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Author: Zhitong Chen
Publisher: Mdpi AG
ISBN: 9783036543192
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
Plasma can be generated via the combination of energy-inducing fragmentation, ionization, and excitation of molecular. Such processes occur throughout the life of the plasma, resulting in a wide variety of atomic and molecular species, which can be electrically charged, energetically excited, highly reactive, or any combination of these states. Plasma diagnostics can demonstrate important discharge characteristics and the mechanisms of plasma-induced processes. Parameter's dynamic range spans many orders of magnitude, and spatial/temporal scales significantly vary during plasma source configurations. Many diagnostic techniques have been developed to characterize plasma, including scattering techniques, intensified charge-coupled device cameras, laser-based methods, optical emission spectroscopy, mass spectrometry, electron paramagnetic resonance spectroscopy, gas chromatography, etc. Although various mature diagnostic technologies for plasma discharges have been developed, there are still many challenges. The measurement precision is not only affected by the diagnostic equipment/ techniques, but also by the plasma discharge itself. In many applications, direct measurements of the parameters of interest are still not possible. In addition, the plasma environments in application processes are unusually complex, and their reactions are still not fully understood. Plasma can exist in a variety of forms due to discharge modes resulting from different means of creation, resulting in a wide range of applications. This brings together many research fields, including physics, engineering, chemistry, biology, and medicine.
Author: Zhitong Chen
Publisher: Mdpi AG
ISBN: 9783036543192
Category : Technology & Engineering
Languages : en
Pages : 0
Get Book Here
Book Description
Plasma can be generated via the combination of energy-inducing fragmentation, ionization, and excitation of molecular. Such processes occur throughout the life of the plasma, resulting in a wide variety of atomic and molecular species, which can be electrically charged, energetically excited, highly reactive, or any combination of these states. Plasma diagnostics can demonstrate important discharge characteristics and the mechanisms of plasma-induced processes. Parameter's dynamic range spans many orders of magnitude, and spatial/temporal scales significantly vary during plasma source configurations. Many diagnostic techniques have been developed to characterize plasma, including scattering techniques, intensified charge-coupled device cameras, laser-based methods, optical emission spectroscopy, mass spectrometry, electron paramagnetic resonance spectroscopy, gas chromatography, etc. Although various mature diagnostic technologies for plasma discharges have been developed, there are still many challenges. The measurement precision is not only affected by the diagnostic equipment/ techniques, but also by the plasma discharge itself. In many applications, direct measurements of the parameters of interest are still not possible. In addition, the plasma environments in application processes are unusually complex, and their reactions are still not fully understood. Plasma can exist in a variety of forms due to discharge modes resulting from different means of creation, resulting in a wide range of applications. This brings together many research fields, including physics, engineering, chemistry, biology, and medicine.
Author: V. T. Tolok
Publisher: Springer Science & Business Media
ISBN: 1468475770
Category : Science
Languages : en
Pages : 78
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Book Description
Author: Riccardo d'Agostino
Publisher: John Wiley & Sons
ISBN: 3527622195
Category : Science
Languages : en
Pages : 479
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Book Description
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.
Author: Sukhmander Singh
Publisher: Intechopen
ISBN: 9781837680238
Category :
Languages : en
Pages : 0
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Book Description
This book serves as a comprehensive guide for research scholars and postgraduate students in the field of plasma physics. It discusses Rayleigh-Taylor instabilities, solitary waves, quantum plasma, design of radiofrequency (RF) windows, use of a gyrotron in plasma physics, non-equilibrium plasma modeling, space plasma applications, and plasma diagnostics. The book also explores linear and nonlinear waves in a plasma medium.
Author: V. T. Tolok
Publisher:
ISBN:
Category : Plasma diagnostics
Languages : en
Pages :
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Book Description
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309052319
Category : Science
Languages : en
Pages : 231
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Book Description
Plasma science is the study of ionized states of matter. This book discusses the field's potential contributions to society and recommends actions that would optimize those contributions. It includes an assessment of the field's scientific and technological status as well as a discussion of broad themes such as fundamental plasma experiments, theoretical and computational plasma research, and plasma science education.
Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461534003
Category : Science
Languages : en
Pages : 226
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Book Description
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author: Volodymyr Tarasovych Tolok
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 84
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Book Description
Author: Oleg O. Baranov
Publisher: Morgan & Claypool Publishers
ISBN: 1681739119
Category : Technology & Engineering
Languages : en
Pages : 92
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Book Description
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.
Author: Anton Nikiforov
Publisher: BoD – Books on Demand
ISBN: 1838802495
Category : Science
Languages : en
Pages : 146
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Book Description
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
