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Author: Ana Londergan
Publisher: The Electrochemical Society
ISBN: 1566775426
Category : Atomic layer deposition
Languages : en
Pages : 300
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Book Description
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.
Author: Ana Londergan
Publisher: The Electrochemical Society
ISBN: 1566775426
Category : Atomic layer deposition
Languages : en
Pages : 300
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Book Description
This issue gives an overview of the cutting edge research in the various areas where Atomic Layer Deposition (ALD) can be used, enabling the identification of issues, challenges, and areas where further research is needed. Contributions include: Memory applications, Interconnects and contacts, ALD Productivity enhancement and precursor development, ALD for optical and photonic applications, and Applications in other areas, such as MEMs, nanotechnology, fabrication of sensors and catalysts, etc.
Author: Julien Bachmann
Publisher: John Wiley & Sons
ISBN: 3527694838
Category : Technology & Engineering
Languages : en
Pages : 366
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Book Description
Combining the two topics for the first time, this book begins with an introduction to the recent challenges in energy conversion devices from a materials preparation perspective and how they can be overcome by using atomic layer deposition (ALD). By bridging these subjects it helps ALD specialists to understand the requirements within the energy conversion field, and researchers in energy conversion to become acquainted with the opportunities offered by ALD. With its main focus on applications of ALD for photovoltaics, electrochemical energy storage, and photo- and electrochemical devices, this is important reading for materials scientists, surface chemists, electrochemists, electrotechnicians, physicists, and those working in the semiconductor industry.
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Nicola Pinna
Publisher: John Wiley & Sons
ISBN: 3527639926
Category : Technology & Engineering
Languages : en
Pages : 463
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Book Description
Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to meet the needs of producing high-quality, large-area fl at displays with perfect structure and process controllability. Nowadays, creating nanomaterials and producing nanostructures with structural perfection is an important goal for many applications in nanotechnology. As ALD is one of the important techniques which offers good control over the surface structures created, it is more and more in the focus of scientists. The book is structured in such a way to fi t both the need of the expert reader (due to the systematic presentation of the results at the forefront of the technique and their applications) and the ones of students and newcomers to the fi eld (through the first part detailing the basic aspects of the technique). This book is a must-have for all Materials Scientists, Surface Chemists, Physicists, and Scientists in the Semiconductor Industry.
Author: Pietro Mandracci
Publisher: BoD – Books on Demand
ISBN: 1789849608
Category : Technology & Engineering
Languages : en
Pages : 166
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Book Description
Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Author: J. W. Elam
Publisher: The Electrochemical Society
ISBN: 1607682567
Category :
Languages : en
Pages : 353
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Book Description
Author: Nathan J Patmore
Publisher: Royal Society of Chemistry
ISBN: 1788010671
Category : Science
Languages : en
Pages : 210
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Book Description
With the increase in volume, velocity and variety of information, researchers can find it difficult to keep up to date with the literature in their field. Providing an invaluable resource, this volume contains analysed, evaluated and distilled information on the latest in organometallic chemistry research and emerging fields. The reviews range in scope and include π-coordinated arene metal complexes and catalysis by arene exchange, rylenes as chromophores in catalysts for CO2 photoreduction, metal nodes and metal sites in metal–organic frameworks, developments in molecular precursors for CVD and ALD, and multiphoton luminescence processes in f-element containing compounds.
Author: Jeannie Valdez
Publisher:
ISBN: 9781634839204
Category : TECHNOLOGY & ENGINEERING
Languages : en
Pages : 183
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Book Description
Atomic layer deposition (ALD) is a thin film deposition technique used in the mass production of microelectronics. In this book, novel nonvolatile memory devices are discussed. The chapters examine the low-temperature fabrication process of single-crystal platinum non-thin films using plasma-enhanced atomic layer deposition (PEALD). A comprehensive review of ALD surface coatings for battery systems is provided, as well as a theoretical calculation on the mechanism of thermal and plasma-enhanced atomic layer deposition of SiO2; and fluorine doping behavior in Zn-based conducting oxide film grown by ALD.
Author: Electrochemical Society (United States). Dielectric Science and Technology Division
Publisher: ECS Transactions
ISBN: 9781566779029
Category :
Languages : en
Pages : 343
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Book Description
Atomic layer deposition (ALD) enables precise, ultra-thin, highly conformal coatings over complex topographies with superb composition control. This issue of the ECS Transactions contains peer reviewed papers presented at the Atomic Layer Deposition Applications 7 symposium and covers recent advances in ALD technology such as high throughput coating and emerging applications including photovoltaics and advanced memory devices.
Author: J. W. Elam
Publisher: The Electrochemical Society
ISBN: 1566778212
Category : Science
Languages : en
Pages : 469
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Book Description
The continuously expanding realm of Atomic Layer Deposition (ALD) Applications is the focus of this reoccurring symposium. ALD can enable the precise deposition of ultra-thin, highly conformal coatings over complex 3D topographies with controlled thickness and composition. This issue of ECS Transactions contains peer reviewed papers presented at the symposium. A broad spectrum of ALD applications is featured, including novel nano-composites and nanostructures, dielectrics for state-of-the-art transistors and capacitors, optoelectronics, and a variety of other emerging applications.
