Characterization and Metrology for ULSI Technology: 2003

Characterization and Metrology for ULSI Technology: 2003 PDF Author: David G. Seiler
Publisher: American Institute of Physics
ISBN:
Category : Computers
Languages : en
Pages : 868

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Book Description
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The editors believe that this book of collected papers provides a concise and effective portrayal of industry characterization needs and the way they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. Hopefully, it will also provide a basis for stimulating advances in metrology and new ideas for research and development.

Characterization and Metrology for ULSI Technology: 2003

Characterization and Metrology for ULSI Technology: 2003 PDF Author: David G. Seiler
Publisher: American Institute of Physics
ISBN:
Category : Computers
Languages : en
Pages : 868

Get Book Here

Book Description
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Topics include: integrated circuit history, challenges and overviews, front end, lithography, interconnect and back end, and critical analytical techniques. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The editors believe that this book of collected papers provides a concise and effective portrayal of industry characterization needs and the way they are being addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. Hopefully, it will also provide a basis for stimulating advances in metrology and new ideas for research and development.

Characterization and Metrology for ULSI Technology

Characterization and Metrology for ULSI Technology PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description


Characterization and Metrology for ULSI Technology 2000

Characterization and Metrology for ULSI Technology 2000 PDF Author: David G. Seiler
Publisher: American Institute of Physics
ISBN: 9781563969676
Category : Technology & Engineering
Languages : en
Pages : 708

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Book Description
The worldwide semiconductor community faces increasingly difficult challenges as it moves into the manufacturing of chips with feature sizes approaching 100 nm. Some of the challenges are materials-related, such as transistors with high-k dielectrics and on-chip interconnects made from copper and low-k dielectrics. The magnitude of these challenges demands special attention from those in the metrology and analytical measurements community. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continue the advances in semiconductor technology. It covers major aspects of the process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. It provides a concise and effective portrayal of industry characterization needs and some of the problems that must be addressed by industry, academia, and government to continue the dramatic progress in semiconductor technology. It also provides a basis for stimulating practical perspectives and new ideas for research and development.

Characterization and Metrology for ULSI Technology 2000

Characterization and Metrology for ULSI Technology 2000 PDF Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages :

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Book Description


Characterization and Metrology for ULSI Technology 2005

Characterization and Metrology for ULSI Technology 2005 PDF Author: David G. Seiler
Publisher: American Institute of Physics
ISBN:
Category : Computers
Languages : en
Pages : 714

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Book Description
The worldwide semiconductor community faces increasingly difficult challenges in the era of silicon nanotechnology and beyond. The magnitude of these challenges demands special attention from the metrology and analytical measurements community. New paradigms must be found. Adequate research and development for new metrology concepts are urgently needed. Characterization and metrology are key enablers for developing new semiconductor technology and in improving manufacturing. This book summarizes major issues and gives critical reviews of important measurement techniques that are crucial to continuing the advances in semiconductor technology. It covers major aspects of process technology and most characterization techniques for silicon research, including development, manufacturing, and diagnostics. The book also covers emerging nano-devices and the corresponding metrology challenges that arise.

Characterization and Metrology for ULSI Technology

Characterization and Metrology for ULSI Technology PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 960

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Book Description


Characterization and Metrology for ULSI Technology: 1998 International Conference, 23-27 March 1998

Characterization and Metrology for ULSI Technology: 1998 International Conference, 23-27 March 1998 PDF Author: D.G. Seiler
Publisher: American Institute of Physics
ISBN: 9781563968679
Category : Technology & Engineering
Languages : en
Pages : 960

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Book Description
The proceedings of the 1998 International Conference on Characterization and Metrology for ULSI Technology was dedicated to summarizing major issues and giving critical reviews of important semiconductor techniques that are crucial to continue the advances in semiconductor technology. Characterization and metrology are key enablers for developing semiconductor process technology and in improving manufacturing. This is the only book that we know of that emphasizes the science and technology of semiconductor characterization in the factory environment. The increasing importance of monitoring and controlling semiconductor processes make it particularly timely.

Istfa 2003

Istfa 2003 PDF Author: ASM International
Publisher: ASM International
ISBN: 1615030867
Category : Technology & Engineering
Languages : en
Pages : 534

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Book Description


Microscopy of Semiconducting Materials 2003

Microscopy of Semiconducting Materials 2003 PDF Author: A.G. Cullis
Publisher: CRC Press
ISBN: 1351091530
Category : Science
Languages : en
Pages : 1135

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Book Description
Modern electronic devices rely on ever-greater miniaturization of components, and semiconductor processing is approaching the domain of nanotechnology. Studies of devices in this regime can only be carried out with the most advanced forms of microscopy. Accordingly, Microscopy of Semiconducting Materials focuses on international developments in semiconductor studies carried out by all forms of microscopy. It provides an overview of the latest instrumentation, analysis techniques, and state-of-the-art advances in semiconducting materials science for solid state physicists, chemists, and material scientists.

Characterization and Metrology for ULSI Technology, 2000

Characterization and Metrology for ULSI Technology, 2000 PDF Author: David G. Seiler
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 734

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Book Description