Author: Fabian I. Ezema
Publisher: Springer Nature
ISBN: 3030684628
Category : Technology & Engineering
Languages : en
Pages : 926
Book Description
This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.
Chemically Deposited Nanocrystalline Metal Oxide Thin Films
Author: Fabian I. Ezema
Publisher: Springer Nature
ISBN: 3030684628
Category : Technology & Engineering
Languages : en
Pages : 926
Book Description
This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.
Publisher: Springer Nature
ISBN: 3030684628
Category : Technology & Engineering
Languages : en
Pages : 926
Book Description
This book guides beginners in the areas of thin film preparation, characterization, and device making, while providing insight into these areas for experts. As chemically deposited metal oxides are currently gaining attention in development of devices such as solar cells, supercapacitors, batteries, sensors, etc., the book illustrates how the chemical deposition route is emerging as a relatively inexpensive, simple, and convenient solution for large area deposition. The advancement in the nanostructured materials for the development of devices is fully discussed.
Chemical Vapor Deposition: 1960-1980
Author: Donald T. Hawkins
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Publisher: Springer
ISBN:
Category : Reference
Languages : en
Pages : 762
Book Description
Chemical Vapour Deposition
Author: Anthony C. Jones
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Publisher: Royal Society of Chemistry
ISBN: 0854044655
Category : Science
Languages : en
Pages : 600
Book Description
"The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket
Nuclear Science Abstracts
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 912
Book Description
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 912
Book Description
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 500
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 500
Book Description
Protective Coatings and Thin Films
Author: Y. Pauleau
Publisher: Springer Science & Business Media
ISBN: 9780792343806
Category : Technology & Engineering
Languages : en
Pages : 694
Book Description
This volume entitled "Protective Coatings and Thin Films : Synthesis, Characterization and Applications" contains the Proceedings of the NATO Advanced Research Workshop (ARW) held in Alvor, Portugal from May 30 to June 5, 1996. This NATO-ARW was an expert meeting on the surface protection and modification of solid materials subjected to interactions with the environment. The meeting attracted 10 key speakers, 40 contributing speakers and 3 observers from various countries. The existing knowledge and current status of the science and technology related to protective coatings and thin films were assessed through a series of oral presentations, key notes (titles underlined in the volume content) and contributed papers distributed over various sessions dealing with: (a) plasma-assisted physical and chemical vapor deposition processes to enhance wear and corrosion protection of materials, (b) low friction coatings operating in hostile environment (vacuum, space, extreme temperatures, . . . ), (c) polymer films for protection against mechanical damage and chemical attack, (d) characterization of the structure of films and correlations with mechanical properties, (e) wear and corrosion resistant thermal spray coatings, (f) functional gradient ceramic/metallic coatings produced by high energy laser beam and energetic deposition processes for high temperature applications, (g) protective coatings for optical systems, and (h) ion beam assisted deposition of coatings for protection of materials against aqueous corrosion.
Publisher: Springer Science & Business Media
ISBN: 9780792343806
Category : Technology & Engineering
Languages : en
Pages : 694
Book Description
This volume entitled "Protective Coatings and Thin Films : Synthesis, Characterization and Applications" contains the Proceedings of the NATO Advanced Research Workshop (ARW) held in Alvor, Portugal from May 30 to June 5, 1996. This NATO-ARW was an expert meeting on the surface protection and modification of solid materials subjected to interactions with the environment. The meeting attracted 10 key speakers, 40 contributing speakers and 3 observers from various countries. The existing knowledge and current status of the science and technology related to protective coatings and thin films were assessed through a series of oral presentations, key notes (titles underlined in the volume content) and contributed papers distributed over various sessions dealing with: (a) plasma-assisted physical and chemical vapor deposition processes to enhance wear and corrosion protection of materials, (b) low friction coatings operating in hostile environment (vacuum, space, extreme temperatures, . . . ), (c) polymer films for protection against mechanical damage and chemical attack, (d) characterization of the structure of films and correlations with mechanical properties, (e) wear and corrosion resistant thermal spray coatings, (f) functional gradient ceramic/metallic coatings produced by high energy laser beam and energetic deposition processes for high temperature applications, (g) protective coatings for optical systems, and (h) ion beam assisted deposition of coatings for protection of materials against aqueous corrosion.
Ceramic Abstracts
Author: American Ceramic Society
Publisher:
ISBN:
Category : Ceramics
Languages : en
Pages : 1150
Book Description
Publisher:
ISBN:
Category : Ceramics
Languages : en
Pages : 1150
Book Description
Chemical Abstracts
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
Book Description
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
Book Description
Handbook of Chemical Vapor Deposition
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Dissertation Abstracts International
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 782
Book Description
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 782
Book Description