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Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
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Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Get Book Here
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author: Ekkes H. Brück
Publisher: Elsevier
ISBN: 0444641629
Category : Science
Languages : en
Pages : 424
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Book Description
Handbook of Magnetic Materials, Volume 27, covers the expansion of magnetism over the last few decades and its applications in research, notably the magnetism of several classes of novel materials that share the presence of magnetic moments with truly ferromagnetic materials. The book is an ideal reference for scientists active in magnetism research, providing readers with novel trends and achievements in magnetism. Each article contains an extensive description given in graphical, as well as, tabular form, with much emphasis placed on the discussion of the experimental material within the framework of physics, chemistry and materials science. - Comprises topical review articles written by leading authorities - Includes a variety of self-contained introductions to a given area in the field of magnetism without requiring recourse to the published literature - Introduces given topics in the field of magnetism - Describes novel trends and achievements in magnetism
Author: Denys Makarov
Publisher: Springer Nature
ISBN: 3031090861
Category : Science
Languages : en
Pages : 420
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Book Description
This is the first book providing overview of magnetism in curved geometries, highlighting numerous peculiarities emerging from geometrically curved magnetic objects such as curved wires, shells, as well as complex three-dimensional structures. Extending planar two-dimensional structures into the three-dimensional space has become a general trend in multiple disciplines across electronics, photonics, plasmonics and magnetics. This approach provides the means to modify conventional and even launch novel functionalities by tailoring the local curvature of an object. The book covers the theory of curvilinear micromagnetism as well as experimental studies of geometrically curved magnets including both fabrication and characterization. With its coverage of fundamental aspects, together with exploration of numerous applications across magnonics, bio-engineering, soft robotics and shapeable magnetoelectronics, this edited collection is ideal for all scientists in academia and industry seeking an overview and wishing to keep abreast of advances in the novel field of curvilinear micromagnetism. It provides easy but comprehensive access to the field for newcomers, and can be used for graduate-level courses on this subject.
Author: Richard C. Alkire
Publisher: John Wiley & Sons
ISBN: 3527340920
Category : Science
Languages : en
Pages : 429
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Book Description
Volume XVII in the "Advances in Electrochemical Science and Engineering" series, this monograph covers progress in this rapidly developing field with a particular emphasis on important applications, including spectroscopy, medicinal chemistry and analytical chemistry. As such it covers nanopatterned and nanoparticle-modified electrodes for analytical detection, surface spectroscopy, electrocatalysis and a fundamental understanding of the relation between the electrode structure and its function. Written by a group of international experts, this is a valuable resource for researchers working in such fields as electrochemistry, materials science, spectroscopy, analytical and medicinal chemistry.
Author: R Newman
Publisher: Elsevier
ISBN: 0444601287
Category : Science
Languages : en
Pages : 492
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Book Description
Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.
Author: R. C. Sobti
Publisher: Springer Nature
ISBN: 9819962633
Category :
Languages : en
Pages : 1584
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Book Description
Author: Manuel Vázquez
Publisher: Woodhead Publishing
ISBN: 0081028326
Category : Technology & Engineering
Languages : en
Pages : 1010
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Book Description
Magnetic Nano-and Microwires: Design, Synthesis, Properties and Applications, Second Edition, reviews the growth and processing of nanowires and nanowire heterostructures using such methods as sol-gel and electrodeposition, focused-electron/ion-beam-induced deposition, epitaxial growth by chemical vapor transport, and more. Other sections cover engineering nanoporous anodic alumina, discuss magnetic and transport properties, domains, domain walls in nano-and microwires. and provide updates on skyrmions, domain walls, magnetism and transport, and the latest techniques to characterize and analyze these effects. Final sections cover applications, both current and emerging, and new chapters on memory, sensor, thermoelectric and nanorobotics applications. This book will be an ideal resource for academics and industry professionals working in the disciplines of materials science, physics, chemistry, electrical and electronic engineering and nanoscience.
Author: Tabrej Khan
Publisher: Springer Nature
ISBN: 9819941490
Category : Technology & Engineering
Languages : en
Pages : 310
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Book Description
This book provides a general overview of different classes of nanomaterials, which includes the synthesis, fabrication, characterization, properties and technological applications of these materials. The book covers 4 main types of nanomaterials, namely: A) soft nanomaterials, B) biological nanomaterials, C) composite nanomaterials and D) green nanomaterials, where for each nanomaterials, a complete guide to material synthesis, characterization, their unique properties (as compared to a conventional bulk material) and potential technological applications is presented. One of the book's most notable characteristics is the inclusion of a section, a special focus on the future of nanomaterials for next-generation technology in electronic, power and energy devices. The content of this book is presented in a simple and lucid style which can also be used by professionals, scientists and students who are interested in the general research area of nanomaterials technology.
Author: Tridib Kumar Bhowmick
Publisher: CRC Press
ISBN: 1040015735
Category : Technology & Engineering
Languages : en
Pages : 357
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Book Description
This book covers topics related to drug delivery, biomaterials, drug design, formulation development, nanoscience, and nanotechnology. It describes the fundamental concepts in nanotechnology and their different applications in biotechnology to solve engineering challenges and generate new areas of technological development. Nanobiotechnology: Applications of Nanomaterials in Biotechnology, Medicine, and Healthcare covers vast application areas that include medical science, material science, pharmaceutical science, and environmental science. Section 1 presents recent research updates on the different nanomaterials, which are promising in different medical and biotechnological applications. Applications of nanomaterials as bone replacement orthopedic implants have revolutionized the treatment of orthopedic surgery. Nanostructured polymeric materials have gained immense research attention as therapeutic carriers for the precise delivery of drugs at targeted sites. Nanocellulose is recognized as a promising green nanomaterial due to its renewability and abundance in nature. Scientific topics on the most recent scientific and technological advances and applications of different nanostructured materials are presented in this section. Section 2 focuses on the novel synthesis methods that are used extensively and are promising for large-scale production of inorganic and nanostructured materials. Section 3 covers the applications of nanotools in the treatment of different diseases, including cancers and genetic diseases. The increasing use of nanotechnology will bring changes in the manufacturing processes of nanomaterials. The applications of nanomaterials in the field of medical imaging and molecular detection are presented in section 4. This book will be useful for students, researchers, scientists, academicians, and industrial manufacturers to understand the importance and applicability of nanomaterials in the field of biotechnology and medical science.
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1439876762
Category : Technology & Engineering
Languages : en
Pages : 851
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Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
