Atmospheric Pressure Chemical Vapor Desposition of Hydrogenated Amorphous Silicon from Higher Silances PDF Download
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Author: Richard Joseph McCurdy
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 394
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Book Description
Author: Richard Joseph McCurdy
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 394
Get Book Here
Book Description
Author: Richard Joseph McCurdy
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 394
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Book Description
Author: Sarah R. Kurtz
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 254
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Book Description
Author: Frank Browning Ellis
Publisher:
ISBN:
Category : Hydrogenation
Languages : en
Pages : 400
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Book Description
Author: Frank Browning Ellis
Publisher:
ISBN:
Category : Semiconductor films
Languages : en
Pages : 197
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Book Description
Author: James William Proscia
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 528
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Book Description
Author: Amir Mikhail
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 0
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Book Description
Various chemical vapor deposition (CVD) techniques performed by research groups under contract to SERI in the area of chemical vapor deposition of hydrogenated amorphous silicon by using higher order silanes are discussed in this report. The static CVD system was found to produce films with nonuniform stoichiometry. All flow systems were capable of depositing films that produced a short-circuit current density of 10mA/cm2. Results of measurements performed at SERI and at the Naval Research Laboratory led to basic reactor modifications and increased emphasis on substrate diffusion barrier research.
Author: R. Bilenchi
Publisher:
ISBN:
Category :
Languages : en
Pages : 7
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Book Description
Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
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Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author: Siri Suzanne Thompson
Publisher:
ISBN:
Category :
Languages : en
Pages : 138
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Book Description
