Author: Jerzy Kanicki
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 670
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Amorphous Insulating Thin Films
Author:
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 660
Book Description
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 660
Book Description
Amorphous Insulating Thin Films: Volume 284
Author: Jerzy Kanicki
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 670
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 670
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Amorphous and Crystalline Insulating Thin Films - 1996: Volume 446
Author: William L. Warren
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 464
Book Description
This book is devoted to the continuing research and development of thin-dielectric films for optical and microelectronic applications. Although thermal SiO2 has been the dominant dielectric for thin films in microelectronic applications for many years, there is a growing need for low-dielectric constant materials for interlevel dielectrics (less capacitive cross-talk and reduced delay) and high-dielectric constant materials to minimize the space and maximize the capacitance of storage devices such as DRAMs. With the demands put forth by the microelectronics community, this field is expected to develop significantly in the near future. Also featured is the growing area involving the structure and characteriza-tion of buried a-SiO2 layers formed by O+ ion implantation or the Smart Cut UnibondĀ® process. These techniques are evolving into viable methods for producing commercial silicon-on-insulator substrates for device applications requiring radiation hardness, high-speed and low-power performance, and high-temperature operation.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 464
Book Description
This book is devoted to the continuing research and development of thin-dielectric films for optical and microelectronic applications. Although thermal SiO2 has been the dominant dielectric for thin films in microelectronic applications for many years, there is a growing need for low-dielectric constant materials for interlevel dielectrics (less capacitive cross-talk and reduced delay) and high-dielectric constant materials to minimize the space and maximize the capacitance of storage devices such as DRAMs. With the demands put forth by the microelectronics community, this field is expected to develop significantly in the near future. Also featured is the growing area involving the structure and characteriza-tion of buried a-SiO2 layers formed by O+ ion implantation or the Smart Cut UnibondĀ® process. These techniques are evolving into viable methods for producing commercial silicon-on-insulator substrates for device applications requiring radiation hardness, high-speed and low-power performance, and high-temperature operation.
Amorphous Insulating Thin Films II
Author: Roderick A. B. Devine
Publisher: Elsevier Publishing Company
ISBN:
Category : Science
Languages : en
Pages : 546
Book Description
These proceedings present a review of the research being carried out in the field of amorphous insulating thin films. Topics discussed include: nitrides, structure and defects; hydrogen in MOS structures and oxides; silicon dioxide, charge trapping; and ONO and nitride oxides.
Publisher: Elsevier Publishing Company
ISBN:
Category : Science
Languages : en
Pages : 546
Book Description
These proceedings present a review of the research being carried out in the field of amorphous insulating thin films. Topics discussed include: nitrides, structure and defects; hydrogen in MOS structures and oxides; silicon dioxide, charge trapping; and ONO and nitride oxides.
Amorphous Insulating Thin Films II
Author: Rod A. B Devine
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Amorphous Insulating Thin Films:
Author: Roderick A. B. Devine
Publisher: Materials Research Society
ISBN: 9781558991798
Category : Technology & Engineering
Languages : en
Pages :
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Materials Research Society
ISBN: 9781558991798
Category : Technology & Engineering
Languages : en
Pages :
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Amorphous and Crystalline Insulating Thin Films
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Amorphous and Crystalline Insulating Thin Films II
Author: I. H. Wilson
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Proceedings of the 2nd International Conference on Amorphous and Crystalline Insulating Thin Films
Author: International Conference on Amorphous and Crystalline Insulating Thin Films. 2, 1998, Hong Kong
Publisher:
ISBN:
Category :
Languages : en
Pages : 192
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 192
Book Description
Amorphous Insulating Thin Films II
Author: Roderick A. B. Devine
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 510
Book Description
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 510
Book Description