Chemical Vapor Deposition of Silicon Carbide PDF Download
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Author: Schyi-yi Wu
Publisher:
ISBN:
Category : Silicon carbide
Languages : en
Pages : 322
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Book Description
Author: Schyi-yi Wu
Publisher:
ISBN:
Category : Silicon carbide
Languages : en
Pages : 322
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Book Description
Author: Shirish M. Gupte
Publisher:
ISBN:
Category :
Languages : en
Pages : 476
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Book Description
Author: Jing-Jia Huang
Publisher:
ISBN: 9789179295035
Category :
Languages : en
Pages : 0
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Author: Feng Gao
Publisher:
ISBN:
Category :
Languages : en
Pages : 161
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Author: Feng Liao
Publisher:
ISBN:
Category :
Languages : en
Pages : 338
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Book Description
Author: T. Hirai
Publisher:
ISBN:
Category :
Languages : en
Pages : 15
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Book Description
Author: Robert M. Galasso
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 60
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Book Description
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author: Chigozie Mbeledogu
Publisher:
ISBN:
Category :
Languages : en
Pages : 188
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Author: Abebe Mesfin
Publisher:
ISBN:
Category :
Languages : en
Pages : 84
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