Author: Advanced Metallization Conference
Publisher:
ISBN:
Category :
Languages : en
Pages : 881
Book Description
Advanced Metallization Conference (AMC 2002)
Author: Advanced Metallization Conference
Publisher:
ISBN:
Category :
Languages : en
Pages : 881
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 881
Book Description
Advanced Metallization Conference 2002 (AMC 2002)
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 920
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 920
Book Description
Advanced Metallization Conference 2002 (AMC 2002):
Author: Bradley M. Melnick
Publisher: Materials Research Society
ISBN: 9781558997196
Category : Technology & Engineering
Languages : en
Pages : 882
Book Description
Leading-edge metallization schemes inherently involve the introduction of novel metal systems and novel dielectric materials. Technological advances highlighted during AMC 2002 include the latest developments in integrating copper-based metallization with low-dielectric constant materials and in evaluating the reliability of such interconnects. For the second consecutive year, the volume takes a special look at the status of vertical integration, or 3D chips, and the promise it holds for high-density functional integration and heterogeneous integration. Technical leaders from around the world come together in this volume, the 18th in a popular series from the Materials Research Society, to offers a comprehensive overview of the current state of advanced metallization science and technologies. Topics include: advanced interconnects, 3D integration and packaging; CMP; reliability, test and characterization; metallization; integration; low-k/dielectric materials and characterization; atomic layer deposition (ALD) and barriers.
Publisher: Materials Research Society
ISBN: 9781558997196
Category : Technology & Engineering
Languages : en
Pages : 882
Book Description
Leading-edge metallization schemes inherently involve the introduction of novel metal systems and novel dielectric materials. Technological advances highlighted during AMC 2002 include the latest developments in integrating copper-based metallization with low-dielectric constant materials and in evaluating the reliability of such interconnects. For the second consecutive year, the volume takes a special look at the status of vertical integration, or 3D chips, and the promise it holds for high-density functional integration and heterogeneous integration. Technical leaders from around the world come together in this volume, the 18th in a popular series from the Materials Research Society, to offers a comprehensive overview of the current state of advanced metallization science and technologies. Topics include: advanced interconnects, 3D integration and packaging; CMP; reliability, test and characterization; metallization; integration; low-k/dielectric materials and characterization; atomic layer deposition (ALD) and barriers.
Advanced Metallization Conference in ...
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 730
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 730
Book Description
Advanced Interconnects for ULSI Technology
Author: Mikhail Baklanov
Publisher: John Wiley & Sons
ISBN: 1119966868
Category : Technology & Engineering
Languages : en
Pages : 616
Book Description
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Publisher: John Wiley & Sons
ISBN: 1119966868
Category : Technology & Engineering
Languages : en
Pages : 616
Book Description
Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Thin Film Materials, Processes, and Reliability
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566773935
Category : Technology & Engineering
Languages : en
Pages : 438
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773935
Category : Technology & Engineering
Languages : en
Pages : 438
Book Description
Dielectrics for Nanosystems
Author:
Publisher: The Electrochemical Society
ISBN: 9781566774178
Category : Dielectrics
Languages : en
Pages : 508
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566774178
Category : Dielectrics
Languages : en
Pages : 508
Book Description
Distributed Sensor Networks
Author: S. Sitharama Iyengar
Publisher: CRC Press
ISBN: 1439862885
Category : Computers
Languages : en
Pages : 927
Book Description
The best-selling Distributed Sensor Networks became the definitive guide to understanding this far-reaching technology. Preserving the excellence and accessibility of its predecessor, Distributed Sensor Networks, Second Edition once again provides all the fundamentals and applications in one complete, self-contained source. Ideal as a tutorial for
Publisher: CRC Press
ISBN: 1439862885
Category : Computers
Languages : en
Pages : 927
Book Description
The best-selling Distributed Sensor Networks became the definitive guide to understanding this far-reaching technology. Preserving the excellence and accessibility of its predecessor, Distributed Sensor Networks, Second Edition once again provides all the fundamentals and applications in one complete, self-contained source. Ideal as a tutorial for
ULSI Process Integration III
Author: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
ISBN: 9781566773768
Category : Technology & Engineering
Languages : en
Pages : 620
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773768
Category : Technology & Engineering
Languages : en
Pages : 620
Book Description
Materials for Information Technology
Author: Ehrenfried Zschech
Publisher: Springer Science & Business Media
ISBN: 1846282357
Category : Technology & Engineering
Languages : en
Pages : 498
Book Description
This book provides an up to date survey of the state of the art of research into the materials used in information technology, and will be bought by researchers in universities, institutions as well as research workers in the semiconductor and IT industries.
Publisher: Springer Science & Business Media
ISBN: 1846282357
Category : Technology & Engineering
Languages : en
Pages : 498
Book Description
This book provides an up to date survey of the state of the art of research into the materials used in information technology, and will be bought by researchers in universities, institutions as well as research workers in the semiconductor and IT industries.