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Author: X. Jane Jiang
Publisher: Academic Press
ISBN: 0128218169
Category : Technology & Engineering
Languages : en
Pages : 376
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Book Description
Advanced Metrology: Freeform Surfaces provides the perfect guide for engineering designers and manufacturers interested in exploring the benefits of this technology. The inclusion of industrial case studies and examples will help readers to implement these techniques which are being developed across different industries as they offer improvements to the functional performance of products and reduce weight and cost. - Includes case studies in every chapter to help readers implement the techniques discussed - Provides unique advice from industry on hot subjects, including surface description and data processing - Features links to online content, including video, code and software
Author: X. Jane Jiang
Publisher: Academic Press
ISBN: 0128218169
Category : Technology & Engineering
Languages : en
Pages : 376
Get Book Here
Book Description
Advanced Metrology: Freeform Surfaces provides the perfect guide for engineering designers and manufacturers interested in exploring the benefits of this technology. The inclusion of industrial case studies and examples will help readers to implement these techniques which are being developed across different industries as they offer improvements to the functional performance of products and reduce weight and cost. - Includes case studies in every chapter to help readers implement the techniques discussed - Provides unique advice from industry on hot subjects, including surface description and data processing - Features links to online content, including video, code and software
Author: Wolfgang Osten
Publisher: John Wiley & Sons
ISBN: 3527648461
Category : Science
Languages : en
Pages : 471
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Book Description
A comprehensive review of the state of the art and advances in the field, while also outlining the future potential and development trends of optical imaging and optical metrology, an area of fast growth with numerous applications in nanotechnology and nanophysics. Written by the world's leading experts in the field, it fills the gap in the current literature by bridging the fields of optical imaging and metrology, and is the only up-to-date resource in terms of fundamental knowledge, basic concepts, methodologies, applications, and development trends.
Author: Franco Pavese
Publisher: World Scientific
ISBN: 9812839526
Category : Technology & Engineering
Languages : en
Pages : 419
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Book Description
The main theme of the AMCTM 2008 conference, reinforced by the establishment of IMEKO TC21, was to provide a central opportunity for the metrology and testing community worldwide to engage with applied mathematicians, statisticians and software engineers working in the relevant fields. This review volume consists of reviewed papers prepared on the basis of the oral and poster presentations of the Conference participants. It covers all the general matters of advanced statistical modeling (e.g. uncertainty evaluation, experimental design, optimization, data analysis and applications, multiple measurands, correlation, etc.), metrology software (e.g. engineering aspects, requirements or specification, risk assessment, software development, software examination, software tools for data analysis, visualization, experiment control, best practice, standards, etc.), numerical methods (e.g. numerical data analysis, numerical simulations, inverse problems, uncertainty evaluation of numerical algorithms, applications, etc.), and data fusion techniques and design and analysis of inter-laboratory comparisons.
Author: United States. National Bureau of Standards
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 180
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Book Description
Author: Salah H. R. Ali
Publisher: CRC Press
ISBN: 9814669539
Category : Science
Languages : en
Pages : 280
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Book Description
In recent decades, metrology—an accurate and precise technology of high quality for automotive engines—has garnered a great deal of scientific interest due to its unique advanced soft engineering techniques in design and diagnostics. Used in a variety of scientific applications, these techniques are now widely regarded as safer, more efficient, and more effective than traditional ones. This book compiles and details the cutting-edge research in science and engineering from the Egyptian Metrology Institute (National Institute for Standards) that is revolutionizing advanced dimensional techniques through the development of coordinate and surface metrology.
Author: Abraham Landzberg
Publisher: Springer Science & Business Media
ISBN: 1461520290
Category : Technology & Engineering
Languages : en
Pages : 663
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Book Description
The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309182670
Category : Technology & Engineering
Languages : en
Pages : 364
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Book Description
This assessment of the technical quality and relevance of the programs of the Measurement and Standards Laboratories of the National Institute of Standards and Technology is the work of the 165 members of the National Research Council's (NRC's) Board on Assessment of NIST Programs and its panels. These individuals were chosen by the NRC for their technical expertise, their practical experience in running research programs, and their knowledge of industry's needs in basic measurements and standards. This assessment addresses the following: The technical merit of the laboratory programs relative to the state of the art worldwide; The effectiveness with which the laboratory programs are carried out and the results disseminated to their customers; The relevance of the laboratory programs to the needs of their customers; and The ability of the laboratories' facilities, equipment, and human resources to enable the laboratories to fulfill their mission and meet their customers' needs.
Author: Dinesh K. Aswal
Publisher: Springer Nature
ISBN: 9819920744
Category : Technology & Engineering
Languages : en
Pages : 2504
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Book Description
This handbook provides comprehensive and up-to-date information on the topic of scientific, industrial and legal metrology. It discusses the state-of-art review of various metrological aspects pertaining to redefinition of SI Units and their implications, applications of time and frequency metrology, certified reference materials, industrial metrology, industry 4.0, metrology in additive manufacturing, digital transformations in metrology, soft metrology and cyber security, optics in metrology, nano-metrology, metrology for advanced communication, environmental metrology, metrology in biomedical engineering, legal metrology and global trade, ionizing radiation metrology, advanced techniques in evaluation of measurement uncertainty, etc. The book has contributed chapters from world’s leading metrologists and experts on the diversified metrological theme. The internationally recognized team of editors adopt a consistent and systematic approach and writing style, including ample cross reference among topics, offering readers a user-friendly knowledgebase greater than the sum of its parts, perfect for frequent consultation. Moreover, the content of this volume is highly interdisciplinary in nature, with insights from not only metrology but also mechanical/material science, optics, physics, chemistry, biomedical and more. This handbook is ideal for academic and professional readers in the traditional and emerging areas of metrology and related fields.
Author: Richard Leach
Publisher:
ISBN: 9780750325240
Category : Metrology
Languages : en
Pages : 0
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Book Description
Advances in Optical Form and Coordinate Metrology covers the latest advances in the development of optical form and coordinate measuring instruments plus the manipulation of point cloud data. The book presents some basic principles of the optical measurement methods and takes a deeper look at the operation of the instruments and the new application areas where they can be applied, with an emphasis on advanced manufacturing. Latest advances discussed include the drive towards faster instruments for in-process applications, the ability to measure highly complex objects (in e.g. additive manufacturing), performance verification and advances in the use of machine learning to enhance data analysis. Part of IOP Series in Emerging Technologies in Optics and Photonics.
Author: Manuel Servin
Publisher: John Wiley & Sons
ISBN: 3527411526
Category : Technology & Engineering
Languages : en
Pages : 344
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Book Description
The main objective of this book is to present the basic theoretical principles and practical applications for the classical interferometric techniques and the most advanced methods in the field of modern fringe pattern analysis applied to optical metrology. A major novelty of this work is the presentation of a unified theoretical framework based on the Fourier description of phase shifting interferometry using the Frequency Transfer Function (FTF) along with the theory of Stochastic Process for the straightforward analysis and synthesis of phase shifting algorithms with desired properties such as spectral response, detuning and signal-to-noise robustness, harmonic rejection, etc.
