Code Compliance for Advanced Technology Facilities PDF Download
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Author: William R. Acorn
Publisher: William Andrew
ISBN: 0815513380
Category : Law
Languages : en
Pages : 375
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Book Description
Facilities which utilize hazardous liquids and gases represent a significant potential liability to the owner, operator, and general public in terms of personnel safety and preservation of assets. It is obvious that a catastrophic incident or loss of property or personnel is to be avoided at all costs. This book was conceived to give the reader a guide to understanding the requirements of the various codes and regulations that apply to the design, construction, and operation of facilities utilizing hazardous materials in their processes.
Author: William R. Acorn
Publisher: William Andrew
ISBN: 0815513380
Category : Law
Languages : en
Pages : 375
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Book Description
Facilities which utilize hazardous liquids and gases represent a significant potential liability to the owner, operator, and general public in terms of personnel safety and preservation of assets. It is obvious that a catastrophic incident or loss of property or personnel is to be avoided at all costs. This book was conceived to give the reader a guide to understanding the requirements of the various codes and regulations that apply to the design, construction, and operation of facilities utilizing hazardous materials in their processes.
Author: Richard A. Bolmen
Publisher: William Andrew
ISBN: 0815518994
Category : Technology & Engineering
Languages : en
Pages : 635
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Book Description
Interwoven within our semiconductor technology development had been the development of technologies aimed at identifying, evaluating and mitigating the environmental, health and safety (EH&S) risks and exposures associated with the manufacturing and packaging of integrated circuits. Driving and advancing these technologies have been international efforts by SEMI's Safety Division, the Semiconductor Safety Association (SSA), and the Semiconductor Industry Association (SIA). The purpose of the Semiconductor Safety Handbook is to provide a current, single source reference for many of the primary semiconductor EH&S technologies and disciplines. To this end, the contributors have assembled a comprehensive text written by some of the leading experts in EH&S in the semiconductor industry. This text had taken three years to complete and has involved tremendous effort and commitment by the authors.They have attempted to construct a reference manual that is comprehensive in its coverage of the technical aspects of each individual subject, while at the same time addressing practical applications of each topic. The scope of this text, from its inception, was intended to address significantly more than what would typically be classified under the definition of ""safety."" However, all of the chapters have a direct application to the protection and preservation of semiconductor employees, the surrounding communities and the environment.This book is a hands-on reference to environmental, health and safety issues critical to the semiconductor industry. It was also the author's intent to produce a text that provides a practical user's guide for semiconductor environmental, health and safety practitioners as well as those individuals responsible for operation, maintenance and production in wafer fabrication facilities.
Author: Oleg A. Popov
Publisher: Elsevier
ISBN: 0815517890
Category : Science
Languages : en
Pages : 467
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Book Description
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.
Author: Raymond L. Boxman
Publisher: William Andrew
ISBN: 0815517793
Category : Technology & Engineering
Languages : en
Pages : 775
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Book Description
This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
Author: Paul H. Holloway
Publisher: Cambridge University Press
ISBN: 0080946143
Category : Technology & Engineering
Languages : en
Pages : 937
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Book Description
This book reviews the recent advances and current technologies used to produce microelectronic and optoelectronic devices from compound semiconductors. It provides a complete overview of the technologies necessary to grow bulk single-crystal substrates, grow hetero-or homoepitaxial films, and process advanced devices such as HBT's, QW diode lasers, etc.
Author: Tyozi Uyeda
Publisher: Elsevier
ISBN: 0815519419
Category : Technology & Engineering
Languages : en
Pages : 469
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Book Description
This book was written with several objectives in mind: 1. To share with as many scientists and engineers as possible the intriguing scientific aspects of ultra-fine particles (UFPs) and to show their potential as new materials. 2. Entice such researchers to participate in the development of this emerging field. 3. To publicize the achievements of the Ultra-Fine Particle Project, which was carried out under the auspices of the Exploratory Research for Advanced Technology program (ERATO). In addition to the members of the Ultra-Fine Particle Project, contributions from other pioneers in this field are included. To achieve the first objective described above, the uniformity of the contents and focus on a single central theme have been sacrificed somewhat to provide a broad coverage. It is expected that the reader can discover an appropriate topic for further development of new materials and basic technology by reading selected sections of this book. Alternately, one may gain an overview of this new field by reviewing the entire book, which can potentially lead to new directions in the development of UFPs.
Author: Huimin Liu
Publisher: Elsevier
ISBN: 0815516878
Category : Technology & Engineering
Languages : en
Pages : 207
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Book Description
This book presents an updated, systematic review of the latest developments in diamond CVD processes, with emphasis on the nucleation and early growth of diamond CVD. The objective is to familiarize the reader with the scientific and engineering aspects of diamond CVD, and to provide experiences researchers, scientists, and engineers in academia and industry with the latest developments in this growing field.
Author: Terry W. McDaniel
Publisher: Elsevier
ISBN: 0815517599
Category : Technology & Engineering
Languages : en
Pages : 967
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Book Description
This handbook brings together in a single volume expert contributions on the many aspects of MO data recording, including the materials in use, techniques for achieving recording function, and storage device subsystems. As a multiple author treatment, it brings perspective from many viewpoints and institutions. The insights delivered should be valuable to a wide audience from students to practitioners in all areas of information storage.
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 081551770X
Category : Technology & Engineering
Languages : en
Pages : 363
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Book Description
Refractory carbides and nitrides are useful materials with numerous industrial applications and a promising future, in addition to being materials of great interest to the scientific community. Although most of their applications are recent, the refractory carbides and nitrides have been known for over one hundred years. The industrial importance of the refractory carbides and nitrides is growing rapidly, not only in the traditional and well-established applications based on the strength and refractory nature of these materials such as cutting tools and abrasives, but also in new and promising fields such as electronics and optoelectronics.
Author: E. Dow Whitney
Publisher: William Andrew
ISBN: 0815516312
Category : Technology & Engineering
Languages : en
Pages : 384
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Book Description
Interest in ceramics as a high speed cutting tool material is based primarily on favorable material properties. As a class of materials, ceramics possess high melting points, excellent hardness and good wear resistance. Unlike most metals, hardness levels in ceramics generally remain high at elevated temperatures which means that cutting tip integrity is relatively unaffected at high cutting speeds. Ceramics are also chemically inert against most workmetals.
