative, and comprehensive information about Silanes. The editors have built Silicon Compounds—Advances in Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Silanes in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Silicon Compounds—Advances in Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author: Geological Survey (U.S.)
Publisher:
ISBN:
Category :
Languages : en
Pages : 286
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Book Description
Author:
Publisher:
ISBN:
Category : Geology
Languages : en
Pages : 328
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Book Description
Author:
Publisher:
ISBN:
Category : Geology
Languages : en
Pages : 640
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Book Description
Author: Toshiro Doi
Publisher: William Andrew
ISBN: 1437778607
Category : Technology & Engineering
Languages : en
Pages : 330
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Book Description
CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field – making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology – the science of friction, wear and lubrication – the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. - Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering - Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments - The authors bring together the latest innovations and research from the USA and Japan
